GOULLET Antoine

GOULLET Antoine

Categories: PROFESSOR AND RESEARCHER, TEAM PCM

University Professor

 

Functions :

Research Professor at Polytech Nantes, Deputy Director of Research at the Science and Technology Division of Nantes University

 

Qualifications :

University Professor, CE1, 63 CNU

 

Expertises :

  • PECVD thin-film deposition of oxide dielectric materials.
  • Nanocomposite thin films.
  • UV-Visible ellipsometry and optical spectroscopy.
  • Thin-film component technologies.

 

Main research themes:

  • Development of innovative hybrid processes combining low-pressure plasma (PECVD) and injection of colloidal solutions for the deposition of nanocomposite materials
  • Optical, electrical and catalytic properties of oxide nanocomposites (TiO2(NPs)/SiO2 (Matrix); ZnO (NPs)/SiO2(Matrix); FeOy (NPs)/ TiO2 (Matrix),….): from nano-object dispersion to multifunctional properties

 

Current research projects :

  • ANR ADN project: Advanced Dielectric Nanocomposite thin films processed by hybrid aerosol / low pressure plasma for microelectronic capacitor applications (2025-2028), in collaboration with LAPLACE of Toulouse.
  • Participation in the supervision of Sarah Hekking’s thesis in collaboration with the Université de Montréal (Pr Luc Stafford) and IRN-CNRS Controlled Multifunctional Nanomaterials.
  • Nanocomposite thin films including Fe2O3 nanoparticles in a TiO2 matrix, produced by a hybrid deposition process combining plasma and solution injection.

 

Activities in the research community :

Member of GDRI -IRN Controlled Multifunctional Nanomaterials

 

Biography:

Antoine Goullet is University Professor (exceptional class) at Nantes University, and a member of the Jean Rouxel Materials Institute in Nantes (IMN – UMR 6502). His current research focuses on the synthesis and study of the optical and electrical properties of nanocomposite dielectric thin films. These materials are developed using innovative hybrid processes, combining injection of colloidal solutions with plasma-assisted vapor deposition (PECVD), operating at low pressure and low temperature. He has authored or co-authored over 80 scientific publications in international journals. He has supervised or co-supervised 10 doctoral theses, and supervised three post-doctoral fellows. Scientific leader of several ANR-funded projects, he has also coordinated a European project (PHC) and participated in over 60 thesis juries. After serving as Director of Research at Polytech Nantes (2016-2021), since January 2022 he has been Deputy Director of Nantes Université’s Science and Technology cluster, in charge of research issues.

 

Teaching :

In the engineering cycle at Polytech Nantes in the Electronics and Digital Technologies (ETN) department and in the PEIP D preparatory cycle at Polytech Nantes, linked to the BUT GEII course at the Nantes IUT.

  • Semiconductor physics (C/TD/TP),
  • Microelectronics (C/TD/TP),
  • Physics and Technology (C/TD/TP),
  • Follow-up of engineering projects with industrial customers,
  • Apprentice tutoring,

At the interface with Human and Social Sciences and ETN :

  • Professional network
  • Sustainable Development and Corporate Social Responsibility

 

Publications :

More than 80

Major illustrative publications:

  • Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method
    C. Villeneuve-Faure, M. Mitronika, A. P. Dan, L Boudou, W. Ravisy, M.P. Besland, M.. Richard-Plouet and A. Goullet
    Nano Express 5 (2024) 5, 015010; DOI 10.1088/2632-959X/ad220d
  • Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes
    S. Chouteau, M. Mitronika, A. Goullet, M. Richard-Plouet, L. Stafford, A. Granier
    J. Phys. D: Appl. Phys. (2022) 55, 505303; DOI 10.1088/1361-6463/ac9ac2
  • Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry
    W. Ravisy, M. Richard-Plouet, B. Dey, S. Bulou, P. Choquet, A. Granier and A. Goullet
    J. Phys. D: Appl. Phys. (2021) 54, 445303; DOI 10.1088/1361-6463/ac1ec1
  • In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
    D. Li, M. Carette, A. Granier, J.P. Landesman, A. Goullet
    Appl. Surf. Sc. (2013) 283, 234; DOI 10.1016/j.apsusc.2013.06.091
  • Optical spectroscopic analyses of OH incorporation into SiO2 films deposited from O2/TEOS plasmas
    A. Goullet, C. Vallée, A. Granier and G. Turban
    J. Vac. Sci. Technol. A (2000) 18, 2452; DOI 10.1116/1.1287152

 

Link to orcid: https://orcid.org/my-orcid?orcid=0000-0001-5411-4351

Link to scholar.google.fr: https://scholar.google.com/citations?user=8xWSg2wAAAAJ&hl=fr&oi=ao

LinkedIn link:https://www.linkedin.com/in/antoine-goullet-b1663110/

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