317 références
2024
- Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics.
Issraa Shahine, Quentin Hatte, Maxime Harnois and Pierre-Yves Tessier. ACS Appl. Electron. Mater. 2024
- Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization.
S. Chouteau, L. Stafford, A. Granier, A. Goullet and M. Richard-Plouet. Langmuir 2024, 40, 3015-3023
- Impact of Li, Na and Zn metal cation concentration in EMIM-TFSI ionic liquids on ion clustering, structure and dynamics.
Samanvitha Kunigal Vijaya Shankar, Yann Claveau, Tojo Rasoanarivo, Chris Ewels and Jean Le Bideau. Phys. Chem. Chem. Phys. 2024, 26, 7049-7059
- Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method.
C. Villeneuve-Faure, M. Mitronika, A P. Dan, L. Boudou, W. Ravisy, M P. Besland, M. Richard-Plouet and A. Goullet. Nano Ex. 2024, 5, 015010
- Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors.
Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cedric Mannequin, Mireille Richard-Plouet, Maryline Le Granvalet, Christophe Lethien, Thierry Brousse and Jeremy Barbe. Journal of Vacuum Science & Technology A 2024, 42, 023405
- Surface Analysis Insight Note: Observations relating to photoemission peak shapes, oxidation state, and chemistry of titanium oxide films.
Pascal Bargiela, Vincent Fernandez, William Ravisy, David Morgan, Mireille Richard-Plouet, Neal Fairley and Jonas Baltrusaitis. Surf. Interface Anal. 2024
2023
- Experimental characterization of quasi-2-dimension nanoporous gold ultra-thin film from nano to micro length scale.
Julien Godet, Gwénaël Massé, Issraa Shahine, Quentin Hatte, Hadi Bahsoun, Florian Bouard, Loranne Vernisse, Laurent Pizzagalli, Maryline Le Granvalet and Pierre-Yves Tessier. Thin Solid Films 2023, 787, 140136
- Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1-xVx)2O3.
Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoit Corraze, Pierre-Yves Jouan, Laurent Cario and Marie-Paule Besland. ACS Appl. Mater. Interfaces 2023, 15, 54611-54621
- Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge.
J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M -P. Besland, A. Caillard, T. Minea, A. Rhallabi and P -Y. Jouan. Journal of Vacuum Science & Technology A 2023, 41, 063003
- Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma.
T Meyer, A. Girard, M Bouška, E. Baudet, M. Baillieul, P. Nemec, V. Nazabal and C. Cardinaud. Plasma Sources Sci. Technol. 2023, 32, 085003
- On the low temperature limits for cryogenic etching: A quasi in situ XPS study.
Felipe Cemin, Aurelie Girard and Christophe Cardinaud. Appl. Surf. Sci. 2023, 637, 157941
- Comprehensive characterization of Al-doped ZnO thin films deposited in confocal radio frequency magnetron co-sputtering.
Fatiha Challali, Tahar Touam, Valerie Bockelee, Thierry Chauveau, Azeddine Chelouche, Nicolas Stephant, Jonathan Hamon and Marie-Paule Besland. Thin Solid Films 2023, 780, 139947
- Comprehensive study of WSiC:H coatings synthesized by microwave-assisted RF reactive sputtering.
Aissatou Diop, Danielle Ngoue, Amine Mahammou, Babacar Diallo, Beatrice Plujat, Angelique Bousquet, Thierry Sauvage, Sebastien Quoizola, Mireille Richard-Plouet, Jonathan Hamon, Audrey Soum-Glaude, Eric Tomasella and Laurent Thomas. Surf. Coat. Technol. 2023, 459, 129408
- Optical response of plasmonic silver nanoparticles after treatment by a warm microwave plasma jet.
J. Trahan, J. Profili, G. Robert-Bigras, M. Mitronika, M. Richard-Plouet and L. Stafford. Nanotechnology 2023, 34, 195701
- Effects of Erbium Incorporation on Structural, Surface Morphology, and Degradation of Methylene Blue Dye of Magnesium Oxide Nanoparticles.
Imene Ameur, Ahmed Reda Khantoul, Boubekeur Boudine, Valerie Brien, David Horwat, Miloud Sebais and Ouahiba Halimi. J. Inorg. Organomet. Polym. Mater. 2023, 33, 30-46
2022
- Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes.
S. Chouteau, M. Mitronika, A. Goullet, M. Richard-Plouet, L. Stafford and A. Granier. J. Phys. D Appl. Phys. 2022, 55
- Nanoporous Gold Stacked Layers as Substrates for SERS Detection in Liquids or Gases with Ultralow Detection Limits and Long-Term Stability.
Issraa Shahine, Jean-Yves Mevellec, Mireille Richard-Plouet, Bernard Humbert and Pierre-Yves Tessier. J. Phys. Chem. C 2022, 126, 17223-17233
- Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O-2 and Ar plasmas.
G. Antoun, T. Tillocher, A. Girard, P. Lefaucheux, J. Faguet, H. Kim, D. Zhang, M. Wang, K. Maekawa, C. Cardinaud and R. Dussart. Journal of Vacuum Science & Technology A 2022, 40
- Efficient and Facile Synthetic Route of MoO3:MoS2 Hybrid Thin Layer via Oxidative Reaction of MoS2 Nanoflakes.
Hind Lamkaouane, Hajar Ftouhi, Mireille Richard-Plouet, Nicolas Gautier, Nicolas Stephant, Mimoun Zazoui, Mohammed Addou, Linda Cattin, Jean Christian Bernede, Yamina Mir and Guy Louarn. Nanomaterials 2022, 12, 3171
- Modelling of photovoltaic production and electrochemical storage in an autonomous solar drone.
Mickael Cosson, Benjamin David, Ludovic Arzel, Philippe Poizot and Ahmed Rhallabi. eScience 2022, 2, 235-241
- Impact of the terahertz and optical pump penetration depths on generated strain waves temporal profiles in a V2O3 thin film.
Guénolé Huitric, Michael Rodriguez-Fano, Lucas Gournay, Nicolas Godin, Marius Hervé, Gaël Privault, Julien Tranchant, Zohra Khaldi, Marco Cammarata, Eric Collet, Etienne Janod and Christophe Odin. Faraday Discuss. 2022
- Flow stress improvement of a nickel multicrystal by physical vapor thin film deposition to reduce surface effects.
Pierre-Antoine Dubos, Ameni Zaouali, Pierre-Yves Jouan, Mireille Richard-Plouet, Valerie Brien, David Gloaguen and Baptiste Girault. Materials Letters: X 2022, 14, 100145
- Low-temperature deposition of self-cleaning anatase TiO2 coatings on polymer glazing via sequential continuous and pulsed PECVD.
Benjamin Dey, Simon Bulou, William Ravisy, Nicolas Gautier, Mireille Richard-Plouet, Agnes Granier and Patrick Choquet. Surf. Coat. Technol. 2022, 436, 128256
- Quasi In Situ XPS on a SiOxFy Layer Deposited on Silicon by a Cryogenic Process.
G. Antoun, A. Girard, T. Tillocher, P. Lefaucheux, J. Faguet, K. Maekawa, C. Cardinaud and R. Dussart. ECS J. Solid State Sci. Technol. 2022, 11, 013013
- Evidence of the Ambipolar Behavior of Mo-6 Cluster Iodides in All-Inorganic Solar Cells: A New Example of Nanoarchitectonic Concept.
Adele Renaud, Pierre-Yves Jouan, Noée Dumait, Soraya Ababou-Girard, Nicolas Barreau, Tetsuo Uchikoshi, Fabien Grasset, Stephane Jobic and Stephane Cordier. ACS Appl. Mater. Interfaces 2022, 14, 1347-1354
- Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching.
Rim Ettouri, Thomas Tillocher, Philippe Lefaucheux, Bertrand Boutaud, Vincent Fernandez, Neal Fairley, Christophe Cardinaud, Aurelie Girard and Rémi Dussart. Surf. Interface Anal. 2022, 54, 134
2021
- Hybrid approaches coupling sol-gel and plasma for the deposition of oxide-based nanocomposite thin films: a review.
Maria Mitronika, Agnes Granier, Antoine Goullet and Mireille Richard-Plouet. SN Appl. Sci. 2021, 3, 665
- Systematic and collaborative approach to problem solving using X-ray photoelectron spectroscopy.
Neal Fairley, Vincent Fernandez, Mireille Richard‐Plouet, Catherine Guillot-Deudon, John Walton, Emily Smith, Delphine Flahaut, Mark Greiner, Mark Biesinger, Sven Tougaard, David Morgan and Jonas Baltrusaitis. Applied Surface Science Advances 2021, 5, 100112
- Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma.
Guillaume Le Dain, Feriel Laourine, Stephane Guilet, Thierry Czerwiec, Grégory Marcos, Cédric Noel, Gérard Henrion, Christophe Cardinaud, Aurelie Girard and Ahmed Rhallabi. Plasma Sources Science and Technology 2021, 30, 095022
- Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry.
W. Ravisy, M. Richard-Plouet, B. Dey, S. Bulou, P. Choquet, A. Granier and A. Goullet. J. Phys. D: Appl. Phys. 2021, 54, 445303
- Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier.
Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, Jeremy Chretien, Nicolas Pauc, Pierre Yves Jouan, Pascal Gentile and Said Sadki. Electrochim. Acta 2021, 389, 138727
- Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy.
Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, David Morgan, Neal Fairley and Jonas Baltrusaitis. Appl. Surf. Sci. 2021, 566, 150728
- A high-power impulse magnetron sputtering global model for argon plasma-chromium target interactions.
Joelle Zgheib, Pierre Yves Jouan and Ahmed Rhallabi. Journal of Vacuum Science & Technology A 2021, 39, 043004
- Influence of magnesium doping on microstructure, optical and photocatalytic activity of zinc oxide thin films synthesis by sol-gel route.
Imene Ameur, Boubekeur Boudine, Mouloud Laidoudi, Malak Khennoucha, Valerie Brien, David Horwat, Miloud Sebais and Ouhiba Halimi. Applied Physics a-Materials Science & Processing 2021, 127
- Simple and Versatile Analytical Method for Monitoring the Deposition of Thin Layers by Optical Measurement and Calculation of Residual Stress.
Quentin Hatte, Mireille Richard-Plouet, Pierre-Yves Jouan, Pascal Casari and Pierre-Antoine Dubos. Thin Solid Films 2021, 725
- Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas.
T Meyer, A. Girard, G LeDain, A. Rhallabi, E. Baudet, V. Nazabal, P. Nemec and C. Cardinaud. Appl. Surf. Sci. 2021, 549, 149192
- TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties.
M. Mitronika, C. Villeneuve-Faure, F. Massol, L. Boudou, W. Ravisy, M P. Besland, A. Goullet and M. Richard-Plouet. Appl. Surf. Sci. 2021, 541, 148510
- TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma.
Maria Mitronika, Jacopo Profili, Antoine Goullet, Nicolas Gautier, Nicolas Stephant, Luc Stafford, Agnes Granier and Mireille Richard-Plouet. J. Phys. D: Appl. Phys. 2021, 54, 085206
2020
- Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source.
B. Dey, S. Bulou, T. Gaulain, W. Ravisy, M. Richard-Plouet, A. Goullet, A. Granier and P. Choquet. Sci Rep 2020, 10, 21952
- Control of stoichiometry and morphology in polycrystalline V(2)O(3)thin films using oxygen buffers.
