Thin layers of TiO2 and TiO2 / SiO2 by PECVD

Marie-Paule Besland, Antoine Goullet, Agnès Granier, Maryline Le Granvalet, Clément Maheu [2023, ->], Mireille Richard-Plouet , Invited researcher: Dayu Li [2018-2019] , Post-doctoral researcher : Florian Chabanais [2022-2024]

PhDs :   William Ravisy (2021), Stéphane Elisabeth (2015)

Our expertise in the PECVD process (low pressure inductively coupled RF plasma) for depositing thin layers from organometallic precursors has enabled us to optimize the process in order to synthesize at low temperature, on polymers, photo -catalytic TiO₂ thin films by applying RF power in pulsed mode. High-resolution transmission electron microscopy (TEM) analyses revealed the columnar morphology of the thin films, completely crystallized in anatase form in continuous mode (T = 130 ° C) and crystallized only at the surface of the film in pulsed mode (T <80 ° C).
Recently, thin films of metal substituted anatase TiO₂ (Nb⁵⁺, W^5+/6+) have been obtained by injecting an organometallic precursor of the dopant. Their photo-catalytic properties in the visible and transparent conductive oxide are under study (ANR PATIO project in collaboration with LIST in Luxembourg, W. Ravisy PhD).

Keywords           nanomaterials, thin films, desalloying, flexible electronics, sensors
Expertises          PECVD, Analyse de surface XPS, MET, Ellipsométrie
Collaborations   LIST (Luxembourg) CHiPS, Université de Mons (Belgique)