{"id":3774,"date":"2026-03-19T08:43:37","date_gmt":"2026-03-19T07:43:37","guid":{"rendered":"https:\/\/www-preprod.cnrs-imn.fr\/teams\/plasmas-and-thin-films\/pcm-modeling\/"},"modified":"2026-06-05T09:54:19","modified_gmt":"2026-06-05T07:54:19","slug":"pcm-modeling","status":"publish","type":"page","link":"https:\/\/www.cnrs-imn.fr\/en\/teams\/plasmas-and-thin-films\/pcm-modeling\/","title":{"rendered":"PCM modeling"},"content":{"rendered":"<div class=\"fusion-fullwidth fullwidth-box fusion-builder-row-1 fusion-flex-container has-pattern-background has-mask-background nonhundred-percent-fullwidth non-hundred-percent-height-scrolling\" style=\"--awb-border-radius-top-left:0px;--awb-border-radius-top-right:0px;--awb-border-radius-bottom-right:0px;--awb-border-radius-bottom-left:0px;--awb-flex-wrap:wrap;\" ><div class=\"fusion-builder-row fusion-row fusion-flex-align-items-flex-start fusion-flex-content-wrap\" style=\"max-width:1248px;margin-left: calc(-4% \/ 2 );margin-right: calc(-4% \/ 2 );\"><div class=\"fusion-layout-column fusion_builder_column fusion-builder-column-0 fusion_builder_column_3_4 3_4 fusion-flex-column equipe-thematique\" style=\"--awb-bg-size:cover;--awb-width-large:75%;--awb-margin-top-large:0px;--awb-spacing-right-large:2.56%;--awb-margin-bottom-large:20px;--awb-spacing-left-large:2.56%;--awb-width-medium:75%;--awb-order-medium:0;--awb-spacing-right-medium:2.56%;--awb-spacing-left-medium:2.56%;--awb-width-small:100%;--awb-order-small:0;--awb-spacing-right-small:1.92%;--awb-spacing-left-small:1.92%;\" data-scroll-devices=\"small-visibility,medium-visibility,large-visibility\"><div class=\"fusion-column-wrapper fusion-column-has-shadow fusion-flex-justify-content-flex-start fusion-content-layout-column\"><div class=\"fusion-text fusion-text-1\"><h2><img decoding=\"async\" class=\"alignnone wp-image-6323 \" src=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-217x300.png\" alt=\"\" width=\"235\" height=\"325\" srcset=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-200x276.png 200w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-217x300.png 217w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-400x552.png 400w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-600x828.png 600w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-742x1024.png 742w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf-768x1060.png 768w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/multiscale-approach-vf.png 780w\" sizes=\"(max-width: 235px) 100vw, 235px\" \/><\/h2>\n<p><em>Overview of the multi-scale modeling approach<\/em><\/p>\n<p><strong>Researchers<\/strong>: Rim Ettouri, Ahmed Rhallabi, Christophe Cardinaud, Marie Claude Fernandez, Aur\u00e9lie Girard, C\u00e9dric Mannequin.<\/p>\n<p><strong>Contract researchers<\/strong>: Guillaume Le Dain [2018-2020], Jo\u00eblle Zgheib [2021-2023].<\/p>\n<p><strong>Doctoral students<\/strong>: Hamza Tarin [2023&#8230;], Coline Chartrain [2024&#8230;]<\/p>\n<p><strong>Doctoral students who have defended<\/strong>: Mickael Cosson [2021], Jo\u00eblle Zgheib [2021], Tojo Rasoanarivo [2026].<\/p>\n<p>The modeling activity developed within the PCM team aims to :<\/p>\n<ul>\n<li>Better understand the physico-chemical and electrical phenomena of low-pressure cold plasmas and their interactions with material surfaces<\/li>\n<li>Provide technologists with simulators capable of predicting the morphological properties of etched patterns or deposited thin films.<\/li>\n<li>Help optimize plasma processes for depositing and etching materials.