35 références
Année 2024
- Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors.
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cedric Mannequin, Mireille Richard-Plouet, Maryline Le Granvalet, Christophe Lethien, Thierry Brousse and Jeremy Barbe. Journal of Vacuum Science & Technology A 2024, 42, 023405
Année 2023
- Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1-xVx)2O3.
Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoit Corraze, Pierre-Yves Jouan, Laurent Cario and Marie-Paule Besland. ACS Appl. Mater. Interfaces 2023, 15, 54611-54621
- Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge.
J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M -P. Besland, A. Caillard, T. Minea, A. Rhallabi and P -Y. Jouan. Journal of Vacuum Science & Technology A 2023, 41, 063003
Année 2022
- Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects.
Pierre-Antoine Dubos, Ameni Zaouali, Pierre-Yves Jouan, Mireille Richard-Plouet, Valerie Brien, David Gloaguen and Baptiste Girault. Materials Letters: X 2022, 14, 100145
- Evidence of the Ambipolar Behavior of Mo-6 Cluster Iodides in All-Inorganic Solar Cells: A New Example of Nanoarchitectonic Concept.
Adele Renaud, Pierre-Yves Jouan, Noée Dumait, Soraya Ababou-Girard, Nicolas Barreau, Tetsuo Uchikoshi, Fabien Grasset, Stephane Jobic and Stephane Cordier. ACS Appl. Mater. Interfaces 2022, 14, 1347-1354
Année 2021
- Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier.
Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, Jeremy Chretien, Nicolas Pauc, Pierre Yves Jouan, Pascal Gentile and Said Sadki. Electrochim. Acta 2021, 389, 138727
- A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions.
Joelle Zgheib, Pierre Yves Jouan and Ahmed Rhallabi. Journal of Vacuum Science & Technology A 2021, 39, 043004
- Simple and Versatile Analytical Method for Monitoring the Deposition of Thin Layers by Optical Measurement and Calculation of Residual Stress.
Quentin Hatte, Mireille Richard-Plouet, Pierre-Yves Jouan, Pascal Casari and Pierre-Antoine Dubos. Thin Solid Films 2021, 725
Année 2019
- Preparation by electrophoretic deposition of molybdenum iodide cluster-based functional nanostructured photoelectrodes for solar cells.
A. Renaud, T K N. Nguyen, F. Grasset, M. Raissi, V. Guillon, F. Delabrouille, N. Dumait, P -Y. Jouan, L. Cario, S. Jobic, Y. Pellegrin, F. Odobel, S. Cordier and T. Uchikoshi. Electrochim. Acta 2019, 317, 737-745
- Synchrotron Radiation Applied to Real-Time Studies of the Kinetics of Growth of Aluminum Nitride Thin Multilayers.
J. Garcia Molleja, J. Burgi, G. Kellermann, A. Craievich, R. Neuenschwander, P -Y. Jouan, M A. Djouadi, M. Piccoli, E. Bemporad, D. De Felicis and J N. Feugeas. J. Phys. Chem. B 2019, 123, 1679-1687
- Electrochemical characteristics of NixN thin films deposited by DC and HiPIMS reactive magnetron sputtering.
J. Keraudy, L. Athouel, J. Hamon, B. Girault, D. Gloaguen, M. Richard-Plouet and P -Y. Jouan. Thin Solid Films 2019, 669, 659-664
Année 2018
Année 2017
- Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering.
Julien Keraudy, Brice Delfour-Peyrethon, Axel Ferrec, Javier Garcia Molleja, Mireille Richard-Plouet, Christophe Payen, Jonathan Hamon, Benoit Corraze, Antoine Goullet and Pierre-Yves Jouan. J. Appl. Phys. 2017, 121, 171916
- Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties.
Julien Keraudy, Axel Ferrec, Mireille Richard-Plouet, Jonathan Hamon, Antoine Goullet and Pierre-Yves Jouan. Appl. Surf. Sci. 2017, 409, 77-84
Année 2016
Année 2015
Année 2014
- Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures.
Ait K. Aissa, A. Achour, J. Camus, L. Le Brizoual, P -Y. Jouan and M -A. Djouadi. Thin Solid Films 2014, 550, 264-267
- Correlation between mass-spectrometer measurements and thin film characteristics using dcMS and HiPIMS discharges.
A. Ferrec, J. Keraudy, S. Jacq, F. Schuster, P -Y. Jouan and M A. Djouadi. Surf. Coat. Technol. 2014, 250, 52-56
- Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS.
