GIRARD Aurélie

Senior Lecturer

Functions :

• 2014-… Lecturer, Nantes University, IMN PCM (Plasma Couches Minces) team.
• 2013-2014 Maturation engineer, SATT, France, Ouest Valorisation, BatElecCir.
• 2011-2013 ATER, Université de Rennes 1, France, UFR sciences et propriétés de la matière, SPI specialization, IETR, UMR6164.
• 2010-2011 ATER, University of Rennes 1, IUT GEII, France, IETR, UMR 6164.
• 2009-2010 Postdoctorate, ENS Cachan Bretagne, France, BIOMIS team, SATIE, UMR 8029.

Qualifications :

• 2005-2008 PhD in Electronic Engineering, University of Rennes 1, Rennes, France.

Suspended-gate transistor electronic detection of protein markers linked to iron metabolism.

Thesis in the Microelectronics and Microsensors Department (D2M) of the IETR (Institut d’Electronique et des Technologies du numéRique).

• 2002-2005 M.Sc.A: Master of Applied Sciences, University of Sherbrooke, Canada.

Design and manufacture of a calorimeter for living cells.

Master’s degree in electrical engineering, majoring in microelectronics, with research project in collaboration with MIT and the University of Auckland in New Zealand.

• 2001-2002 Maîtrise EEA, Université de Marne-La-Vallée, France.

Master’s degree in Electronics, Electrical Engineering and Automation, specializing in electronics, microelectronics and optronics.

• 1998-2001 ESTE, École Supérieure de Technologie Électronique, France.

Part of the ESIEE group, this three-year program offers an international level certified Bachelor of Engineering degree in electronics. Specializing in electronics and microelectronics.

Expertises :

• Etching processes in fluorine-based plasmas (SF6, CHF3, CF4, C2F6).
• Analysis of materials and surfaces using X-ray photoelectron spectroscopy.

Main research themes:

His scientific interests cover functionalization aspects and recurring issues in plasma etching, as well as process development. His current research focuses on cryo-ALE (Cryogenic Atomic Layer Etching) and all the mechanisms involved at the plasma-surface interface during this type of treatment.

Biography:

Aurélie GIRARD graduated from the Université de Sherbrooke in 2005, as an electrical engineer specializing in biosensors and microfabrication in collaboration with the University of Auckland and MIT on “Fabrication of a microcalorimeter to measure the thermodynamic properties of a living cell”. With a PhD in electrical engineering from the University of Rennes (2008), specializing in microelectronics linked to biosensors, his research topics, carried out during his thesis and several post-doctorates, combine processes for manufacturing and characterizing microelectronic devices and chemical surface functionalization for grafting biological species: firstly on the fabrication and electrochemical functionalization by diazonium salts of nanostructures and devices based on different silicon compounds, then on the design and fabrication of electrochemical multi-sensors for the analysis of markers of neurological lysosomal storage and acute strokes. This project was carried out in collaboration with ENSCP. Finally in 2014, she joined the Plasmas and Thin Films group at IMN in Nantes, to work as a teacher-researcher on the dry etching of materials with microelectronics applications, using low-pressure RF reactive plasmas.

Teaching :

At Nantes University since September 2014, its teaching courses deal mainly with electronics and physics in L1, L3, M1 and M2 (initial training or offered on a sandwich course basis (M2)) with a classic organization (lectures, TD and TP) but also in the form of projects.

Publications :

Number of publications

• More than 25 publications, including 12 since 2019.
• More than 20 communications since 2019.
• Online resource: Researchgate : http://www.researchgate.net/profile/Aurelie_Girard3

Major illustrative publications:

• “An insight on plasma-surface interaction mechanisms during cryoetching in SiF4-O2, using in situ XPS”;
  C. Cardinaud, A. Girard, G. Antoun, J. Nos, T. Tillocher, R. Dussart; Plasma Etch and Strip for Microelectronics (PESM), Leuven, Belgium, September 19-23, 2022.
• “Quasi In Situ XPS on a SiOxFy Layer Deposited on Silicon by a Cryogenic Process”;
  G. Antoun, A. Girard, T. Tillocher, P. Lefaucheux, J. Faguet, K. Maekawa, C. Cardinaud and R. Dussart. Dussart; ECS J. Solid State Sci. Technol. 2022, 11, 013013.
• “Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas”;
  T Meyer, A. Girard, G LeDain, A. Rhallabi, E. Baudet, V. Nazabal, P. Nemec and C. Cardinaud. Appl. Surf. Sci. 2021, 549, 149192.
• “Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas”;
  J. Piet, W. Faider, A. Girard, F. Boulard and C. Cardinaud. Journal of Vacuum Science & Technology A 2020, 38, 053005.

LinkedIn link :https://www.linkedin.com/in/aurelie-girard-5916091b/