<\/li>\n<\/ul>\n<p>The multi-scale approach developed enables us to predict the spatio-temporal evolution of etched patterns as a function of operating parameters. More recently, modeling activities have been extended to simulating the mechanisms involved in a sputtering discharge, with the aim of completing the approach using machine learning (ML) algorithms. <\/p>\n<p><strong>Keywords<\/strong>: plasma, etching, pulsed discharge, modeling, energy management<\/p>\n<p><strong>Collaborations<\/strong>: LS2N, IJL, GEM, GEPEA, IETR, UM6P<\/p>\n<p><strong>Applications<\/strong>: Semiconductors, Microelectronics, anti-corrosion<\/p>\n<h3><\/h3>\n<h3><\/h3>\n<h3><strong>1 &#8211; <\/strong><strong>Multi-scale modeling of plasma etching<\/strong><\/h3>\n<p><img decoding=\"async\" class=\"alignnone wp-image-6333 \" src=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-200x300.png\" alt=\"\" width=\"217\" height=\"326\" srcset=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-200x300.png 200w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-400x600.png 400w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-600x900.png 600w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-683x1024.png 683w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-768x1152.png 768w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-800x1200.png 800w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching-1024x1536.png 1024w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/06\/Figure_Etching.png 1164w\" sizes=\"(max-width: 217px) 100vw, 217px\" \/><\/p>\n<p><em>Overall diagram describing multi-scale modeling  <\/em><\/p>\n<p><strong>Researchers<\/strong> <em>:<\/em> Rim Ettouri, Ahmed Rhallabi, Christophe Cardinaud, Aur\u00e9lie Girard, C\u00e9dric Mannequin, Isabelle Braems.<\/p>\n<p><strong>Post-doctoral fellow <\/strong>: Guillaume Le Dain [2018-2020]<\/p>\n<p><em> <\/em><strong>Contract engineer:<\/strong> Thomas le Pape [2023-2025].<\/p>\n<p><strong>Doctoral student who defended :<\/strong> Tojo Rasoanarivo [2023-2026]<\/p>\n<p>The etching of patterns reaching micron or even nanometric sizes is one of the key steps in the manufacture of integrated circuits, as well as in other miniature systems such as sensors or MEMS (Micro Electro Mechanical Systems). To better understand the physico-chemical mechanisms involved in etching, and to optimize the process, we have developed a multi-scale modeling approach to predict the time evolution of etching profiles as a function of machine parameters. This approach comprises three modules:<br \/>\n&#8211; a kinetic module to determine the densities and fluxes of neutral and charged species<br \/>\n&#8211; a sheath module to calculate the energy and angular distribution functions of ions.<br \/>\n&#8211; a surface module to determine the evolution of etched patterns through masks.<br \/>\nThis approach has been applied to silicon etching using the Bosch process, and to the etching of III-V materials and steel using chlorinated plasmas. These etching simulators are excellent tools to help technologists develop etching processes.   <\/p>\n<p><strong>Key words <\/strong>: Modeling, Multiscale, Etching, Plasma, Silicon, Steel, Titanium, Gallium nitride, Bosch, ALE.<\/p>\n<p><strong>Expertise:<\/strong> Plasma discharge modeling, 2D modeling of plasma etching at mesoscopic and atomic scales, Monte-Carlo approach<\/p>\n<p><strong>Collaborations: <\/strong>IJL Nancy<strong>, <\/strong>INSP, STMicroelectronics<\/p>\n<p><strong>Major publications:<\/strong><\/p>\n<p><a href=\"http:\/\/dx.doi.org\/10.1116\/6.0003932\" target=\"_blank\" rel=\"noopener\">Dynamic global model of <sub>Cl2\/Ar<\/sub> plasmas: Applicability to atomic layer etching processes.<\/a> <em><br \/>\nT. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel and A. Rhallabi.<br \/>\nJournal of Vacuum Science &#038; Technology A 2024, 42, 063003<\/em><\/p>\n<p><a href=\"http:\/\/dx.doi.org\/10.1116\/6.0004464\" target=\"_blank\" rel=\"noopener\">Study of <sub>Cl2\/Ar<\/sub> transient plasmas using a dynamic global model.