Plasmas and Thin Films (PCM)
The Plasmas and Thin Films team conducts research into the development of cold plasma processes for the deposition and etching of thin-film materials. Our research also includes physico-chemical processes other than plasmas alone, such as plasma solution injection and chemical dealloying. At the heart of the team’s activities are the detailed study of plasma/surface interaction mechanisms, the development of new plasma processes, the implementation of multi-scale numerical modeling in support of experimental activity, and the characterization of a material with a view to a given property. The team’s research strategy is therefore based on an iterative approach to these four pillars, enabling optimization of the synthesis or processing of a material with targeted properties.
The research projects developed by the PCM team have applications in several technological sectors:
- microelectronics,
- micro- and nano-technology,
- optoelectronics,
- photocatalysis,
- sensors,
- energy conversion and storage,
- coatings and surface treatments.
Activities are structured around four research themes: etching, thin-film deposition, nano-object and nanocomposite synthesis, supported by a cross-cutting modeling theme.
The team collaborates with external partners who have the technological means for microfabrication to integrate materials into a device.
Low-pressure plasma etching and deposition reactors used by the team
Reactive sputtering (PVD)
– 4 magnetron sputtering reactors powered by DC, RF, IPVD or HiPIMS
– 1 cluster with airlock and 2 chambers: 1 PECVD/PVD (ICP + 3 cathodes) and 1 PVD chamber 4 cathodes (3”) + heated RF polarizable substrate (max 800°C)
– 1 reactor with airlock and 3 4” magnetron cathodes (La Chantrerie site, Polytech)
– 2 shared semi-automated sputtering reactors IMN
PECVD
– 1 ICP reactor for plasma-assisted chemical vapor deposition (PECVD), with 3 organometallic injection lines and 1 liquid solution injection system (DLI)
Gravure
– 2 chlorinated, fluorinated, hydrocarbonated ICP reactors, organic precursors (Alcatel, Nextral)
– Optimist platform, sample holder -180°/+1100°C
Main themes
Cross-team themes
Areas of expertise and tools
– Cold plasma processes for thin-film and nanocomposite deposition and plasma etching
– Processes coupling plasma and solution chemistry during and post-plasma
– Multi-scale modeling of plasma processes
– Cold plasma diagnostics (OES, optical emission spectrometry, mass spectrometry, electrostatic probes, in situ spectroscopic ellipsometry)
– Characterization of thin films, in particular : X-ray photoelectron spectroscopy (XPS), electron microscopy (TEM and SEM) and X-ray diffraction (XRD)
Average figures
Permanent staff
- ANGLERAUD Benoît (Ens.-Researcher)
- BARBE Jérémy (Ens.-Researcher)
- BESLAND Marie-Paule (Researcher)
- BRIEN Valérie (Researcher)
- CARDINAUD Christophe (Researcher)
- ETTOURI Rim (Ens.-Researcher)
- GIRARD Aurélie (Ens.-Researcher)
- GOULLET Antoine (Ens.-Researcher)
- GRANIER Agnès (Researcher)
- LE GRANVALET Maryline (Ens.-Cherch.)
- MAHEU Clément (Researcher)
- MANNEQUIN Cédric (Researcher)
- PEIGNON-FERNANDEZ M-C. (Ens-Ch.)
- RHALLABI Ahmed (Ens.-Researcher)
- RICHARD-PLOUET Mireille (Researcher)
- TESSIER Pierre-Yves (emeritus)
Non-permanent
- BEJI Hiba (Post-Doc)
- BELGHITI Mehdi (PhD student)
- BOIVIN Dimitri (Post-Doc)
- CHARTRAIN Coline (PhD student)
- HEKKING Sarah (PhD student)
- LE PAPE Thomas (PhD student)
- RAJ Ravi (Post-Doc)
- RASOANARIVO Tojo (PhD student)
- SEIGNEUR Léo (PhD student)
- TARIN Hamza (PhD student)
- TOURE Oumar (PhD student)