Jonathan A J. Rupp, Benoit Corraze, Marie-Paule Besland, Laurent Cario, Julien Tranchant, Dirk J. Wouters, Rainer Waser and Etienne Janod. J. Mater. Sci. 2020, 55, 14717-14727
- The wrinkling concept applied to plasma-deposited polymer-like thin films: A promising method for the fabrication of flexible electrodes.
Damien Thiry, Nathan Vinx, Pascal Damman, Francisco J. Aparicio, Pierre-Yves Tessier, David Moerman, Philippe Leclere, Thomas Godfroid, Sylvain Desprez and Rony Snyders. Plasma Process Polym 2020, 17, 2000119
- Influence of PECVD-TiO2 film morphology and topography on the spectroscopic ellipsometry data fitting process.
Dayu Li, Wentao Zhang and A. Goullet. Mod. Phys. Lett. B 2020, 34, 2050228
- Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas.
Jordan Piet, Wilfrid Faider, Aurelie Girard, François Boulard and Christophe Cardinaud. Journal of Vacuum Science & Technology A 2020, 38, 053005
- Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment.
M. Mitronika, J. Profili, A. Goullet, L. Stafford, A. Granier and M. Richard-Plouet. Thin Solid Films 2020, 709, 138212
- Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas.
T Meyer, G LeDain, A. Girard, A. Rhallabi, M Bouška, P. Nemec, V. Nazabal and C. Cardinaud. Plasma Sources Sci. Technol. 2020, 29, 105006
- Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration.
Fatiha Challali, Djelloul Mendil, Tahar Touam, Thierry Chauveau, Valerie Bockelee, Alexis Garcia Sanchez, Azeddine Chelouche and Marie-Paule Besland. Materials Science in Semiconductor Processing 2020, 118, 105217
- Co-sputtering of gold and copper onto liquids: a route towards the production of porous gold nanoparticles.
Adrien Chauvin, Anastasiya Sergievskaya, Abdel-Aziz El Mel, Anna Fucikova, Cinthia Antunes Corrêa, Jozef Vesely, Elen Duverger-Nedellec, David Cornil, Jerome Cornil, Pierre-Yves Tessier, Milan Dopita and Stephanos Konstantinidis. Nanotechnology 2020, 31, 455303
- Lamellar nanoporous gold thin films with tunable porosity for ultrasensitive SERS detection in liquid and gas phase.
Adrien Chauvin, Marta Lafuente, Jean Yves Mevellec, Reyes Mallada, Bernard Humbert, Maria Pilar Pina, Pierre-Yves Tessier and Abdelaziz El Mel. Nanoscale 2020, 12, 12602-12612
- Competition between V2O3 phases deposited by one-step reactive sputtering process on polycrystalline conducting electrode.
J A J. Rupp, E. Janod, M -P. Besland, B. Corraze, A. Kindsmüller, M. Querre, J. Tranchant, L. Cario, R. Dittmann, R. Waser and D J. Wouters. Thin Solid Films 2020, 705, 138063
- Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition.
Christophe Vallee, Marceline Bonvalot, Samia Belahcen, Taguhi Yeghoyan, Moustapha Jaffal, Rémi Vallat, Ahmad Chaker, Gautier Lefèvre, Sylvain David, Ahmad Bsiesy, Nicolas Posseme, Rémy Gassilloud and Agnes Granier. Journal of Vacuum Science & Technology A 2020, 38, 033007
- Unravelling local environments in mixed TiO2-SiO2 thin films by XPS and ab initio calculations.
Pavel Ondracka, David Necas, Michele Carette, Stephane Elisabeth, David Holec, Agnes Granier, Antoine Goullet, Lenka Zajickova and Mireille Richard-Plouet. Appl. Surf. Sci. 2020, 510, 145056
- Effect of the substrate temperature during gold-copper alloys thin film deposition by magnetron co-sputtering on the dealloying process.
Adrien Chauvin, Lukas Horak, Elen Duverger-Nedellec, Milan Dopita, Pierre-Yves Tessier and Abdel-Aziz El Mel. Surf. Coat. Technol. 2020, 383, 125220
- SiCN:H thin films deposited by MW-PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits.
Beatrice Plujat, Herve Glenat, Angelique Bousquet, Lawrence Frezet, Jonathan Hamon, Antoine Goullet, Eric Tomasella, Emmanuel Hernandez, Sebastien Quoizola and Laurent Thomas. Plasma Process. Polym. 2020, 17, e1900138
2019
- Patterning of silver on the micro- and nano-scale by local oxidation using air plasma.
Abdel-Aziz El Mel, Romain Gautier, Nicolas Stephant, Pierre-Yves Tessier and Yousef Haik. Nano-Structures & Nano-Objects 2019, 19, 100320
- Vapor dealloying of ultra-thin films: a promising concept for the fabrication of highly flexible transparent conductive metal nanomesh electrodes.
Adrien Chauvin, Willigis Txia Cha Heu, Joze Buh, Pierre-Yves Tessier and Abdel-Aziz El Mel. npj Flex Electron 2019, 3, 1-6
- New CH4-N-2 dry etch chemistry for poly(methyl methacrylate) removal without consuming polystyrene for lamellar copolymers application.
Aurelien Sarrazin, Nicolas Posseme, Patricia Pimenta-Barros, Sebastien Barnola, Raluca Tiron and Christophe Cardinaud. J. Vac. Sci. Technol. B 2019, 37, 030601
- Study of the Coarsening of Nanoporous Gold Nanowires by In Situ Scanning Transmission Electron Microscopy During Annealing.
Adrien Chauvin, Leopoldo Molina-Luna, Junjun Ding, Chang-Hwan Choi, Pierre-Yves Tessier and Abdel-Aziz El Mel. Physica Status Solidi-Rapid Research Letters 2019, 1900376
- Wide band gap kesterite absorbers for thin film solar cells: potential and challenges for their deployment in tandem devices.
Bart Vermang, Guy Brammertz, Marc Meuris, T. Schnabel, E. Ahlswede, Leo Choubrac, Sylvie Harel, Christophe Cardinaud, Ludovic Arzel, Nicolas Barreau, Joop van Deelen, Pieter-Jan Bolt and Patrice Bras. Sustainable Energy & Fuels 2019, 3, 2246-2259
- Ion impingement effect on the structure and optical properties of TixSi1-xO2 films deposited by ICP-PECVD.
Dayu Li, Shuyu Dai, Antoine Goullet and Agnes Granier. Plasma Processes Polym. 2019, 16, 1900034
- Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties.
Guillaume Le Dain, Ahmed Rhallabi, Aurelie Girard, Christophe Cardinaud, Fabrice Roqueta and Mohamed Boufnichel. Plasma Sources Science & Technology 2019, 28, 085002
- TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD.
D. Li, N. Gautier, B. Dey, S. Bulou, M. Richard-Plouet, W. Ravisy, A. Goullet, P. Choquet and A. Granier. Appl. Surf. Sci. 2019, 491, 116-122
- Theoretical study of the electronic structure of mono-bromide of lanthanum molecule including spin-orbit coupling effects.
Yaman Hannade, Fadia Taher, Yehya Haidar and Ahmed Rhallabi. J. Mol. Model. 2019, 25, 250
- Preparation by electrophoretic deposition of molybdenum iodide cluster-based functional nanostructured photoelectrodes for solar cells.
A. Renaud, T K N. Nguyen, F. Grasset, M. Raissi, V. Guillon, F. Delabrouille, N. Dumait, P -Y. Jouan, L. Cario, S. Jobic, Y. Pellegrin, F. Odobel, S. Cordier and T. Uchikoshi. Electrochim. Acta 2019, 317, 737-745
- The role of physisorption in the cryogenic etching process of silicon.
G. Antoun, R. Dussart, T. Tillocher, P. Lefaucheux, C. Cardinaud, A. Girard, S. Tahara, K. Yamazaki, K. Yatsuda, J. Faguet and K. Maekawa. Japanese Journal of Applied Physics 2019, 58, SEEB03
- AlN Etching under ICP Cl-2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model.
Mohammad Rammal, Ahmed Rhallabi, Delphine Neel, Dalila Make, Alexandre Shen and Abdou Djouadi. Mrs Advances 2019, 4, 1579-1587
- Influence of relative humidity and temperature on the sol-gel transition of a siloxane surface treatment.
Quentin Hatte, Pierre-Antoine Dubos, Nadia Guitter, Mireille Richard-Plouet and Pascal Casari. J. Sol-Gel Sci. Technol. 2019, 90, 230-240
- Polarization-dependent ultrafast plasmon relaxation dynamics in nanoporous gold thin films and nanowires.
Domantas Peckus, Adrien Chauvin, Tomas Tamulevicius, Mindaugas Juodenas, Junjun Ding, Chang-Hwan Choi, Abdel-Aziz El Mel, Pierre-Yves Tessier and Sigitas Tamulevicius. J. Phys. D Appl. Phys. 2019, 52, 225103
- Synchrotron Radiation Applied to Real-Time Studies of the Kinetics of Growth of Aluminum Nitride Thin Multilayers.
J. Garcia Molleja, J. Burgi, G. Kellermann, A. Craievich, R. Neuenschwander, P -Y. Jouan, M A. Djouadi, M. Piccoli, E. Bemporad, D. De Felicis and J N. Feugeas. J. Phys. Chem. B 2019, 123, 1679-1687
- Electrochemical characteristics of NixN thin films deposited by DC and HiPIMS reactive magnetron sputtering.
J. Keraudy, L. Athouel, J. Hamon, B. Girault, D. Gloaguen, M. Richard-Plouet and P -Y. Jouan. Thin Solid Films 2019, 669, 659-664
- Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD.
D. Li, S. Bulou, N. Gautier, S. Elisabeth, A. Goullet, M. Richard-Plouet, P. Choquet and A. Granier. Appl. Surf. Sci. 2019, 466, 63-69
2018
- Solvothermal growth of BaTiO3 thin films on Ti foils at T <= 200 degrees C with ferroelectric behavior.
Elsy Bacha, Caroline Borderon, Raphael Renoud, Hartmut W. Gundel and Mireille Richard-Plouet. Ferroelectrics 2018, 536, 105-112
- Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment.
Christophe Cardinaud. C.R. Chim. 2018, 21, 723-739
- On the Sputtering of Titanium and Silver onto Liquids, Discussing the Formation of Nanoparticles.
Xavier Carette, Benoit Debievre, David Cornil, Jerome Cornil, Philippe Leclere, Bjorn Maes, Nicolas Gautier, Eric Gautron, Abdel-Aziz El Mel, Jean-Marie Raquez and Stephanos Konstantinidis. J. Phys. Chem. C 2018, 122, 26605-26612
- Thin films of binary amorphous Zn-Zr alloys developed by magnetron co-sputtering for the production of degradable coronary stents: A preliminary study.
Nathalie Annonay, Fatiha Challali, Marie-Noelle Labour, Valerie Bockelee, A. Garcia-Sanchez, Florent Tetard, Marie-Paule Besland, Philippe Djemia and Frederic Chaubet. Bioact. Mater. 2018, 3, 385-388
- First demonstration of "Leaky Integrate and Fire" artificial neuron behavior on (V0.95Cr0.05)(2)O-3 thin film.
Coline Adda, Laurent Cario, Julien Trenchant, Etienne Janod, Marie-Paula Besiand, Marcelo Rozenberg, Pablo Stoliar and Benoit Corraze. MRS Commun. 2018, 8, 835-841
- The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD.
D. Li, S. Dai, A. Goullet and A. Granier. Nano 2018, 13, 1850124
- Near interface ionic transport in oxygen vacancy stabilized cubic zirconium oxide thin films.
