52 références
Année 2024
- Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization.
S. Chouteau, L. Stafford, A. Granier, A. Goullet and M. Richard-Plouet. Langmuir 2024, 40, 3015-3023
- Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method.
C. Villeneuve-Faure, M. Mitronika, A P. Dan, L. Boudou, W. Ravisy, M P. Besland, M. Richard-Plouet and A. Goullet. Nano Ex. 2024, 5, 015010
Année 2022
Année 2021
- Hybrid approaches coupling sol-gel and plasma for the deposition of oxide-based nanocomposite thin films: a review.
Maria Mitronika, Agnes Granier, Antoine Goullet and Mireille Richard-Plouet. SN Appl. Sci. 2021, 3, 665
- Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry.
W. Ravisy, M. Richard-Plouet, B. Dey, S. Bulou, P. Choquet, A. Granier and A. Goullet. J. Phys. D: Appl. Phys. 2021, 54, 445303
- TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties.
M. Mitronika, C. Villeneuve-Faure, F. Massol, L. Boudou, W. Ravisy, M P. Besland, A. Goullet and M. Richard-Plouet. Appl. Surf. Sci. 2021, 541, 148510
- TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma.
Maria Mitronika, Jacopo Profili, Antoine Goullet, Nicolas Gautier, Nicolas Stephant, Luc Stafford, Agnes Granier and Mireille Richard-Plouet. J. Phys. D: Appl. Phys. 2021, 54, 085206
Année 2020
- Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source.
B. Dey, S. Bulou, T. Gaulain, W. Ravisy, M. Richard-Plouet, A. Goullet, A. Granier and P. Choquet. Sci Rep 2020, 10, 21952
- Influence of PECVD-TiO2 film morphology and topography on the spectroscopic ellipsometry data fitting process.
Dayu Li, Wentao Zhang and A. Goullet. Mod. Phys. Lett. B 2020, 34, 2050228
- Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment.
M. Mitronika, J. Profili, A. Goullet, L. Stafford, A. Granier and M. Richard-Plouet. Thin Solid Films 2020, 709, 138212
- Unravelling local environments in mixed TiO2-SiO2 thin films by XPS and ab initio calculations.
Pavel Ondracka, David Necas, Michele Carette, Stephane Elisabeth, David Holec, Agnes Granier, Antoine Goullet, Lenka Zajickova and Mireille Richard-Plouet. Appl. Surf. Sci. 2020, 510, 145056
- SiCN:H thin films deposited by MW-PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits.
Beatrice Plujat, Herve Glenat, Angelique Bousquet, Lawrence Frezet, Jonathan Hamon, Antoine Goullet, Eric Tomasella, Emmanuel Hernandez, Sebastien Quoizola and Laurent Thomas. Plasma Process. Polym. 2020, 17, e1900138
Année 2019
- Ion impingement effect on the structure and optical properties of TixSi1-xO2 films deposited by ICP-PECVD.
Dayu Li, Shuyu Dai, Antoine Goullet and Agnes Granier. Plasma Processes Polym. 2019, 16, 1900034
- TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD.
D. Li, N. Gautier, B. Dey, S. Bulou, M. Richard-Plouet, W. Ravisy, A. Goullet, P. Choquet and A. Granier. Appl. Surf. Sci. 2019, 491, 116-122
- Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD.
D. Li, S. Bulou, N. Gautier, S. Elisabeth, A. Goullet, M. Richard-Plouet, P. Choquet and A. Granier. Appl. Surf. Sci. 2019, 466, 63-69
Année 2018
- The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD.
D. Li, S. Dai, A. Goullet and A. Granier. Nano 2018, 13, 1850124
- Microstructure and Photocatalytic Properties of TiO2-Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method.
D. Li, S. Dai, J. Li, C. Zhang, M. Richard-Plouet, A. Goullet and A. Granier. J. Electron. Mater. 2018, 47, 7372-7379
- Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 degrees C.
