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Plasmas et Couches Minces

-12- Etching of organosilicon low-κ materials in high density fluorocarbon plasmas -13- Simulation of Chemically Assisted Ion Beam Etching of GaAs by argon ions and chlorine gas -14- Inductively Coupled Plasma Etching of micro- and nano-structures in Indium Phosphide -15- Pulsed PECVD in O2 / HMDSO plasmas -16- Development of new photonic integrated devices with plasma-HMDSO dielectric materials -17- Oriented single- and multi-wall carbon nanotubes synthesized at low temperature by PECVD -18- Inductively Coupled Plasma Magnetron Sputtering -19- Control of intrinsic stress in sputtered thin films using plasma parameters -20- Synthesis of functional thin layers by reactive magnetron sputtering -21- Plate-forme Optimist

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