Mohsin Raza, Simone Sanna, Lucia dos Santos Gomez, Eric Gautron, Abdel Aziz El Mel, Nini Pryds, Rony Snyders, Stephanos Konstantinidis and Vincenzo Esposito. Phys. Chem. Chem. Phys. 2018, 20, 26068-26071
- Microstructure and Photocatalytic Properties of TiO2-Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method.
D. Li, S. Dai, J. Li, C. Zhang, M. Richard-Plouet, A. Goullet and A. Granier. J. Electron. Mater. 2018, 47, 7372-7379
- Mott insulators: A large class of materials for Leaky Integrate and Fire (LIF) artificial neuron.
Coline Adda, Benoit Corraze, Pablo Stoliar, Pascale Diener, Julien Tranchant, Agathe Filatre-Furcate, Marc Fourmigue, Dominique Lorcy, Marie-Paule Besland, Etienne Janod and Laurent Cario. J. Appl. Phys. 2018, 124, 152124
- Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 degrees C.
Beatrice Plujat, Herve Glenat, Jonathan Hamon, Yoan Gazal, Antoine Goullet, Emmanuel Hernandez, Sebastien Quoizola and Laurent Thomas. Plasma Processes Polym. 2018, 15, e1800066
- Block copolymer selectivity: A new dry etch approach for cylindrical applications.
Aurelien Sarrazin, Nicolas Posseme, Patricia Pimenta-Barros, Sebastien Barnola, Ahmed Gharbi, Maxime Argoud, Raluca Tiron and Christophe Cardinaud. Journal of Vacuum Science & Technology B 2018, 36, 041803
- Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O-2 plasma.
D. Li, S. Dai, A. Goullet, M. Carette, A. Granier and J P. Landesman. Journal of Materials Science-Materials in Electronics 2018, 29, 13254-13264
- How a dc Electric Field Drives Mott Insulators Out of Equilibrium.
P. Diener, E. Janod, B. Corraze, M. Querre, C. Adda, M. Guilloux-Viry, S. Cordier, A. Camjayi, M. Rozenberg, M P. Besland and L. Cario. Phys. Rev. Lett. 2018, 121, 016601
- Phase separation within NiSiN coatings during reactive HiPIMS discharges: A new pathway to grow NixSi nanocrystals composites at low temperature.
J. Keraudy, R D. Boyd, T. Shimizu, U. Helmersson and P -Y. Jouan. Appl. Surf. Sci. 2018, 454, 148-156
- Non-volatile resistive switching in the Mott insulator (V1-xCrx)(2)O-3.
M. Querre, J. Tranchant, B. Corraze, S. Cordier, V. Bouquet, S. Deputier, M. Guilloux-Viry, M -P. Besland, E. Janod and L. Cario. Physica B-Condensed Matter 2018, 536, 327-330
- Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties.
Guillaume Le Dain, Ahmed Rhallabi, Christophe Cardinaud, Aurelie Girard, Marie-Claude Fernandez, Mohamed Boufnichel and Fabrice Roqueta. Journal of Vacuum Science & Technology A 2018, 36, 03E109
- Vectorial method used to monitor an evolving system: Titanium oxide thin films under UV illumination.
Solene Bechu, Bernard Humbert, Vincent Fernandez, Neal Fairley and Mireille Richard-Plouet. Appl. Surf. Sci. 2018, 447, 528-534
- X-ray photoelectron spectroscopy analysis of Ge-Sb-Se pulsed laser deposited thin films.
Emeline Baudet, Christophe Cardinaud, Remi Boidin, Aurelie Girard, Jan Gutwirth, Petr Nemec and Virginie Nazabal. J. Am. Ceram. Soc. 2018, 101, 3347-3356
- Covalent functionalization of polycrystalline silicon nanoribbons applied to Pb(II) electrical detection.
Brice Le Borgne, Aurelie Girard, Christophe Cardinaud, Anne-Claire Salaun, Laurent Pichon and Florence Geneste. Sens. Actuators, B 2018, 268, 368-375
- Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering.
A. Bachar, A. Bousquet, H. Mehdi, G. Monier, C. Robert-Goumet, L. Thomas, M. Belmahi, A. Goullet, T. Sauvage and E. Tomasella. Appl. Surf. Sci. 2018, 444, 293-302
- Different threshold and bipolar resistive switching mechanisms in reactively sputtered amorphous undoped and Cr-doped vanadium oxide thin films.
Jonathan A J. Rupp, Madec Querre, Andreas Kindsmueller, Marie-Paule Besland, Etienne Janod, Regina Dittmann, Rainer Waser and Dirk J. Wouters. J. Appl. Phys. 2018, 123, 044502
- A General Approach Based on Sampled-Current Voltammetry for Minimizing Electrode Fouling in Electroanalytical Detection.
Isabelle Mazerie, Pierre Didier, Florence Razan, Philippe Hapiot, Nathalie Coulon, Aurelie Girard, Olivier de Sagazan, Didier Floner and Florence Geneste. ChemElectroChem 2018, 5, 144-152
2017
- Growth control of carbon nanotubes using nanocomposite nickel/carbon thin films.
N. Bouts, M. Gaillard, L. Donero, A A. El Mel, E. Gautron, B. Angleraud, C. Boulmer-Leborgne and P Y. Tessier. Thin Solid Films 2017, 630, 38-47
- Tailoring the chemistry and the nano-architecture of organic thin films using cold plasma processes.
Damien Thiry, Adrien Chauvin, Abdel-Aziz El Mel, Christophe Cardinaud, Jonathan Hamon, Eric Gautron, Nicolas Stephant, Agnes Granier and Pierre-Yves Tessier. Plasma Processes Polym. 2017, 14, e1700042
- Interface Engineering in CuInSe2 Solar Cells Using Ammonium Sulfide Vapors.
Marie Buffiere, Thomas Lepetit, Samira Khelifi and Abdel-Aziz El Mel. Solar Rrl 2017, 1, UNSP 1700067
- TiO2 Anatase Solutions for Electron Transporting Layers in Organic Photovoltaic Cells.
Moustafa El Kass, Luc Brohan, Nicolas Gautier, Solene Bechu, Celine David, Noella Lemaitre, Solenn Berson and Mireille Richard-Plouet. ChemPhysChem 2017, 18, 2390-2396
- Kirkendall Effect vs Corrosion of Silver Nanocrystals by Atomic Oxygen: From Solid Metal Silver to Nanoporous Silver Oxide.
Abdel-Aziz El Mel, Nicolas Stephant, Leopoldo Molina-Luna, Eric Gautron, Yousef Haik, Nouar Tabet, Pierre-Yves Tessier and Romain Gautier. J. Phys. Chem. C 2017, 121, 19497-19504
- Effect of ammonium sulfide treatments on the surface properties of Cu2ZnSnSe4 thin films.
Marie Buffiere, Guy Brammertz, Abdel-Aziz El Mel, Nicolas Barreau, Marc Meuris and Jef Poortmans. Thin Solid Films 2017, 633, 135-140
- Criteria to define a more relevant reference sample of titanium dioxide in the context of food: a multiscale approach.
William Dudefoi, Helene Terrisse, Mireille Richard-Plouet, Eric Gautron, Florin Popa, Bernard Humbert and Marie-Helene Ropers. Food Additives and Contaminants Part a-Chemistry Analysis Control Exposure & Risk Assessment 2017, 34, 653-665
- Large-Scale Fabrication of Porous Gold Nanowires via Laser Interference Lithography and Dealloying of Gold-Silver Nano-Alloys.
Adrien Chauvin, Nicolas Stephant, Ke Du, Junjun Ding, Ishan Wathuthanthri, Chang-Hwan Choi, Pierre-Yves Tessier and Abdel-Aziz El Mel. Micromachines 2017, 8, 168
- Experimental design approach for deposition optimization of RF sputtered chalcogenide thin films devoted to environmental optical sensors.
E. Baudet, M. Sergent, P. Nemec, C. Cardinaud, E. Rinnert, K. Michel, L. Jouany, B. Bureau and V. Nazabal. Scientific Reports 2017, 7, 3500
- Optical properties of TixSi1-xO2 solid solutions.
Pavel Ondracka, David Holec, David Necas, Eva Kedronova, Stephane Elisabeth, Antoine Goullet and Lenka Zajickova. Phys. Rev. B 2017, 95, 195163
- Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process.
Guillaume Le Dain, Ahmed Rhallabi, Marie Claude Fernandez, Mohamed Boufnichel and Fabrice Roqueta. Journal of Vacuum Science & Technology A 2017, 35, 03E113
- Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering.
Julien Keraudy, Brice Delfour-Peyrethon, Axel Ferrec, Javier Garcia Molleja, Mireille Richard-Plouet, Christophe Payen, Jonathan Hamon, Benoit Corraze, Antoine Goullet and Pierre-Yves Jouan. J. Appl. Phys. 2017, 121, 171916
- Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties.
Julien Keraudy, Axel Ferrec, Mireille Richard-Plouet, Jonathan Hamon, Antoine Goullet and Pierre-Yves Jouan. Appl. Surf. Sci. 2017, 409, 77-84
- Effect of temperature on the synthesis of nanoporous carbon from copper/carbon thin films to nanoporous carbon for sensing applications.
L. Donero, N. Bouts, A A. El Mel, B. Le Borgne, E. Gautron, L. Le Brizoual, F. Le Bihan and P Y. Tessier. Thin Solid Films 2017, 630, 59-65
- A Leaky-Integrate-and-Fire Neuron Analog Realized with a Mott Insulator.
Pablo Stoliar, Julien Tranchant, Benoit Corraze, Etienne Janod, Marie-Paule Besland, Federico Tesler, Marcelo Rozenberg and Laurent Cario. Adv. Funct. Mater. 2017, 27, 1604740
- Electrical behavior of nickel/carbon nanocomposite thin films.
Nicolas Bouts, Benoit Angleraud, Maria Dolores Ynsa, Bernard Humbert, Miguel Manso, Abdel-Aziz El Mel and Pierre-Yves Tessier. CARBON 2017, 111, 878-886
2016
- PMMA removal selectivity to polystyrene using dry etch approach.
Aurelien Sarrazin, Nicolas Posseme, Patricia Pimenta-Barros, Sebastien Barnola, Ahmed Gharbi, Maxime Argoud, Raluca Tiron and Christophe Cardinaud. J. Vac. Sci. Technol. B 2016, 34, 061802
- Simulation of cryogenic silicon etching under SF6/O-2/Ar plasma discharge.
Yehya Haidar, Ahmed Rhallabi, Amand Pateau, Arezki Mokrani, Fadia Taher, Fabrice Roqueta and Mohamed Boufnichel. J. Vac. Sci. Technol. A 2016, 34, 061306
- Metal-insulator transitions in (V1-xCrx)(2)O-3 thin films deposited by reactive direct current magnetron co-sputtering.
Madec Querre, Etienne Janod, Laurent Cario, Julien Tranchant, Benoit Corraze, Valérie Bouquet, Stephanie Deputier, Stephane Cordier, Maryline Guilloux-Viry and Marie-Paule Besland. Thin Solid Films 2016, 617, 56-62
- Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications.
Dayu Li, Stephane Elisabeth, Agnes Granier, Michele Carette, Antoine Goullet and Jean-Pierre Landesman. Plasma Process. Polym. 2016, 13, 918-928
- Impact of the morphology and composition on the dealloying process of co-sputtered silver-aluminum alloy thin films.
Adrien Chauvin, Willigis Txia Cha Heu, Pierre-Yves Tessier and Abdel-Aziz El Mel. Phys. Status Solidi B-Basic Solid State Phys. 2016, 253, 2167-2174
- Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation.