<\/a> <em><br \/>\n<\/em><em>T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel and A. Rhallabi.<br \/>\nJournal of Vacuum Science &#038; Technology A 2025, 43, 033008<\/em><\/p>\n<p><a href=\"https:\/\/hal.science\/hal-03378471\/file\/Article_gravure_Fe_Cr-1.pdf\" target=\"_blank\" rel=\"noopener\"><em>Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma.  <\/em><\/a><br \/>\n<em>G. Le Dain, F. Laourine, S. Guilet, T. Czerwiec, G. Marcos, C. Noel, G. Henrion,C. Cardinaud, A. Girard and A. Rhallabi, Plasma Sources Sci. Technol. 30, 095022 (2021).<\/em><\/p>\n<h3><strong>2<\/strong><strong> <\/strong><strong>&#8211; <\/strong><strong>Plasma discharge modeling for physical vapor deposition (PVD)<\/strong><\/h3>\n<h3><\/h3>\n<p><img decoding=\"async\" class=\"alignnone wp-image-2781 size-medium\" src=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/03\/Modelisation_PCM2-300x194.jpg\" alt=\"\" width=\"300\" height=\"194\" srcset=\"https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/03\/Modelisation_PCM2-200x129.jpg 200w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/03\/Modelisation_PCM2-300x194.jpg 300w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/03\/Modelisation_PCM2-400x259.jpg 400w, https:\/\/www.cnrs-imn.fr\/wp-content\/uploads\/2026\/03\/Modelisation_PCM2.jpg 402w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/p>\n<p><strong>Researchers<\/strong>: Rim Ettouri, Ahmed Rhallabi, Pierre Yves Jouan, J\u00e9r\u00e9my Barb\u00e9.<\/p>\n<p><strong>Post-doc<\/strong>: Jo\u00eblle Zgheib [2021-2022]<\/p>\n<p><strong>Doctoral student who defended<\/strong>: Jo\u00eblle Zgheib [2018-2021]<\/p>\n<p><strong>Doctoral student<\/strong>: Coline Chartrain [2024&#8230;]<\/p>\n<p>The emergence of the pulsed PVD process known as HiPIMS (High Power Impulse Magnetron Sputtering) has the advantage of improving the structural quality of deposited films. On the other hand, the auto-ionization phenomenon of the sputtered atoms makes the deposit more directional and consequently improves the step coverage of high-aspect-ratio structures (trenches, vias, etc.). These improvements are due to the application of a voltage of a few kilovolts on the cathode, with a duration of a few tens of microseconds and a frequency in the kilohertz range. To better understand the physical phenomena involved in this type of discharge, we are developing a global kinetic model applied to a chromium target bombarded by ions from an argon plasma discharge. The aim of the global model is to quantify the temporal evolution of the densities of neutral species from the gas and the target, as well as charged species. The study of the HiPIMS Ar\/Cr discharge could be adapted to other types of gas\/target mixtures for other types of thin-film deposition.     <\/p>\n<p>To this end, we are developing a global HiPIMS Ar\/Ti and Ar\/N\u2082\/Ti model in the ionization zone, with a view to the deposition of Ti and TiN thin films. This model will then be extended to the post-discharge in order to quantify the fluxes of active species arriving at the substrate surface. <\/p>\n<p><strong>Key words:<\/strong> Modeling, Simulation, PVD, HiPIMS, Thin films.<\/p>\n<p><strong>Expertise:<\/strong> Plasma discharge modeling, HiPIMS physics, Monte Carlo modeling<\/p>\n<p><strong>Major publications:<\/strong><\/p>\n<p><em><a href=\"http:\/\/dx.doi.org\/10.1116\/6.0000865\" target=\"_blank\" rel=\"noopener\">A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions.<\/a><br \/>\nJoelle Zgheib, Pierre Yves Jouan and Ahmed Rhallabi.<br \/>\nJournal of Vacuum Science &#038; Technology A 2021, 39, 043004<\/em><\/p>\n<p><em><a href=\"https:\/\/hal.science\/hal-05219777v1\/file\/modelisation_ions_transport_Hipims_JVST.pdf\" target=\"_blank\" rel=\"noopener\">Modeling of ion transport from ionization region to entrance of mass spectrometer in HiPIMS argon\/Cr target<\/a><\/em><br \/>\n<em>J. Zgheib, P-Y. Jouan, A. Rhallabi, J. Vac. Sci. Technol. A 42, 033004 (2024).