D T. Nguyen, A. Ferrec, J. Keraudy, M. Richard-Plouet, A. Goullet, L. Cattin, L. Brohan and P -Y. Jouan. Surf. Coat. Technol. 2014, 250, 21-25
- Effect of the deposition conditions of NiO anode buffer layers in organic solar cells, on the properties of these cells.
D T. Nguyen, A. Ferrec, J. Keraudy, J C. Bernede, N. Stephant, L. Cattin and P -Y. Jouan. Appl. Surf. Sci. 2014, 311, 110-116
Année 2013
- Thermal properties of carbon nanowall layers measured by a pulsed photothermal technique.
A. Achour, B E. Belkerk, Ait K. Aissa, S. Vizireanu, E. Gautron, M. Carette, P -Y. Jouan, G. Dinescu, L. Le Brizoual, Y. Scudeller and M -A. Djouadi. Appl. Phys. Lett. 2013, 102, 061903
- Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy.
A. Stolz, A. Soltani, B. Abdallah, J. Charrier, D. Deresmes, P -Y. Jouan, M A. Djouadi, E. Dogheche and J -C. De Jaeger. Thin Solid Films 2013, 534, 442-445
Année 2012
- Preparation and photocatalytic properties of quartz/gold nanostructures/TiO2 lamellar structures.
Fatiha Barka-Bouaifel, Karim Makaoui, Pierre-Yves Jouan, Xavier Castel, Nacer Bezzi, Rabah Boukherroub and Sabine Szunerits. RSC Adv. 2012, 2, 12482-12488
- Thermal conductivity measurement of AlN films by fast photothermal method..
Ait K. Aissa, N. Semmar, De Sousa D. Meneses, L. Le Brizoual, M. Gaillard, A. Petit, P -Y. Jouan, C. Boulmer-Leborgne and M A. Djouadi. 6th {European} {Thermal} {Sciences} {Conference} (eurotherm 2012) 2012, 520, 012089
- Deposition of nickel oxide by direct current reactive sputtering Effect of oxygen partial pressure.
A. Karpinski, A. Ferrec, M. Richard-Plouet, L. Cattin, M A. Djouadi, L. Brohan and P -Y. Jouan. Thin Solid Films 2012, 520, 3609-3613
- Structural and photoluminescence characterization of vertically aligned multiwalled carbon nanotubes coated with ZnO by magnetron sputtering.
N. Ouldhamadouche, A. Achour, I. Musa, Ait K. Aissa, F. Massuyeau, P Y. Jouan, M. Kechouane, L. Le Brizoual, E. Faulques, N. Barreau and M A. Djouadi. Thin Solid Films 2012, 520, 4816-4819
- XPS study of the band alignment at ITO/oxide (n-type MoO3 or p-type NiO) interface.
J C. Bernede, S. Houari, D. Nguyen, P Y. Jouan, A. Khelil, A. Mokrani, L. Cattin and P. Predeep. Phys. Status Solidi A-Appl. Mat. 2012, 209, 1291-1297
Année 2011
Année 2010
- Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering.
S. Rahmane, B. Abdallah, A. Soussou, E. Gautron, P -Y. Jouan, L. Le Brizoual, N. Barreau, A. Soltani and M A. Djouadi. Phys. Status Solidi A-Appl. Mat. 2010, 207, 1604-1608
- HiPIMS Ion Energy Distribution Measurements in Reactive Mode.
Pierre-Yves Jouan, Laurent Le Brizoual, Mihai Ganciu, Christophe Cardinaud, Sylvain Tricot and Mohamed-Abdou Djouadi. IEEE Trans. Plasma Sci. 2010, 38, 3089-3094
Année 2009
Année 2008
- Epitaxial growth of aluminum nitride on AlGaN by reactive sputtering at low temperature.
C. Duquenne, M A. Djouadi, P Y. Tessier, P Y. Jouan, M P. Besland, C. Brylinski, R. Aubry and S. Delage. Appl. Phys. Lett. 2008, 93, 052905
- Thickness and substrate effects on AlN thin film growth at room temperature.
B. Abdallah, C. Duquenne, M P. Besland, E. Gautron, P Y. Jouan, P Y. Tessier, J. Brault, Y. Cordier and M A. Djouadi. Eur. Phys. J.-Appl. Phys 2008, 43, 309-313
- Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films.
C. Duquenne, P Y. Tessier, M P. Besland, B. Angleraud, P Y. Jouan, R. Aubry, S. Delage and M A. Djouadi. J. Appl. Phys. 2008, 104, 063301
Année 2007
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