Abdel-Aziz El Mel, Nicolas Stephant and Romain Gautier. Nanoscale 2016, 8, 17108-17112
- Mass spectrometry analyzes to highlight differences between short and long HiPIMS discharges.
Axel Ferrec, Julien Keraudy and Pierre-Yves Jouan. Appl. Surf. Sci. 2016, 390, 497-505
- Dealloying of gold-copper alloy nanowires: From hillocks to ring-shaped nanopores.
Adrien Chauvin, Cyril Delacote, Mohammed Boujtita, Benoit Angleraud, Junjun Ding, Chang-Hwan Choi, Pierre-Yves Tessier and Abdel-Aziz El Mel. Beilstein J. Nanotechnol. 2016, 7, 1361-1367
- Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition.
D. Li, A. Goullet, M. Carette, A. Granier and J P. Landesman. Mater. Chem. Phys. 2016, 182, 409-417
- Ca/Alq(3) hybrid cathode buffer layer for the optimization of organic solar cells based on a planar heterojunction.
Z. El Jouad, L. Barkat, N. Stephant, L. Cattin, N. Hamzaoui, A. Khelil, M. Ghamnia, M. Addou, M. Morsli, S. Bechu, C. Cabanetos, M. Richard-Plouet, P. Blanchard and J C. Bernede. J. Phys. Chem. Solids 2016, 98, 128-135
- Galvanic Replacement Reaction: A Route to Highly Ordered Bimetallic Nanotubes.
Abdel-Aziz El Mel, Meriem Chettab, Eric Gautron, Adrien Chauvin, Bernard Humbert, Jean-Yves Mevellec, Cyril Delacote, Damien Thiry, Nicolas Stephant, Junjun Ding, Ke Du, Chang-Hwan Choi and Pierre-Yves Tessier. J. Phys. Chem. C 2016, 120, 17652-17659
- Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor.
D. Li, A. Goullet, M. Carette, A. Granier, Y. Zhang and J P. Landesman. Vacuum 2016, 131, 231-239
- Influence of Mo/MoSe2 microstructure on the damp heat stability of the Cu(In,Ga)Se2 back contact molybdenum.
Mirjam Theelen, Sylvie Harel, Melvin Verschuren, Mathieu Tomassini, Arjan Hovestad, Nicolas Barreau, Jurgen van Berkum, Zeger Vroon and Miro Zeman. Thin Solid Films 2016, 612, 381-392
- In situ conversion of nanostructures from solid to hollow in transmission electron microscopes using electron beam.
Abdel-Aziz El Mel and Carla Bittencourt. Nanoscale 2016, 8, 10876-10884
- Monte Carlo Poration Model of Cell Membranes for Application to Plasma Gene Transfection.
Amel Zerrouki, Mohammed Yousfi, Ahmed Rhallabi, Hideki Motomura and Masafumi Jinno. Plasma Processes Polym. 2016, 13, 633-648
- Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells.
Jean-Pierre Landesman, Juan Jimenez, Christophe Levallois, Frederic Pommereau, Cesare Frigeri, Alfredo Torres, Yoan Leger, Alexandre Beck and Ahmed Rhallabi. Journal of Vacuum Science & Technology A 2016, 34, 041304
- Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies.
E. Baudet, C. Cardinaud, A. Girard, E. Rinnert, K. Michel, B. Bureau and V. Nazabal. J. Non-Cryst. Solids 2016, 444, 64-72
- Controlling the Formation of Nanocavities in Kirkendall Nanoobjects through Sequential Thermal Ex Situ Oxidation and In Situ Reduction Reactions.
Abdel-Aziz El Mel, Pierre-Yves Tessier, Marie Buffiere, Eric Gautron, Junjun Ding, Ke Du, Chang-Hwan Choi, Stephanos Konstantinidis, Rony Snyders, Carla Bittencourt and Leopoldo Molina-Luna. Small 2016, 12, 2885-2892
- Plasma diagnostics for the low-pressure plasma polymerization process: A critical review.
Damien Thiry, Stephanos Konstantinidis, Jorome Cornil and Rony Snyders. Thin Solid Films 2016, 606, 19-44
- Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications.
A. Rouahi, F. Challali, I. Dakhlaoui, C. Vallee, S. Salimy, F. Jomni, B. Yangui, M P. Besland, A. Goullet and A. Sylvestre. Thin Solid Films 2016, 606, 127-132
- Developments in numerical treatments for large data sets of XPS images.
Solene Bechu, Mireille Richard-Plouet, Vincent Fernandez, John Walton and Neal Fairley. Surf. Interface Anal. 2016, 48, 301-309
- Planar Arrays of Nanoporous Gold Nanowires: When Electrochemical Dealloying Meets Nanopatterning.
Adrien Chauvin, Cyril Delacote, Leopoldo Molina-Luna, Michael Duerrschnabel, Mohammed Boujtita, Damien Thiry, Ke Du, Junjun Ding, Chang-Hwan Choi, Pierre-Yves Tessier and Abdel-Aziz El Mel. ACS Appl. Mater. Interfaces 2016, 8, 6611-6620
- Creating nanoporosity in silver nanocolumns by direct exposure to radio-frequency air plasma.
Abdel-Aziz El Mel, Nicolas Stephant, Jonathan Hamon, Damien Thiry, Adrien Chauvin, Meriem Chettab, Eric Gautron, Stephanos Konstantinidis, Agnes Granier and Pierre-Yves Tessier. Nanoscale 2016, 8, 141-148
2015
- Combined optical emission and resonant absorption diagnostics of an Ar-O-2-Ce-reactive magnetron sputtering discharge.
A A. El Mel, S. Ershov, N. Britun, A. Ricard, S. Konstantinidis and R. Snyders. Spectroc. Acta Pt. B-Atom. Spectr. 2015, 103, 99-105
- Plasma functionalization and etching for enhancing metal adhesion onto polymeric substrates.
C. Lambare, P -Y. Tessier, F. Poncin-Epaillard and D. Debarnot. RSC Adv. 2015, 5, 62348-62357
- Control of resistive switching in AM(4)Q(8) narrow gap Mott insulators: A first step towards neuromorphic applications.
Julien Tranchant, Etienne Janod, Benoit Corraze, Pablo Stoliar, Marcelo Rozenberg, Marie-Paule Besland and Laurent Cario. Phys. Status Solidi A-Appl. Mat. 2015, 212, 239-244
- Unusual Dealloying Effect in Gold/Copper Alloy Thin Films: The Role of Defects and Column Boundaries in the Formation of Nanoporous Gold.
Abdel-Aziz El Mel, Farah Boukli-Hacene, Leopoldo Molina-Luna, Nicolas Bouts, Adrien Chauvin, Damien Thiry, Eric Gautron, Nicolas Gautier and Pierre-Yves Tessier. ACS Appl. Mater. Interfaces 2015, 7, 2310-2321
- Sponge-like carbon thin films: The dealloying concept applied to copper/carbon nanocomposite.
Nicolas Bouts, Abdel-Aziz El Mel, Benoit Angleraud and Pierre-Yves Tessier. CARBON 2015, 83, 250-261
- Surface Cleaning and Passivation Using (NH4)(2)S Treatment for Cu(In,Ga)Se-2 Solar Cells: A Safe Alternative to KCN.
Marie Buffiere, Abdel-Aziz El Mel, Nick Lenaers, Guy Brammertz, Armin E. Zaghi, Marc Meuris and Jef Poortmans. Adv. Energy Mater. 2015, 5, 1401689
- Studies of CdS/CdTe interface: Comparison of CdS films deposited by close space sublimation and chemical bath deposition techniques.
Jun-feng Han, Gan-hua Fu, V. Krishnakumar, Hermann-Josef Schimper, Cheng Liao, Wolfram Jaegermann and M P. Besland. Thin Solid Films 2015, 582, 290-294
- The Kirkendall effect and nanoscience: hollow nanospheres and nanotubes.
Abdel-Aziz El Mel, Ryusuke Nakamura and Carla Bittencourt. Beilstein J. Nanotechnol. 2015, 6, 1348-1361
- Surface evolution of sputtered Cu(In,Ga)Se-2 thin films under various annealing temperatures.
Jun-feng Han, Liang-qi Ouyang, Da-ming Zhuang, Ming Zhao, Cheng Liao, Jiang Liu, Limei Cha and M -P. Besland. J. Mater. Sci.-Mater. Electron. 2015, 26, 4840-4847
- Synthesis of CdS with Large Band Gap Values by a Simple Route at Room Temperature.
Li Hui, Liu Xiang-Xin, Zhang Yu-Feng, Du Zhong-Ming, Yang Biao, Han Jun-feng and Marie-Paule Besland. Acta Phys.-Chim. Sin. 2015, 31, 1338-1344
- KCN Chemical Etch for Interface Engineering in Cu2ZnSnSe4 Solar Cells.
Marie Buffiere, Guy Brammertz, Sylvester Sahayaraj, Maria Batuk, Samira Khelifi, Denis Mangin, Abdel-Aziz El Mel, Ludovic Arzel, Joke Hadermann, Marc Meuris and Jef Poortmans. ACS Appl. Mater. Interfaces 2015, 7, 14690-14698
- Microstructure and optical properties of cobalt-carbon nanocomposites prepared by RF-sputtering.
Mehrdad Molamohammadi, Ali Arman, Amine Achour, Bandar Astinchap, Azin Ahmadpourian, Arash Boochani, Sirvan Naderi and Arman Ahmadpourian. J. Mater. Sci.-Mater. Electron. 2015, 26, 5964-5969
- Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour.
J P. Landesman, C. Levallois, J. Jimenez, F. Pommereau, Y. Leger, A. Beck, T. Delhaye, A. Torres, C. Frigeri and A. Rhallabi. Microelectron. Reliab. 2015, 55, 1750-1753
- Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Thin Solid Films 2015, 589, 783-791
- Surface chemistry of InP ridge structures etched in Cl-2-based plasma analyzed with angular XPS.
Sophie Bouchoule, Romain Chanson, Arnaud Pageau, Edmond Cambril, Stephane Guilet, Ahmed Rhallabi and Christophe Cardinaud. J. Vac. Sci. Technol. A 2015, 33, 05E124
- The Kirkendall Effect in Binary Alloys: Trapping Gold in Copper Oxide Nanoshells.
Damien Thiry, Leopoldo Molina-Luna, Eric Gautron, Nicolas Stephant, Adrien Chauvin, Ke Du, Junjun Ding, Chang-Hwan Choi, Pierre-Yves Tessier and Abdel-Aziz El Mel. Chem. Mat. 2015, 27, 6374-6384
- Resistive Switching in Mott Insulators and Correlated Systems.
Etienne Janod, Julien Tranchant, Benoit Corraze, Madec Querre, Pablo Stoliar, Marcelo Rozenberg, Tristan Cren, Dimitri Roditchev, Vinh Ta Phuoc, Marie-Paule Besland and Laurent Cario. Adv. Funct. Mater. 2015, 25, 6287-6305
- Investigation of oxide layer on CdTe film surface and its effect on the device performance.
Han Jun-feng, Xiao Liu, Cha Li-mei, Jonathan Hamon and M P. Besland. Mater. Sci. Semicond. Process 2015, 40, 402-406
- Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering.
J. Keraudy, Garcia J. Molleja, A. Ferrec, B. Corraze, M. Richard-Plouet, A. Goullet and P -Y. Jouan. Appl. Surf. Sci. 2015, 357, 838-844
2014
- Zn based nanoparticle-carbon nanotube hybrid materials, Interaction and charge transfer.
