BEJI Hiba

Categories: RESEARCHER CDD, TEAM PCM

Functions :

Junior researcher (post-doc), Institut des Matériaux de Nantes Jean Rouxel (since January 2025)

Qualifications :

PhD in Dense Media and Materials, Université Clermont Auvergne (2020-2024)
Master in Fundamental Physics and Applications, specializing in Matter and Radiation, Université d’Orléans (2018-2020)

Expertises :

Thin-film PVD processing
Semiconductor surface treatment: N2 plasma nitriding
Atomic Layer Etching (ALE) of materials
Advanced characterization techniques (ARXPS, RBS, FTIR, UV-Vis, AFM ellipsometry, SEM, XRD)

Current research projects :

Development of an ALE process for the selective etching of β-Ga₂O₃

Biography:

Junior researcher in materials physics and chemistry, at the Institut des Matériaux de Nantes Jean Rouxel (IMN). Her current research focuses on the development of atomic etching processes (ALE) for materials such as β-Ga₂O. His work focuses in particular on the study of plasma-surface interactions and advanced post-etching characterization (XPS, AFM, SEM, DRX…).

Teaching :

Université Clermont Auvergne – 135h vacation assignment (2021-2023)

Publications :

1 scientific publication

ARXPS intensity modeling of SiNx ultrathin layer grown on Si (100) and Si (111) substrates by N₂ plasma treatment, Thin Solid Films, 798 (2024) 140388
https://doi.org/10.1016/j.tsf.2024.140388

Link to publi HAL: https://hal.science/search/index?q=Hiba+Beji

LinkedIn link:www.linkedin.com/in/hiba-beji-095971194