“Nextral” plasma etching reactor
This is a Nextral NE810 commercial reactor that we have modified. The original microwave plasma excitation system has been replaced by an inductively coupled RF excitation (13.56 MHz – 600 W max) by means of a single-turn circular antenna around the quartz tube. The substrate holder is RF biased (13.56 MHz – 300 W max). The sample holder accepts samples up to 4" in diameter.
Plasma diagnostics by electrostatic probes and optical emission spectrometry can be installed on this reactor.
This reactor is dedicated to studies and etching processes in chlorinated plasma: pure Cl2 or mixed with H2, Ar, or N2.
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