Abdel-Aziz El Mel, Marie Buffiere, Chris P. Ewels, Leopoldo Molina-Luna, Eric Faulques, Jean-Francois Colomer, Hans-Joachim Kleebe, Stephanos Konstantinidis, Rony Snyders and Carla Bittencourt. CARBON 2014, 66, 442-449
- Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures.
Ait K. Aissa, A. Achour, J. Camus, L. Le Brizoual, P -Y. Jouan and M -A. Djouadi. Thin Solid Films 2014, 550, 264-267
- Investigation of Cu(In,Ga)Se-2 polycrystalline growth, Ga diffusion and surface morphology evolution.
Jun-feng Han, Cheng Liao, Tao Jiang, Hua-mu Xie and Kui Zhao. Mater. Res. Bull. 2014, 49, 187-192
- X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl-2-based inductively coupled plasma.
Romain Chanson, Sophie Bouchoule, Christophe Cardinaud, Camille Petit-Etienne, Edmond Cambril, Ahmed Rhallabi, Stephane Guilet and Elisabeth Blanquet. J. Vac. Sci. Technol. B 2014, 32, 011219
- Theoretical and experimental investigation of Lamb waves characteristics in AlN/TiN and AlN/TiN/NCD composite membranes.
A. Soltani, A. Talbi, J -C. Gerbedoen, J -C. De Jaeger, P. Pernod, V. Mortet and A. Bassam. 2014 Ieee International Ultrasonics Symposium (ius) 2014, 2047-2050
- Electron Beam Nanosculpting of Kirkendall Oxide Nanochannels.
Abdel-Aziz El Mel, Leopoldo Molina-Luna, Marie Buffiere, Pierre-Yves Tessier, Ke Du, Chang-Hwan Choi, Hans-Joachim Kleebe, Stephanos Konstantinidis, Carla Bittencourt and Rony Snyders. ACS Nano 2014, 8, 1854-1861
- Modeling of inductively coupled plasma SF6/O-2/Ar plasma discharge, Effect of O-2 on the plasma kinetic properties.
Amand Pateau, Ahmed Rhallabi, Marie-Claude Fernandez, Mohamed Boufnichel and Fabrice Roqueta. J. Vac. Sci. Technol. A 2014, 32, 021303
- Quantitative Auger Electron Spectroscopic Analysis of Hg1-x Cd (x) Te.
A. Gaucher, E. Martinez, J. Baylet and C. Cardinaud. J. Electron. Mater. 2014, 43, 1255-1262
- Investigation of chalcopyrite film growth at various temperatures, analyses from top to the bottom of the thin films.
Jun-feng Han, Cheng Liao, Tao Jiang, Hua-mu Xie, Kui Zhao and M -P. Besland. J. Mater. Sci.-Mater. Electron. 2014, 25, 2237-2243
- Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H-2/N-2/Ar/Hexamethyldisilazane Gas Mixture.
Mohammed Belmahi, Simon Bulou, Amanda Thouvenin, Ludovic de Poucques, Robert Hugon, Laurent Le Brizoual, Patrice Miska, Damien Geneve, Jean-Luc Vasseur and Jamal Bougdira. Plasma Process. Polym. 2014, 11, 551-558
- A study of different selenium sources in the synthesis processes of chalcopyrite semiconductors.
Jun-feng Han, Cheng Liao, Eric Gautron, Tao Jiang, Hua-mu Xie, Kui Zhao and M -P. Besland. Vacuum 2014, 105, 46-51
- Quantitative Auger Electron Spectroscopy Analysis of Hg1-x Cd (x) Te (vol 43, pg 1255, 2014).
A. Gaucher, E. Martinez, J. Baylet and C. Cardinaud. J. Electron. Mater. 2014, 43, 2770-2770
- Correlation between mass-spectrometer measurements and thin film characteristics using dcMS and HiPIMS discharges.
A. Ferrec, J. Keraudy, S. Jacq, F. Schuster, P -Y. Jouan and M A. Djouadi. Surf. Coat. Technol. 2014, 250, 52-56
- Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS.
D T. Nguyen, A. Ferrec, J. Keraudy, M. Richard-Plouet, A. Goullet, L. Cattin, L. Brohan and P -Y. Jouan. Surf. Coat. Technol. 2014, 250, 21-25
- Effect of the deposition conditions of NiO anode buffer layers in organic solar cells, on the properties of these cells.
D T. Nguyen, A. Ferrec, J. Keraudy, J C. Bernede, N. Stephant, L. Cattin and P -Y. Jouan. Appl. Surf. Sci. 2014, 311, 110-116
- Effect of doping on the modification of polycrystalline silicon by spontaneous reduction of diazonium salts.
A. Girard, N. Coulon, C. Cardinaud, T. Mohammed-Brahim and F. Geneste. Appl. Surf. Sci. 2014, 314, 358-366
- Titanium carbide/carbon nanocomposite hard coatings: A comparative study between various chemical analysis tools.
A A. El Mel, E. Gautron, F. Christien, B. Angleraud, A. Granier, P. Soucek, P. Vasina, V. Bursikova, M. Takashima, N. Ohtake, H. Akasaka, T. Suzuki and P Y. Tessier. Surf. Coat. Technol. 2014, 256, 41-46
- TEM and XPS studies on CdS/CIGS interfaces.
Jun-feng Han, Cheng Liao, Li-mei Cha, Tao Jiang, Hua-mu Xie, Kui Zhao and M -P. Besland. J. Phys. Chem. Solids 2014, 75, 1279-1283
- Raman and XPS studies of CIGS/Mo interfaces under various annealing temperatures.
Junfeng Han, Liangqi Ouyang, Daming Zhuang, Cheng Liao, Jiang Liu, Ming Zhao, Li-mei Cha and M -P. Besland. Mater. Lett. 2014, 136, 278-281
- SF6 and C4F8 global kinetic models coupled to sheath models.
Yehya Haidar, Amand Pateau, Ahmed Rhallabi, Marie Claude Fernandez, Arezki Mokrani, Fadia Taher, Fabrice Roqueta and Mohamed Boufnichel. Plasma Sources Sci. Technol. 2014, 23, 065037
2013
- Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures.
Maria-Elena Vlachopoulou, George Kokkoris, Christophe Cardinaud, Evangelos Gogolides and Angeliki Tserepi. Plasma Process. Polym. 2013, 10, 29-40
- Modeling of inductively coupled plasma Ar/Cl-2/N-2 plasma discharge: Effect of N-2 on the plasma properties.
Romain Chanson, Ahmed Rhallabi, Marie Claude Fernandez, Christophe Cardinaud and Jean Pierre Landesman. J. Vac. Sci. Technol. A 2013, 31, 011301
- Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering.
S. Salimy, F. Challali, A. Goullet, M -P. Besland, M. Carette, N. Gautier, A. Rhallabi, J P. Landesman, S. Toutain and D. Averty. ECS Solid State Lett. 2013, 2, Q13-Q15
- Improved photoconductive properties of composite nanofibers based on aligned conjugated polymer and single-walled carbon nanotubes.
Florian Massuyeau, Yuanchun Zhao, Abdel Aziz El Mel, Abu Yaya, Frederic Geschier, Eric Gautron, Serge Lefrant, Jean Yves Mevellec, Chris Ewels, Chain-Shu Hsu, Eric Faulques, Jany Wery and Jean Luc Duvail. Nano Res. 2013, 6, 149-158
- Thermal properties of carbon nanowall layers measured by a pulsed photothermal technique.
A. Achour, B E. Belkerk, Ait K. Aissa, S. Vizireanu, E. Gautron, M. Carette, P -Y. Jouan, G. Dinescu, L. Le Brizoual, Y. Scudeller and M -A. Djouadi. Appl. Phys. Lett. 2013, 102, 061903
- Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect.
A. Rouahi, A. Kahouli, F. Challali, M P. Besland, C. Vallee, B. Yangui, S. Salimy, A. Goullet and A. Sylvestre. J. Phys. D-Appl. Phys. 2013, 46, 065308
- Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution.
Romain Chanson, Ahmed Rhallabi, Marie Claude Fernandez and Christophe Cardinaud. Plasma Process. Polym. 2013, 10, 213-224
- Carbon nanotube growth at 420 degrees C using nickel/carbon composite thin films as catalyst supports.
A. Achour, A A. El Mel, N. Bouts, E. Gautron, E. Grigore, B. Angleraud, L. Le Brizoual, P Y. Tessier and M A. Djouadi. Diam. Relat. Mat. 2013, 34, 76-83
- Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy.
A. Stolz, A. Soltani, B. Abdallah, J. Charrier, D. Deresmes, P -Y. Jouan, M A. Djouadi, E. Dogheche and J -C. De Jaeger. Thin Solid Films 2013, 534, 442-445
- Electrochemical anodic oxidation of nitrogen doped carbon nanowall films: X-ray photoelectron and Micro-Raman spectroscopy study.
A. Achour, S. Vizireanu, G. Dinescu, L. Le Brizoual, M -A. Djouadi and M. Boujtita. Appl. Surf. Sci. 2013, 273, 49-57
- Platinum and palladium on carbon nanotubes: Experimental and theoretical studies.
J J. Adjizian, P. De Marco, I. Suarez-Martinez, A A. El Mel, R. Snyders, R Y N. Gengler, P. Rudolf, X. Ke, G. Van Tendeloo, C. Bittencourt and C P. Ewels. Chem. Phys. Lett. 2013, 571, 44-48
- X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma.
F. Salah, B. Harzallah, A. van der Lee, B. Angleraud, T. Begou and A. Granier. Thin Solid Films 2013, 537, 102-107
- Ultra-thin films on transparent conductor oxides for the development of spectro-electrochemical transducers.
E. Grigore, C. Delacote, C. Thobie-Gautier, M. Boujtita and P Y. Tessier. Appl. Surf. Sci. 2013, 276, 306-311
- Enhancement of near-band edge photoluminescence of ZnO film buffered with TiN.
A. Achour, Ait K. Aissa, M. Mbarek, K. El Hadj, N. Ouldhamadouche, N. Barreau, L. Le Brizoual and M A. Djouadi. Thin Solid Films 2013, 538, 71-77
- Growth control, structure, chemical state, and photoresponse of CuO-CdS core-shell heterostructure nanowires.
A A. El Mel, M. Buffiere, N. Bouts, E. Gautron, P Y. Tessier, K. Henzler, P. Guttmann, S. Konstantinidis, C. Bittencourt and R. Snyders. Nanotechnology 2013, 24, 265603
- CdS annealing treatments in various atmospheres and effects on performances of CdTe/CdS solar cells.
Jun-feng Han, Gan-hua Fu, V. Krishnakumar, Cheng Liao and Wolfram Jaegermann. J. Mater. Sci.-Mater. Electron. 2013, 24, 2695-2700
- Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale.
Abdel-Aziz El Mel, Marie Buffiere, Pierre-Yves Tessier, Stephanos Konstantinidis, Wei Xu, Ke Du, Ishan Wathuthanthri, Chang-Hwan Choi, Carla Bittencourt and Rony Snyders. Small 2013, 9, 2838-2843
- SiGe derivatization by spontaneous reduction of aryl diazonium salts.
A. Girard, F. Geneste, N. Coulon, C. Cardinaud and T. Mohammed-Brahim. Appl. Surf. Sci. 2013, 282, 146-155
- H atom surface loss kinetics in pulsed inductively coupled plasmas.
