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CARDINAUD Christophe

CARDINAUD Christophe

Responsable-adjoint Equipe PCM   
RCO22    
+33 (0)2 40 37 39 61    
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Fonctions actuelles / Currently
  • Senior research fellow at CNRS
  • In charge of the Optimist equipment for the CNRS réseau des Plasmas Froids
Qualifications
  • Accreditation to supervise research, Univ. Nantes (1990)
  • PhD in physical chemistry, Univ. Pierre & Marie Curie, Paris (1985)
  • Master in physical chemistry, Univ. Pierre & Marie Curie, Paris (1982)
Thèmes de recherche / REsearch Themes

His scientific interests cover fundamental aspects and recurrent issues in plasma etching as well as process development. Area of expertise includes etching processes in fluorine-based and CH4-H2 plasmas, material and surface analyses (photoelectron spectroscopy, ellipsometry) as well as plasma diagnostics (mass and optical spectrometry, electrostatic probes). Past experience include deep etching in Si, SiO2 and silica glass, etching of III-V materials for optoelectronics, and etching of organosilicon low-κ materials for advanced interconnections. At present research topics concern etching of III-V and II-VI semiconductor materials as well as chalcogenide glasses for photonics, and development of Cl2-based plasma processes.

Animation de la recherche / Research Community Activities - Teaching Responsibilities

  • Member of the Société Française du Vide (http://vide.org)
  • Member of the CNRS Réseau des Plasmas Froids (http://plasmasfroids.cnrs.fr)
  • Member of the Société Française de Physique (https://www.sfpnet.fr)
  • Editorial activity:
    • Regular referee (past 5 years) to Appl. Surf. Sci., Contrib. Plasma Phys., European Physics J. Appl. Phys., J. Appl. Phys, J. of Physics D, J. Vac. Sci. Technol. A, Langmuir, Materials Res. Material Sci. Engineering B, Microelectronic Engineering, Optical Materials, Plasma Chem. Plasma Process., Plasma Processes & Polymers, Plasma Sources Sci. & Technol.
    • Member of program committees. Micro-Nano-Engineering (MNE) (2003-present), International Colloquium on Plasma Processes (CIP) (2011-present), Journées Nationales des Technologies Emergentes (JNTE) (2013-present).
    • Co-editor of Plasmas Froids VIII « Plasma et son environnement », collection « Intégration des savoirs et des savoir-faire », Edition CNRS-MRCT, 2012.
  • CNRS Réseau des Plasmas Froids (CNRS Cold Plasma Network)
    • Member of the steering committee (2009-2014)
    • Coordinator (2013-2014)
  • Teaching and training:
    • Since 2000, teaches or has teached surface analysis (XPS, SIMS, RBS and ellipsometry), lithography and plasma etching in master class level.
    • Since 2004, professional training courses in industry and European programs on plasma etching and material or surface characterisation.
    • Short courses on plasma etching within the CIP conference (2001-09).
  • Expertise:
    • Regular expert reviewer for national (ANR, ANRT) and international projects.
Publications

As of 1/2014 :

R Chanson, S Bouchoule, C Cardinaud, C Petit-Etienne, E Cambril, A Rhallabi, S Guilet, E Blanquet “X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl2-based inductively coupled plasma”. J. Vacuum Sci. Technol. B (2014) 32, 011219.

  • 98 publications in international peer reviewed journals (H-Factor : 21)
  • 35 peer reviewed proceedings
  • 5 book chapters
  • 6 invited talks at national/international conferences, 29 oral conference presentations, 10 invited seminars, 9 (co)organisation of workshops and conferences
Ressources en ligne / Online Ressources

CV : http://www.univ-nantes.fr/cardinaud-c

Researchgate : http://www.researchgate.net/profile/Christophe_Cardinaud

Researcherid : http://www.researcherid.com/rid/G-3074-2012

Publications IMN (since 2006)

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