Beatrice Plujat, Herve Glenat, Jonathan Hamon, Yoan Gazal, Antoine Goullet, Emmanuel Hernandez, Sebastien Quoizola and Laurent Thomas. Plasma Processes Polym. 2018, 15, e1800066
- Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O-2 plasma.
D. Li, S. Dai, A. Goullet, M. Carette, A. Granier and J P. Landesman. Journal of Materials Science-Materials in Electronics 2018, 29, 13254-13264
- Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering.
A. Bachar, A. Bousquet, H. Mehdi, G. Monier, C. Robert-Goumet, L. Thomas, M. Belmahi, A. Goullet, T. Sauvage and E. Tomasella. Appl. Surf. Sci. 2018, 444, 293-302
Année 2017
- Optical properties of TixSi1-xO2 solid solutions.
Pavel Ondracka, David Holec, David Necas, Eva Kedronova, Stephane Elisabeth, Antoine Goullet and Lenka Zajickova. Phys. Rev. B 2017, 95, 195163
- Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering.
Julien Keraudy, Brice Delfour-Peyrethon, Axel Ferrec, Javier Garcia Molleja, Mireille Richard-Plouet, Christophe Payen, Jonathan Hamon, Benoit Corraze, Antoine Goullet and Pierre-Yves Jouan. J. Appl. Phys. 2017, 121, 171916
- Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties.
Julien Keraudy, Axel Ferrec, Mireille Richard-Plouet, Jonathan Hamon, Antoine Goullet and Pierre-Yves Jouan. Appl. Surf. Sci. 2017, 409, 77-84
Année 2016
- Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications.
Dayu Li, Stephane Elisabeth, Agnes Granier, Michele Carette, Antoine Goullet and Jean-Pierre Landesman. Plasma Process. Polym. 2016, 13, 918-928
- Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition.
D. Li, A. Goullet, M. Carette, A. Granier and J P. Landesman. Mater. Chem. Phys. 2016, 182, 409-417
- Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor.
D. Li, A. Goullet, M. Carette, A. Granier, Y. Zhang and J P. Landesman. Vacuum 2016, 131, 231-239
- Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications.
A. Rouahi, F. Challali, I. Dakhlaoui, C. Vallee, S. Salimy, F. Jomni, B. Yangui, M P. Besland, A. Goullet and A. Sylvestre. Thin Solid Films 2016, 606, 127-132
Année 2015
- Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Thin Solid Films 2015, 589, 783-791
- Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering.
J. Keraudy, Garcia J. Molleja, A. Ferrec, B. Corraze, M. Richard-Plouet, A. Goullet and P -Y. Jouan. Appl. Surf. Sci. 2015, 357, 838-844
Année 2014
Année 2013
- Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering.
S. Salimy, F. Challali, A. Goullet, M -P. Besland, M. Carette, N. Gautier, A. Rhallabi, J P. Landesman, S. Toutain and D. Averty. ECS Solid State Lett. 2013, 2, Q13-Q15
- Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect.
A. Rouahi, A. Kahouli, F. Challali, M P. Besland, C. Vallee, B. Yangui, S. Salimy, A. Goullet and A. Sylvestre. J. Phys. D-Appl. Phys. 2013, 46, 065308
- In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Appl. Surf. Sci. 2013, 283, 234-239
Année 2012
- Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Thin Solid Films 2012, 522, 366-371
- Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range.
A. Rouahi, A. Kahouli, F. Challali, M P. Besland, C. Vallee, S. Pairis, B. Yangui, S. Salimy, A. Goullet and A. Sylvestre. J. Appl. Phys. 2012, 112, 094104
Année 2011
- Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces.
E. Al Alam, I. Cortes, M -P. Besland, A. Goullet, L. Lajaunie, P. Regreny, Y. Cordier, J. Brault, A. Cazarre, K. Isoird, G. Sarrabayrouse and F. Morancho. J. Appl. Phys. 2011, 109, 084511
- A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis.