S. Jacq, C. Cardinaud, L. Le Brizoual and A. Granier. Plasma Sources Sci. Technol. 2013, 22, 055004
- In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Appl. Surf. Sci. 2013, 283, 234-239
- Characterization of Plasma Etching Process Damage in HgCdTe.
A. Gaucher, J. Baylet, J. Rothman, E. Martinez and C. Cardinaud. J. Electron. Mater. 2013, 42, 3006-3014
- Investigation of chalcopyrite film growth: an evolution of thin film morphology and structure during selenization.
Jun-feng Han, Cheng Liao, Tao Jiang and Hua-mu Xie. J. Mater. Sci.-Mater. Electron. 2013, 24, 4636-4642
- RF sputtered amorphous chalcogenide thin films for surface enhanced infrared absorption spectroscopy.
F. Verger, V. Nazabal, F. Colas, P. Nemec, C. Cardinaud, E. Baudet, R. Chahal, E. Rinnert, K. Boukerma, I. Peron, S. Deputier, M. Guilloux-Viry, J P. Guin, H. Lhermite, A. Moreac, C. Compere and B. Bureau. Opt. Mater. Express 2013, 3, 2112-2131
2012
- Preparation and photocatalytic properties of quartz/gold nanostructures/TiO2 lamellar structures.
Fatiha Barka-Bouaifel, Karim Makaoui, Pierre-Yves Jouan, Xavier Castel, Nacer Bezzi, Rabah Boukherroub and Sabine Szunerits. RSC Adv. 2012, 2, 12482-12488
- Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering.
C. Duquenne, M -P. Besland, P Y. Tessier, E. Gautron, Y. Scudeller and D. Averty. J. Phys. D-Appl. Phys. 2012, 45, 015301
- Composition-Property Correlation in B2O3-SiO2 Preform Rods Produced Using Modified Chemical Vapor Deposition Technique.
Mohammad Islam and Muhammad Rizwan Saleem. J. Mater. Eng. Perform. 2012, 21, 202-207
- Deposition of nickel oxide by direct current reactive sputtering Effect of oxygen partial pressure.
A. Karpinski, A. Ferrec, M. Richard-Plouet, L. Cattin, M A. Djouadi, L. Brohan and P -Y. Jouan. Thin Solid Films 2012, 520, 3609-3613
- Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP.
R. Chanson, A. Rhallabi, M C. Fernandez, C. Cardinaud, S. Bouchoule, L. Gatilova and A. Talneau. IEEE Trans. Plasma Sci. 2012, 40, 959-971
- Effect of Cl-2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy.
S. Bouchoule, L. Vallier, G. Patriarche, T. Chevolleau and C. Cardinaud. J. Vac. Sci. Technol. A 2012, 30, 031301
- Structural and photoluminescence characterization of vertically aligned multiwalled carbon nanotubes coated with ZnO by magnetron sputtering.
N. Ouldhamadouche, A. Achour, I. Musa, Ait K. Aissa, F. Massuyeau, P Y. Jouan, M. Kechouane, L. Le Brizoual, E. Faulques, N. Barreau and M A. Djouadi. Thin Solid Films 2012, 520, 4816-4819
- Shape control of nickel nanostructures incorporated in amorphous carbon films: From globular nanoparticles toward aligned nanowires.
A A. El Mel, N. Bouts, E. Grigore, E. Gautron, A. Granier, B. Angleraud and P Y. Tessier. J. Appl. Phys. 2012, 111, 114309
- XPS study of the band alignment at ITO/oxide (n-type MoO3 or p-type NiO) interface.
J C. Bernede, S. Houari, D. Nguyen, P Y. Jouan, A. Khelil, A. Mokrani, L. Cattin and P. Predeep. Phys. Status Solidi A-Appl. Mat. 2012, 209, 1291-1297
- Fabrication of a nickel nanowire mesh electrode suspended on polymer substrate.
A A. El Mel, E. Gautron, B. Angleraud, A. Granier, W. Xu, C H. Choi, K J. Briston, B J. Inkson and P Y. Tessier. Nanotechnology 2012, 23, 275603
- Measuring thermal conductivity of thin films and coatings with the ultra-fast transient hot-strip technique.
B E. Belkerk, M A. Soussou, M. Carette, M A. Djouadi and Y. Scudeller. J. Phys. D-Appl. Phys. 2012, 45, 295303
- Wide variations of SiCxNy:H thin films optical constants deposited by H-2/N-2/Ar/hexamethyldisilazane microwave plasma.
Simon Bulou, Laurent Le Brizoual, Patrice Miska, Ludovic de Poucques, Jamal Bougdira and Mohammed Belmahi. Surf. Coat. Technol. 2012, 208, 46-50
- Structural-dependent thermal conductivity of aluminium nitride produced by reactive direct current magnetron sputtering.
B E. Belkerk, A. Soussou, M. Carette, M A. Djouadi and Y. Scudeller. Appl. Phys. Lett. 2012, 101, 151908
- Structural characterization and electrochemical behavior of titanium carbon thin films.
E. Grigore, C. Delacote, A A. El Mel, M. Boujtita, A. Granier and P Y. Tessier. Surf. Coat. Technol. 2012, 211, 192-195
- The influence of Ni content on the characteristics of C-Ni thin films.
E. Grigore, A A. El Mel, A. Granier and P Y. Tessier. Surf. Coat. Technol. 2012, 211, 188-191
- Evaluation of composition, mechanical properties and structure of nc-TiC/a-C:H coatings prepared by balanced magnetron sputtering.
Pavel Soucek, Tereza Schmidtova, Lukas Zabransky, Vilma Bursikova, Petr Vasina, Ondfej Caha, Mojmir Jilek, Abdel Aziz El Mel, Pierre-Yves Tessier, Jan Schaefer, Jiri Bursik, Vratislav Perina and Romana Miksova. Surf. Coat. Technol. 2012, 211, 111-116
- PECVD low temperature synthesis of carbon nanotubes coated with aluminum nitride.
A. Tailleur, A. Achour, M A. Djouadi, L. Le Brizoual, E. Gautron and P. Tristant. Surf. Coat. Technol. 2012, 211, 18-23
- Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma.
D. Li, M. Carette, A. Granier, J P. Landesman and A. Goullet. Thin Solid Films 2012, 522, 366-371
- Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range.
A. Rouahi, A. Kahouli, F. Challali, M P. Besland, C. Vallee, S. Pairis, B. Yangui, S. Salimy, A. Goullet and A. Sylvestre. J. Appl. Phys. 2012, 112, 094104
- Ion energy distributions measured inside a high-voltage cathode in a BF3 pulsed dc plasma used for plasma doping: experiments and ab initio calculations.
Ludovic Godet, Svetlana Radovanov, Jay Sheuer, Christophe Cardinaud, Nicolas Fernandez, Yves Ferro and Gilles Cartry. Plasma Sources Sci. Technol. 2012, 21, 065006
- Highly ordered ultralong magnetic nanowires wrapped in stacked graphene layers.
Abdel-Aziz El Mel, Jean-Luc Duvail, Eric Gautron, Wei Xu, Chang-Hwan Choi, Benoit Angleraud, Agnes Granier and Pierre-Yves Tessier. Beilstein J. Nanotechnol. 2012, 3, 846-851
2011
- Atomic scale study of InP etching by Cl-2-Ar ICP plasma discharge.
A. Rhallabi, R. Chanson, J -P. Landesman, C. Cardinaud and M -C. Fernandez. Eur. Phys. J.-Appl. Phys 2011, 53, 33606
- XPS study of the surface composition modification of nc-TiC/C nanocomposite films under in situ argon ion bombardment.
A A. El Mel, B. Angleraud, E. Gautron, A. Granier and P Y. Tessier. Thin Solid Films 2011, 519, 3982-3985
- INFLUENCE OF ANNEALING TREATMENT OF NANO-HYDROXYAPATITE BIOCERAMICS ON THE VIBRATIONAL PROPERTIES.
C S. Ciobanu, E. Andronescu, A. Stoicu, O. Florea, P. Le Coustumer, S. Galaup, A. Djouadi, J Y. Mevellec, I. Musa, F. Massuyeau, A M. Prodan, Khalid Lafdi, R. Trusca, I. Pasuk and D. Predoi. Dig. J. Nanomater. Biostruct. 2011, 6, 609-624
- Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces.
E. Al Alam, I. Cortes, M -P. Besland, A. Goullet, L. Lajaunie, P. Regreny, Y. Cordier, J. Brault, A. Cazarre, K. Isoird, G. Sarrabayrouse and F. Morancho. J. Appl. Phys. 2011, 109, 084511
- Optical characterization of transparent nickel oxide films deposited by.
A. Karpinski, N. Ouldhamadouche, A. Ferrec, L. Cattin, M. Richard-Plouet, L. Brohan, M A. Djouadi and P -Y. Jouan. Thin Solid Films 2011, 519, 5767-5770
- A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis.
Siamak Salimy, Antoine Goullet, Ahmed Rhallabi, Fatiha Challali, Serge Toutain and Jean Claude Saubat. Solid-State Electron. 2011, 61, 38-45
- Influence of synthesis conditions on optical and electrical properties of CaTiO3:Pr3+ thin films deposited by radiofrequency sputtering for electroluminescent device.
Ludovic Sarakha, Thomas Begou, Antoine Goullet, J. Cellier, Angelique Bousquet, E. Tomasella, T. Sauvage, Philippe Boutinaud and Rachid Mahiou. Surf. Coat. Technol. 2011, 205, S250-S253
- Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture.
S. Bulou, L. Le Brizoual, P. Miska, L. de Poucques, R. Hugon, M. Belmahi and J. Bougdira. Surf. Coat. Technol. 2011, 205, S214-S217
- Ultra wide band frequency characterization of integrated TiTaO-based metal-insulator-metal devices.
Thomas Bertaud, Cedric Bermond, Fatiha Challali, Antoine Goullet, Christophe Vallee and Bernard Flechet. J. Appl. Phys. 2011, 110, 044110
- Modelling of fluorine based high density plasma for the etching of silica glasses.
Ludovic Lallement, Ahmed Rhallabi, Christophe Cardinaud and Marie Claude Peignon Fernandez. J. Vac. Sci. Technol. A 2011, 29, 051304
- Hierarchical carbon nanostructure design: ultra-long carbon nanofibers decorated with carbon nanotubes.
A A. El Mel, A. Achour, W. Xu, C H. Choi, E. Gautron, B. Angleraud, A. Granier, L. Le Brizoual, M A. Djouadi and P Y. Tessier. Nanotechnology 2011, 22, 435302
- The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma.
Simon Bulou, Laurent Le Brizoual, Patrice Miska, Ludovic de Poucques, Robert Hugon, Mohammed Belmahi and Jamal Bougdira. Thin Solid Films 2011, 520, 245-250
- Synthesis of nickel-filled carbon nanotubes at 350 degrees C.
A A. El Mel, E. Gautron, B. Angleraud, A. Granier and P Y. Tessier. CARBON 2011, 49, 4595-4598
- Direct Synthesis of ZnO Nanowires on Nanopatterned Surface by Magnetron Sputtering.
Abdel-Aziz El Mel, Marie Buffiere, Florian Massuyeau, Eric Gautron, Wei Xu, Chang-Hwan Choi, Jany Wery, Eric Faulques, Nicolas Barreau and Pierre-Yves Tessier. Chem. Vapor Depos. 2011, 17, 337-341
2010
- Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication.
L. Lallement, C. Gosse, C. Cardinaud, M -C. Peignon-Fernandez and A. Rhallabi. J. Vac. Sci. Technol. A 2010, 28, 277-286
- Microstructure and composition of TiC/a-C:H nanocomposite thin films deposited by a hybrid IPVD/PECVD process.
