RHALLABI Ahmed

University Professor

Function:

University Professor 1st class, 63rd CNU section

Expertises :

• Expert in the modeling of cold plasma processes for the deposition and etching of thin films.
• Expert in semiconductor physics and microelectronics.
• Expert in numerical methods for physics.

Main research theme :

Modeling plasma-surface interaction phenomena for thin-film etching and deposition: development of multi-scale approaches

Current research projects :

• Multi-scale approach to modeling GaN etching using the Atomic Layer Etching (ALE) process, in collaboration with ST Microelectronics.
• Multi-scale plasma modeling in high-power pulse magnetron sputtering (HiPIMS)
• Modeling and design of an intelligent gas sensor based on PVD metal oxides

Activities in the research community :

• Deputy manager of the Plasmas and Thin Films team.
• Elected member of the IMN Scientific Advisory Board
• Elected member of the UFR Sciences scientific council
• Member of the Physics Department Council

Biography:

I graduated from the Université Joseph Fourier in Grenoble with a DEA in Instrumentation and Measurement in 1988. In 1992, I defended a doctoral thesis in Materials Science, specializing in microelectronics, at the University of Nantes. In 1993, I was appointed Senior Lecturer at IRESTE (now Polytech Nantes), then promoted to University Professor in 2007 in the Physics Department of the Faculty of Science and Technology at Nantes University. I am currently in charge of the Electronics, Electrical Energy and Automation (EEA) Master’s program. My teaching covers several key areas: analog electronics, semiconductors, microelectronics, nanoelectronics, digital modeling and integrated circuit manufacturing processes.

On the research front, I have been attached to the Nantes Jean Rouxel Materials Institute (IMN) since 1989. I am deputy head of the Plasmas and Thin Films (PCM) team. With my PhD students, we have developed innovative models and algorithms for modeling plasma discharges and their interactions with etched surfaces. These include the global method for describing plasma kinetics, and the Monte-Carlo cell method for simulating plasma-surface interactions in micro- and nanoscale etching processes. This set of codes has enabled us to structure an innovative multiscale approach to etching materials at micron, nanometer and atomic scales.

Teaching :

• Teaching in the form of lectures, tutorials and practical work on semiconductor physics, analog electronics, microelectronics, integrated circuit manufacturing technologies, electronic CAD and CAD/CAM, and physical modeling.
• Head of the Master’s degree in EEA (1 joint Master1 course and 3 Master2 specialties)
• Head of the M2 Intelligent Sensors and Quality of Electronic Systems course
• Courses abroad
• Video recordings of courses available to students
• Supervision of 18 TER M1 Electronics (2 months per TER) (2007-2016)
• Supervision of 21 teaching projects in M2 CEO and M2 CISE (3 months per project) (10 since 2017)
• Implementation of several educational projects (e.g.: autonomous weather station installed on the UFR Sciences campus and development of an electric carriage using two recycled bicycles as part of an eco-design approach (ongoing).

Publications :

• 61 international peer-reviewed journals
• 103 international conferences
• 42 national conferences
• 16 guest lectures
• 12 seminars in France and abroad
• 20 contract reports
• 1 book chapter

Major illustrative publications:

• T.Rasoanarivo, C.Mannequin, F.Roqueta, M.Boufnichel, and A. Rhallabi,Dynamic global model of Cl2/Ar plasmas: applicability to Atomic Layer Etching processes, J. Vac. Sci. Technol. A 42, 063003 (2024).
• G. Le Dain, A. Rhallabi, C. Cardinaud, A. Girard, M.C. Fernandez, M. Boufnichel, F. Roqueta, Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties, J. Vac. Sci. Technol. A36, 03E109 1-11 (2018).
• J. Zgheib, P-Y. Jouan, A. Rhallabi, High Power Impulse Magnetron Sputtering global model for argon plasma chromium target interactions, J. Vac. Sci. Technol. A 39, 043004 (2021).
• M. Cosson, B. David, L. Arzel, P. Poizot, A. Rhallabi, Modelling of electrochemical storage and photovoltaic production in an autonomous solar drone, eScience, 2, 235-241 (2022).
• Bosch deep silicon etching simulator with user-friendly interface

Link to orcid: https://orcid.org/0000-0003-0855-9995

LinkedIn link: https://www.linkedin.com/in/ahmed-rhallabi-8562992a/