{"id":3190,"date":"2026-02-19T14:48:34","date_gmt":"2026-02-19T13:48:34","guid":{"rendered":"https:\/\/www-preprod.cnrs-imn.fr\/anr-jcjc-perform\/"},"modified":"2026-04-01T11:59:51","modified_gmt":"2026-04-01T09:59:51","slug":"anr-jcjc-perform","status":"publish","type":"page","link":"https:\/\/www.cnrs-imn.fr\/en\/projects-collaborations\/academic-projects\/anr-jcjc-perform\/","title":{"rendered":"ANR JCJC PERFORM"},"content":{"rendered":"

ANR project<\/p>\n<\/div>

Plasma-deposited 3D electrodes for micro-supercapacitors<\/h2><\/div>
<\/div><\/div>

Dates:<\/strong>
\nJanuary 2024 – June 2027<\/p>\n

Project coordinator:<\/strong>
\nJ\u00e9r\u00e9my BARBE (PCM team)<\/p>\n

Partner laboratory:<\/strong>
\nIMN<\/p>\n

IMN staff involved:<\/strong>
\nPierre-Yves JOUAN, Marie-Paule BESLAND, Thierry BROUSSE, Nicolas GAUTIER, Eric GAUTRON<\/p>\n<\/div>

<\/div><\/div>

Current research into micro-supercapacitors aims to increase energy density while maintaining high power density and long life. Progress is mainly focused on the development of 3D architectures to increase specific surface area. However, the conformal deposition of thin-film electrodes on 3D substrates remains a technological challenge. It is essential to develop a technique that enables conformal deposition of thin films on high aspect ratio microstructures, while offering sufficient freedom to control the microstructural and electrochemical properties of the deposited materials. The e-HiPIMS magnetron sputtering technology has the potential to meet these objectives, as it benefits from a high degree of ionization of the sputtered material. The PERFORM project aims to study the conformal deposition of thin-film titanium nitride (TiN) electrodes by e-HiPIMS on high aspect ratio microstructured substrates for micro-supercapacitors. The project will use the new power source developed at IMN to generate up to 6 synchronized voltage pulses, controlled to the microsecond, for a single discharge. Initially, the project will aim to characterize e-HiPIMS Ar-Ti-N2 plasmas using time-resolved techniques such as mass spectrometry and optical emission spectroscopy (WP1). Then, advanced material characterizations (XPS, HRTEM…) will be carried out to understand how plasma parameters can influence the compliance and microstructure of capacitive titanium nitride and pseudo-capacitive vanadium oxynitride layers deposited on high aspect ratio silicon microstructures (WP2 and WP3). Finally, these 3D and nanostructured electrodes will be integrated and characterized as functional materials in micro-supercapacitors (WP4).<\/p>\n<\/div>

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