A A. El Mel, B. Angleraud, E. Gautron, A. Granier and P Y. Tessier. Surf. Coat. Technol. 2010, 204, 1880-1883
- Response to "Comments on 'Carbon nanowalls as material for electrochemical tranducers' " [Appl. Phys. Lett. 96 126102 (2010)].
E. Luais, M. Boujtita, A. Gohier, A. Tailleur, S. Casimirius, M A. Djouadi, A. Granier and P Y. Tessier. Appl. Phys. Lett. 2010, 96, 126103
- Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon.
F. Challali, M P. Besland, D. Benzeggouta, C. Borderon, M C. Hugon, S. Salimy, J C. Saubat, A. Charpentier, D. Averty, A. Goullet and J P. Landesman. Thin Solid Films 2010, 518, 4619-4622
- Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching.
R. Chanson, A. Martin, M. Avella, J. Jimenez, F. Pommereau, J P. Landesman and A. Rhallabi. J. Electron. Mater. 2010, 39, 688-693
- Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering.
S. Rahmane, B. Abdallah, A. Soussou, E. Gautron, P -Y. Jouan, L. Le Brizoual, N. Barreau, A. Soltani and M A. Djouadi. Phys. Status Solidi A-Appl. Mat. 2010, 207, 1604-1608
- Roughening of porous SiCOH materials in fluorocarbon plasmas.
F. Bailly, T. David, T. Chevolleau, M. Darnon, N. Posseme, R. Bouyssou, J. Ducote, O. Joubert and C. Cardinaud. J. Appl. Phys. 2010, 108, 014906
- Influence of Cadmium Composition on CH4-H-2-Based Inductively Coupled Plasma Etching of Hg1-x Cd (x) Te.
F. Boulard, J. Baylet and C. Cardinaud. J. Electron. Mater. 2010, 39, 1256-1261
- AlN/ZnO/Diamond Waveguiding Layer Acoustic Wave Structure: Theoretical and Experimental Results.
Laurent Le Brizoual, Omar Elmazria, Sergei Zhgoon, Akram Soussou, Frederic Sarry and Mohammed Abdou Djouadi. IEEE Trans. Ultrason. Ferroelectr. Freq. Control 2010, 57, 1818-1824
- Wearout estimation using the Robustness Validation methodology for components in 150 degrees C ambient automotive applications.
P. Lecuyer, H. Fremont, J -P. Landesman and M -A. Bahi. Microelectron. Reliab. 2010, 50, 1744-1749
- Titanium carbide/carbon composite nanofibers prepared by a plasma process.
A A. El Mel, E. Gautron, C H. Choi, B. Angleraud, A. Granier and P Y. Tessier. Nanotechnology 2010, 21, 435603
- HiPIMS Ion Energy Distribution Measurements in Reactive Mode.
Pierre-Yves Jouan, Laurent Le Brizoual, Mihai Ganciu, Christophe Cardinaud, Sylvain Tricot and Mohamed-Abdou Djouadi. IEEE Trans. Plasma Sci. 2010, 38, 3089-3094
- Preparation and modification of carbon nanotubes electrodes by cold plasmas processes toward the preparation of amperometric biosensors.
E. Luais, C. Thobie-Gautier, A. Tailleur, M -A. Djouadi, A. Granier, P Y. Tessier, D. Debarnot, F. Poncin-Epaillard and M. Boujtita. Electrochim. Acta 2010, 55, 7916-7922
2009
- Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma.
Agnes Granier, Thomas Begou, K. Makaoui, Akram Soussou, Bruno Beche, Etienne Gaviot, Marie-Paule Besland and Antoine Goullet. Plasma Process. Polym. 2009, 6, S741-S745
- Characterization of a N-2/CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition.
Simon Bulou, Laurent Le Brizoual, Robert Hugon, Ludovic De Poucques, Mohammed Belmahi, Henri-Noel Migeon and Jamal Bougdira. Plasma Process. Polym. 2009, 6, S576-S581
- Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD.
A. Gohier, T M. Minea, S. Point, J -Y. Mevellec, J. Jimenez, M A. Djouadi and A. Granier. Diam. Relat. Mat. 2009, 18, 61-65
- In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process.
J. Pereira, L E. Pichon, R. Dussart, C. Cardinaud, C Y. Duluard, E H. Oubensaid, P. Lefaucheux, M. Boufnichel and P. Ranson. Appl. Phys. Lett. 2009, 94, 071501
- Argon plasma treatment to enhance the electrochemical reactivity of screen-printed carbon surfaces.
F. Ghamouss, E. Luais, C. Thobie-Gautier, P -Y. Tessier and M. Boujtita. Electrochim. Acta 2009, 54, 3026-3032
- Effect of surface finishing such as sand-blasting and CrAlN hard coatings on the cutting edge's peeling tools' wear resistance.
C. Nouveau, C. Labidi, R. Collet, Y. Benlatreche and M -A. Djouadi. Wear 2009, 267, 1062-1067
- Effect of Ar and N-2 addition on CH4-H-2 based chemistry inductively coupled plasma etching of HgCdTe.
F. Boulard, J. Baylet and C. Cardinaud. J. Vac. Sci. Technol. A 2009, 27, 855-861
- Carbon nanowalls as material for electrochemical transducers.
E. Luais, M. Boujtita, A. Gohier, A. Tailleur, S. Casimirius, M A. Djouadi, A. Granier and P Y. Tessier. Appl. Phys. Lett. 2009, 95, 014104
- Advantages of depositing multilayer coatings for cutting wood-based products.
D. Pinheiro, M T. Vieira and M -A. Djouadi. Surf. Coat. Technol. 2009, 203, 3197-3205
- A new methodology for the identification of ball bond degradation during high-temperature aging tests on devices in standard plastic packages.
Manoubi Auguste Bahi, Helene Fremont, Jean-Pierre Landesman, Annabelle Gentil and Pascal Lecuyer. Microelectron. Reliab. 2009, 49, 1273-1277
- Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR.
B. Bouchet-Fabre, V. Fernandez, A. Gohier, Ph Parent, C. Laffon, B. Angleraud, P Y. Tessier and T M. Minea. Diam. Relat. Mat. 2009, 18, 1091-1097
- Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon-metal nanocomposite thin films.
P Y. Tessier, R. Issaoui, E. Luais, M. Boujtita, A. Granier and B. Angleraud. Solid State Sci. 2009, 11, 1824-1827
- Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces.
K. Tsougeni, N. Vourdas, A. Tserepi, E. Gogolides and C. Cardinaud. Langmuir 2009, 25, 11748-11759
- Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition.
Gustavo Sanchez, B. Abdallah, P. Tristant, C. Dublanche-Tixier, M A. Djouadi, M P. Besland, P Y. Jouan and A. Bologna Alles. J. Mater. Sci. 2009, 44, 6125-6134
- AlN/ZnO/diamond structure combining isolated and surface acoustic waves.
Omar Elmazria, Sergei Zhgoon, Laurent Le Brizoual, Frederic Sarry, Dmitry Tsimbal and Mohammed Abdou Djouadi. Appl. Phys. Lett. 2009, 95, 233503
2008
- Electrical properties and interfacial characteristics of RuO2/HfAlOx/SiON/Si and RuO2/LaAlO3/SiON/Si capacitors.
V. Edon, Z. Li, M -C. Hugon, C. Krug, K P. Bastos, L. Miotti, I J R. Baumvol, C. Cardinaud, O. Durand and C. Eypert. J. Electrochem. Soc. 2008, 155, H661-H668
- Small scale mechanical properties of polycrystalline materials: in situ diffraction studies.
B. Girault, V. Vidal, L. Thilly, P -O. Renault, P. Goudeau, E. LeBourhis, P. Villain-Valat, G. Geandier, J. Tranchant, J -P. Landesman, P -Y. Tessier, B. Angleraud, M -P. Besland, A. Djouadi and F. Lecouturier. Int. J. Nanotechnol. 2008, 5, 609-630
- Relation between residual stresses and microstructure in Mo(Cr) thin films elaborated by ionized magnetron sputtering.
J. Tranchant, P Y. Tessier, J P. Landesman, M A. Djouadi, B. Angleraud, P O. Renault, B. Girault and P. Goudeau. Surf. Coat. Technol. 2008, 202, 2247-2251
- Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition.
G. Marcos, A. Rhallabi and P. Ranson. Appl. Surf. Sci. 2008, 254, 3576-3584
- Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes.
A. Bousquet, A. Goullet, C. Leteinturier, N. Coulon and A. Granier. Eur. Phys. J.-Appl. Phys 2008, 42, 3-8
- Marcatili's extended approach: comparison to semi-vectorial methods applied to pedestal waveguide design.
T. Begou, B. Beche, N. Grossard, J. Zyss, A. Goullet, G. Jezequel and E. Gaviot. J. Opt. A-Pure Appl. Opt. 2008, 10, 055310
- Low temperature synthesis of nanocrystallized titanium oxides with layered or tridimensional frameworks, from [Ti8O12(H2O)(24)]Cl-8 center dot HCl center dot 7H(2)O hydrolysis.
Chia-Erh Liu, Annabelle Rouet, Hari Sutrisno, Eric Puzenat, Helene Terrisse, Luc Brohan and Mireille Richard-Plouet. Chem. Mat. 2008, 20, 4739-4748
- Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas.
A. Bousquet, A. Granier, G. Cartry and A. Goullet. J. Optoelectron. Adv. Mater. 2008, 10, 1999-2002
- Epitaxial growth of aluminum nitride on AlGaN by reactive sputtering at low temperature.
C. Duquenne, M A. Djouadi, P Y. Tessier, P Y. Jouan, M P. Besland, C. Brylinski, R. Aubry and S. Delage. Appl. Phys. Lett. 2008, 93, 052905
- Current developments in ionised physical vapour deposition by magnetron sputtering - state of the art - prospects for the future in terms of applications.
P Y. Tessier. Surf. Eng. 2008, 24, 319-321
- Degradation Mechanisms of Au-Al Wire Bonds During Qualification Tests at High Temperature for Automotive Applications: Quality Improvement by Process Modification.
Manoubi Auguste Bahi, Pascal Lecuyer, Annabelle Gentil, Helene Fremont, Jean-Pierre Landesman, Frederic Christien and Rene Le Gall. IEEE Trans. Device Mater. Reliab. 2008, 8, 484-489
- Thickness and substrate effects on AlN thin film growth at room temperature.
B. Abdallah, C. Duquenne, M P. Besland, E. Gautron, P Y. Jouan, P Y. Tessier, J. Brault, Y. Cordier and M A. Djouadi. Eur. Phys. J.-Appl. Phys 2008, 43, 309-313
- Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films.
C. Duquenne, P Y. Tessier, M P. Besland, B. Angleraud, P Y. Jouan, R. Aubry, S. Delage and M A. Djouadi. J. Appl. Phys. 2008, 104, 063301
- Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching.
M. Avella, J. Jimenez, F. Pommereau, J P. Landesman and A. Rhallabi. Appl. Phys. Lett. 2008, 93, 131913
- Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy.
V. Edon, M -C. Hugon, B. Agius, O. Durand, C. Eypert and C. Cardinaud. Thin Solid Films 2008, 516, 7974-7978
- Integration of a carbon nanotube based electrode in silicon microtechnology to fabricate electrochemical transducers.
E. Luais, M. Boujtita, A. Gohier, A. Tailleur, S. Casimirius, M A. Djouadi, A. Granier and P Y. Tessier. Nanotechnology 2008, 19, 435502
- Introduction of defects during the dry etching of InP photonic structures: a cathodo-luminescence study.