<\/em><\/p>\n<h3><strong>3<\/strong><strong> <\/strong><strong>&#8211; <\/strong><strong>Modeling and design of an intelligent gas sensor<\/strong><\/h3>\n<p><strong>Researchers: <\/strong>Ahmed Rhallabi<\/p>\n<p><strong>PhD student<\/strong>: Mehdi Belghiti [2023&#8230;]<\/p>\n<p>This project aims to develop a miniaturized, low-cost, low-power smart gas sensor for applications in the industry of the future and connected embedded systems. The sensor is based on a transducer based on metal oxides, such as TiO\u2082, WO\u2083 or their compounds, deposited by PVD and used as an active layer. <\/p>\n<p>The approach combines the study of the microwave electrical properties of the deposited materials with modeling and simulation of the sensor architecture using design tools such as HFSS, ADS and Cadence. These simulations will be used to optimize the transducer and the various system components, prior to experimental validation by real-time, non-contact monitoring of the sensor response as a function of the gas concentration detected. <\/p>\n<p><strong>Major publication:<\/strong><\/p>\n<p><a href=\"https:\/\/doi.org\/10.1016\/j.sna.2026.118012\" target=\"_blank\" rel=\"noopener\"><em>&#8220;Planar microstrip ring resonator for microwave liquid sensing: Electromagnetic design and dielectric perturbation analysis with porous ZnO&#8221;. <\/em><\/a><em>Mehdi Khaiaf Belghiti, Mohammed El Gibari, St\u00e9phane Ginestar, Amal El Fallah Seghrouchni, Ahmed Rhallabi, <\/em><em>Sensors and Actuators A: Physical, Volume 408, 2026, 118012<\/em><\/p>\n<\/div><\/div><\/div><div class=\"fusion-layout-column fusion_builder_column fusion-builder-column-1 awb-sticky awb-sticky-small awb-sticky-medium awb-sticky-large fusion_builder_column_1_4 1_4 fusion-flex-column\" style=\"--awb-bg-size:cover;--awb-width-large:25%;--awb-margin-top-large:0px;--awb-spacing-right-large:7.68%;--awb-margin-bottom-large:20px;--awb-spacing-left-large:7.68%;--awb-width-medium:25%;--awb-order-medium:0;--awb-spacing-right-medium:7.68%;--awb-spacing-left-medium:7.68%;--awb-width-small:100%;--awb-order-small:0;--awb-spacing-right-small:1.92%;--awb-spacing-left-small:1.92%;--awb-sticky-offset:120px;\" data-scroll-devices=\"small-visibility,medium-visibility,large-visibility\"><div class=\"fusion-column-wrapper fusion-column-has-shadow fusion-flex-justify-content-flex-start fusion-content-layout-column\"><div class=\"fusion-text fusion-text-2\"><p><strong>Sub-themes<\/strong><\/p>\n<\/div><div class=\"awb-toc-el awb-toc-el--1\" data-awb-toc-id=\"1\" data-awb-toc-options=\"{&quot;allowed_heading_tags&quot;:{&quot;h3&quot;:0},&quot;ignore_headings&quot;:&quot;&quot;,&quot;ignore_headings_words&quot;:&quot;&quot;,&quot;enable_cache&quot;:&quot;yes&quot;,&quot;highlight_current_heading&quot;:&quot;yes&quot;,&quot;hide_hidden_titles&quot;:&quot;yes&quot;,&quot;limit_container&quot;:&quot;all&quot;,&quot;select_custom_headings&quot;:&quot;&quot;,&quot;icon&quot;:&quot;fa-flag fas&quot;,&quot;counter_type&quot;:&quot;none&quot;}\" style=\"--awb-item-padding-top:5px;--awb-item-padding-right:5px;--awb-item-padding-bottom:5px;--awb-item-padding-left:5px;--awb-item-font-family:&quot;Libre Franklin&quot;;--awb-item-font-style:normal;--awb-item-font-weight:400;\"><div class=\"awb-toc-el__content\"><\/div><\/div><\/div><\/div><\/div><\/div>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":3,"featured_media":0,"parent":3044,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"100-width.php","meta":{"footnotes":""},"class_list":["post-3774","page","type-page","status-publish","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.4 - 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