Siamak Salimy, Antoine Goullet, Ahmed Rhallabi, Fatiha Challali, Serge Toutain and Jean Claude Saubat. Solid-State Electron. 2011, 61, 38-45
- Influence of synthesis conditions on optical and electrical properties of CaTiO3:Pr3+ thin films deposited by radiofrequency sputtering for electroluminescent device.
Ludovic Sarakha, Thomas Begou, Antoine Goullet, J. Cellier, Angelique Bousquet, E. Tomasella, T. Sauvage, Philippe Boutinaud and Rachid Mahiou. Surf. Coat. Technol. 2011, 205, S250-S253
- Ultra wide band frequency characterization of integrated TiTaO-based metal-insulator-metal devices.
Thomas Bertaud, Cedric Bermond, Fatiha Challali, Antoine Goullet, Christophe Vallee and Bernard Flechet. J. Appl. Phys. 2011, 110, 044110
Année 2010
- Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon.
F. Challali, M P. Besland, D. Benzeggouta, C. Borderon, M C. Hugon, S. Salimy, J C. Saubat, A. Charpentier, D. Averty, A. Goullet and J P. Landesman. Thin Solid Films 2010, 518, 4619-4622
Année 2009
Année 2008
- Integrated optics based on plasma processed dielectric materials.
T. Begou, B. Beche, J P. Landesman, E. Gaviot, A. Soussou, K. Makaoui, M P. Besland, A. Granier, A. Goullet, J D T. Kruschwitz and M J. Ellison. Advances in {Thin}-{Film} {Coatings} for {Optical} {Applications} {V} 2008, 42, 706705
- Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes.
A. Bousquet, A. Goullet, C. Leteinturier, N. Coulon and A. Granier. Eur. Phys. J.-Appl. Phys 2008, 42, 3-8
- Marcatili's extended approach: comparison to semi-vectorial methods applied to pedestal waveguide design.
T. Begou, B. Beche, N. Grossard, J. Zyss, A. Goullet, G. Jezequel and E. Gaviot. J. Opt. A-Pure Appl. Opt. 2008, 10, 055310
- Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas.
A. Bousquet, A. Granier, G. Cartry and A. Goullet. J. Optoelectron. Adv. Mater. 2008, 10, 1999-2002
Année 2007
- Comparative Study of Films Deposited from HMDSO/O(2) in Continuous Wave and Pulsed rf Discharges.
Lenka Zajickova, Vilma Bursikova, Daniel Franta, Angelique Bousquet, Agnes Granier, Antoine Goullet and Jiri Bursik. Plasma Process. Polym. 2007, 4, S287-S293
- First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides.
T. Begou, B. Beche, A. Goullet, J P. Landesman, A. Granier, C. Cardinaud, E. Gaviot, L. Camberlein, N. Grossard, G. Jezequel and J. Zyss. Opt. Mater. 2007, 30, 657-661
Année 2006
- Photonics integrated circuits on plasma-polymer-HMDSO, Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers.
T. Begou, B. Becheb, A. Goullet, A. Granier, C. Cardinaud, E. Gaviot, V. Raballand, J P. Landesman and J. Zyss. Iecon 2006 - 32nd {Annual} {Conference} on {Ieee} {Industrial} {Electronics}, {Vols} 1-11 2006, 37, 850-854
- Conception of optical integrated circuits on polymers.
B. Beche, N. Pelletier, E. Gaviot, R. Hierle, A. Goullet, J P. Landesman and J. Zyss. Microelectron. J. 2006, 37, 421-427
- Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas.
A. Bousquet, V. Bursikova, A. Goullet, A. Djouadi, L. Zajickova and A. Granier. Surf. Coat. Technol. 2006, 200, 6517-6521
- Mechanisms involved in the conversion of ppHMDSO films into SiO2-like by oxygen plasma treatment.
Agnes Granier, Gael Borvon, Angelique Bousquet, Antoine Goullet, Christiane Leteinturier and Arie van der Lee. Plasma Process. Polym. 2006, 3, 365-373
- Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas.
A. Bousquet, A. Granier, A. Goullet and J P. Landesman. Thin Solid Films 2006, 514, 45-51
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