4 références
Année 2025
Année 2024
- Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes.
T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel and A. Rhallabi.
Journal of Vacuum Science & Technology A 2024, 42, 063003
- Thermal catalytic etching of diamond by double-metal layers.
D D. Tran, C. Mannequin, M. Bonvalot, A. Traoré, H. Mariette, M. Sasaki and E. Gheeraert.
Diamond and Related Materials 2024, 145, 111075
- Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors.
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cedric Mannequin, Mireille Richard-Plouet, Maryline Le Granvalet, Christophe Lethien, Thierry Brousse and Jeremy Barbe.
Journal of Vacuum Science & Technology A 2024, 42, 023405
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