GRANIER Agnès

Research Director

Functions :

CNRS Research Director (DR1) at IMN (80%) and “Plasmas” Scientific Delegate at CNRS Ingénierie (20%)

Expertise :

Low-pressure cold plasma processes, PECVD thin film deposition from organometallic precursors, plasma diagnostics (OES, Langmuir probe, mass spectrometry).

Main research themes :

• deposition of thin films with dielectric, optical, photocatalytic and barrier properties (SiO2, SiOCH, TiO2) by plasma-assisted chemical vapor deposition (PECVD)
• deposition of multifunctional nanocomposite thin films by low-pressure plasma injection of colloidal solutions (TiO2:SiO2, ZnO:SiO2, etc.).
• study of plasma/surface interaction mechanisms
• global study of plasma processes for nanomaterial synthesis and thin-film deposition

Current research projects :

• Hybrid mist plasma deposition of nanocomposite thin films: injection of a colloidal solution into a low-pressure plasma.
• Nanocomposite thin films of iron oxide nanoparticles in a TiO2 matrix (in collaboration with UdM, Montreal)
• Nanocomposite thin films of TiO2 nanoparticles in a SiO2 matrix, dielectric properties (ANR ADN project, 2025-2028)

Activities in the research community :

• Member of the Board of Directors, Société Française du Vide
• Member of the Plasmas Froids network and GDR EMILI

Biography

• 2013-2021 : Deputy Director of IMN
• 2017-2020: Member of the CE08 Evaluation Committee of the Agence Nationale de la Recherche (French National Research Agency)
• 2012-2016: Appointed member of the Comité National de la Recherche Scientifique, section10
• 2005-2012: Head of the Plasmas and Thin Films team at IMN (25-30 people)
• 2012-2015: Member of the Board of the Ecole Doctorale 3MPL (Molecules, Matter and Materials in Pays de Loire)
• 2008-2011: Member of the ANR non-thematic evaluation committee (CSD2 then SIMI9)
• 2004-2006: Coordinator of the Cold Plasma Network of the MRCT (CNRS) (400 members)
• 2001-2003: Project manager at the CNRS SPI (Sciences pour l’Ingénieur) Department
• 1998-2005: Head of the PECVD team at IMN’s Plasma Thin Film Laboratory
• 1994-1997: Director of the GDR “Processes for depositing thin films usingorganosilicon plasmas“.
• 1986-1992: Research Associate (CR2 from 1986 to 1990, then CR1) at the Gas and Plasma Physics Laboratory (Orsay)