Manuel Avella, Juan Jimenez, Frederic Pommereau, Jean-Pieere Landesman and Ahmed Rhallabi. J. Mater. Sci.-Mater. Electron. 2008, 19, S171-S175
2007
- Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl-2/Ar+.
L. Elmonser, A. Rhallabi, M. Gaillard, J P. Landesman, Anne Talneau, F. Pommereau and N. Bouadma. J. Vac. Sci. Technol. A 2007, 25, 126-133
- Two step reactive magnetron sputtering of BLT thin films.
M P. Besland, C. Borderon, M. Cavellier, S. Le Tacon, M. Richard-Plouet, D. Albertini, D. Averty, P Y. Tessier, H W. Gundel, L. Brohan and M A. Djouadi. Integr. Ferroelectr. 2007, 94, 94-104
- Development and analysis of low resistance ohmic contact to n-AlGaN/GaN HEMT.
A. Soltani, A. BenMoussa, S. Touati, V. Hoel, J -C. De Jaeger, J. Laureyns, Y. Cordier, C. Marhic, M A. Djouadi and C. Dua. Diam. Relat. Mat. 2007, 16, 262-266
- Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition.
A. Gohier, T M. Minea, M A. Djouadi, J. Jimenez and A. Granier. Physica E 2007, 37, 34-39
- Impact of the etching gas on vertically oriented single wall and few walled carbon nanotubes by plasma enhanced chemical vapor deposition.
A. Gohier, T M. Minea, M A. Djouadi and A. Granier. J. Appl. Phys. 2007, 101, 054317
- Comparative Study of Films Deposited from HMDSO/O(2) in Continuous Wave and Pulsed rf Discharges.
Lenka Zajickova, Vilma Bursikova, Daniel Franta, Angelique Bousquet, Agnes Granier, Antoine Goullet and Jiri Bursik. Plasma Process. Polym. 2007, 4, S287-S293
- Determination of the Optimum Conditions for Ion Nitriding of 32CDV13 Low Alloy Steel.
Chahinez Saied, Abdelouahad Chala, Corinne Nouveau, Mohamed Abdou Djouadi and Lounis Chekour. Plasma Process. Polym. 2007, 4, S757-S760
- Magnetron Sputtering of Aluminium Nitride Thin Films for Thermal Management.
Cyril Duquenne, Bogdhan Popescu, Pierre-Yves Tessier, Marie-Paule Besland, Yves Scudeller, Christian Brylinski, Sylvain Delage and -Abdou M. Djouadi. Plasma Process. Polym. 2007, 4, S1-S5
- Screen-printed carbon electrode modified on its surface with amorphous carbon nitride thin film: Electrochemical and morphological study.
F. Ghamouss, P -Y. Tessier, A. Djouadi, M -P. Besland and M. Boujtita. Electrochim. Acta 2007, 52, 5053-5061
- Biofluid transport on hydrophobic plasma-deposited fluorocarbon films.
P. Bayiati, A. Tserepi, P S. Petrou, K. Misiakos, S E. Kakabakos, E. Gogolides and C. Cardinaud. Microelectron. Eng. 2007, 84, 1677-1680
- Investigation of point defect generation in dry etched InP ridge waveguide structures.
M. Avella, J. Jimenez, F. Pommereau, J P. Landesman and A. Rhallabi. Appl. Phys. Lett. 2007, 90, 223510
- Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias.
B. Abdallah, A. Chala, P -Y. Jouan, M P. Besland and M A. Djouadi. Thin Solid Films 2007, 515, 7105-7108
- Examination of the electrochemical reactivity of screen printed carbon electrode treated by radio-frequency argon plasma.
F. Ghamouss, P -Y. Tessier, M A. Djouadi, M -P. Besland and M. Boujtita. Electrochem. Commun. 2007, 9, 1798-1804
- Carbon nanochannels elaborated by buckle delamination control on patterned substrates.
J. Tranchant, B. Angleraud, X L. Han, J P. Landesman and P Y. Tessier. Appl. Phys. Lett. 2007, 91, 013103
- High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms.
D. Eon, V. Raballand, G. Cartry and C. Cardinaud. J. Phys. D-Appl. Phys. 2007, 40, 3951-3959
- ERDA and structural characterization of oriented multiwalled carbon nanotubes.
A. Gohier, S. Point, M A. Djouadi, A. Granier, T M. Minea, U. Kreissig, G. Abrasonis, A. Kolitsch and W. Moller. J. Phys. Chem. C 2007, 111, 10353-10358
- Porous SiOCH, SiCH and SiO2 etching in high density fluorocarbon plasma with a pulsed bias.
Vanessa Raballand, Gilles Cartry and Christophe Cardinaud. Plasma Process. Polym. 2007, 4, 563-573
- Structural and electrical properties of the interfacial layer in sputter deposited LaAlO3/Si thin films.
V. Edon, M C. Hugon, B. Agius, C. Cohen, Ch Cardinaud and C. Eypert. Thin Solid Films 2007, 515, 7782-7789
- Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy.
A. Bousquet, G. Cartry and A. Granier. Plasma Sources Sci. Technol. 2007, 16, 597-605
- Sequential environmental stresses tests qualification for automotive components.
M A. Bahi, P. Lecuyer, H. Fremont and J -P. Landesman. Microelectron. Reliab. 2007, 47, 1680-1684
- Single- and few-walled carbon nanotubes grown at temperatures as low as 450 degrees C: Electrical and field emission characterization.
A. Gohier, M A. Djouadi, M. Dubosc, A. Granier, T M. Minea, L. Sirghi, F. Rossi, P. Paredez and F. Alvarez. J. Nanosci. Nanotechnol. 2007, 7, 3350-3353
- Application of CrAlN coatings on carbide substrates in routing of MDF.
C. Nouveau, C. Labidi, Ferreira J -P. Martin, R. Collet and A. Djouadi. Wear 2007, 263, 1291-1299
- A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer.
V. Raballand, G. Cartry and C. Cardinaud. J. Appl. Phys. 2007, 102, 063306
- Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD.
M. Dubosc, S. Casimirius, M -P. Besland, C. Cardinaud, A. Granier, J -L. Duvail, A. Gohier, T. Minea, V. Arnal and J. Torres. Microelectron. Eng. 2007, 84, 2501-2505
- First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides.
T. Begou, B. Beche, A. Goullet, J P. Landesman, A. Granier, C. Cardinaud, E. Gaviot, L. Camberlein, N. Grossard, G. Jezequel and J. Zyss. Opt. Mater. 2007, 30, 657-661
2006
- Study of magnetic field influence on charged species in a low pressure helicon reactor.
R. Smid, A. Granier, A. Bousquet, G. Cartry and L. Zajickova. Czech. J. Phys. 2006, 56, B1091-B1096
- Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition.
M P. Besland, H D A. Aissa, P R J. Barroy, S. Lafane, P Y. Tessier, B. Angleraud, M. Richard-Plouet, L. Brohan and M A. Djouadi. Thin Solid Films 2006, 495, 86-91
- InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides.
B. Liu, J -P. Landesman, J -L. Leclercq, A. Rhallabi, C. Cardinaud, S. Guilet, F. Pommereau, M. Avella, M A. Gonzalez and J. Jimenez. Mater. Sci. Semicond. Process 2006, 9, 225-229
- Spatially resolved photoluminescence and Raman spectroscopy of bandgap gratings fabricated in GaAs/AlAs superlattice waveguide using quantum well intermixing.
A S. Helmy, P. Martin, J P. Landesman, A C. Bryce, J S. Aitchison and J H. Marsh. J. Cryst. Growth 2006, 288, 53-56
- Growth and modification of organosilicon films in PECVD and remote afterglow reactors.
P. Supiot, C. Vivien, A. Granier, A. Bousquet, A. Mackova, D. Escaich, R. Clergereaux, P. Raynaud, Z. Stryhal and J. Pavlik. Plasma Process. Polym. 2006, 3, 100-109
- Limits of the PECVD process for single wall carbon nanotubes growth.
A. Gohier, T M. Minea, A M. Djouadi, A. Granier and M. Dubosc. Chem. Phys. Lett. 2006, 421, 242-245
- Conception of optical integrated circuits on polymers.
B. Beche, N. Pelletier, E. Gaviot, R. Hierle, A. Goullet, J P. Landesman and J. Zyss. Microelectron. J. 2006, 37, 421-427
- Characterization of carbon nanotubes and carbon nitride nanofibres synthesized by PECVD.
S. Point, T. Minea, M P. Besland and A. Granier. Eur. Phys. J.-Appl. Phys 2006, 34, 157-163
- Etching mechanisms of Si and SiO2 in fluorocarbon ICP plasmas, analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy.
F. Gaboriau, G. Cartry, M C. Peignon and C. Cardinaud. J. Phys. D-Appl. Phys. 2006, 39, 1830-1845
- Single-mode rib optical waveguides on SOG/SU-8 polymer and integrated Mach-Zehnder for designing thermal sensors.
N. Pelletier, B. Beche, E. Gaviot, L. Camberlein, N. Grossard, F. Polet and J. Zyss. IEEE Sens. J. 2006, 6, 565-570
- Effect of duplex treatments by plasma nitriding and triode sputtering on corrosion behaviour of 32CDV13 low alloy steel.
A. Chala, C. Nouveau, M A. Djouadi, P. Steyer, J P. Millet, C. Saied, M S. Aida and M. Lambertin. Surf. Coat. Technol. 2006, 200, 6568-6571
- Residual stress control in MoCr thin films deposited by ionized magnetron sputtering.
J. Tranchant, B. Angleraud, P Y. Tessier, M P. Besland, J P. Landesman and M A. Djouadi. Surf. Coat. Technol. 2006, 200, 6549-6553
- Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas.
A. Bousquet, V. Bursikova, A. Goullet, A. Djouadi, L. Zajickova and A. Granier. Surf. Coat. Technol. 2006, 200, 6517-6521
- Mechanisms involved in the conversion of ppHMDSO films into SiO2-like by oxygen plasma treatment.
Agnes Granier, Gael Borvon, Angelique Bousquet, Antoine Goullet, Christiane Leteinturier and Arie van der Lee. Plasma Process. Polym. 2006, 3, 365-373
- Angular and local spectroscopic analysis to probe the vertical alignment of N-doped well-separated carbon nanotubes.
T M. Minea, B. Bouchet-Fabre, S. Lazar, S. Point and H W. Zandbergen. J. Phys. Chem. B 2006, 110, 15659-15662
- Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas.
A. Bousquet, A. Granier, A. Goullet and J P. Landesman. Thin Solid Films 2006, 514, 45-51
- Plasma doping implant depth profile calculation based on ion energy distribution measurements.
L. Godet, Z. Fang, S. Radovanov, S. Walther, E. Arevalo, F. Lallement, J T. Scheuer, T. Miller, D. Lenoble, G. Cartry and C. Cardinaud. J. Vac. Sci. Technol. B 2006, 24, 2391-2397
- Low temperature plasma carbon nanotubes growth on patterned catalyst.
M. Dubosc, T. Minea, M P. Besland, C. Cardinaud, A. Granier, A. Gohier, S. Point and J. Torres. Microelectron. Eng. 2006, 83, 2427-2431
- Plasma oxidation of polyhedral oligomeric silsesquioxane polymers.
D. Eon, V. Raballand, G. Cartry, C. Cardinaud, N. Vourdas, P. Argitis and E. Gogolides. J. Vac. Sci. Technol. B 2006, 24, 2678-2688
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