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Rim Ettouri [2023, ->], Ahmed Rhallabi, Christophe Cardinaud, Marie Claude Fernandez, Aurélie Girard , Cédric Mannequin [2022, ->]  Post-doctoral researchers : Guillaume Le Dain [2018-2020],  Engineer : Thomas le Pape [2023-2025], PhD students: Tojo Rasoanarivo [2023-2026], Hamza Tarin [2023-2026]

PhDs : Mickael Cosson (2021), Joelle Zgheib (2021), Guillaume Le Dain (2018)

The modeling activity developed within the PCM team aims to:
•    better understanding of the physico-chemical and electrical phenomena of low-pressure cold plasmas and their interactions with the surface of materials
•    provide to technologists, simulators capable of predicting the morphological properties of etched patterns or deposited thin films under reactive plasma processes.
•    Help to optimize plasma processes for deposition and etching of materials
The multi-scale approach developed makes it possible to predict the spatio-temporal evolution of the etched patterns as a function of the machine parameters.
Taking advantage of our expertise in physical modeling, we have developed, in partnership with other IMN teams (PCM, MIOPS and ST2E) and the startup XSUN, a new modeling topic. It focuses on modeling energy management of in-flight drones.

Keywords      Plasma, Etching, Modelling, Drone, Energy management   
Collaborations    Target making for SPS sputtering  (Plateforme PNF2 Toulouse, CIRIMAT)


Multiscale modelling of etching under plasma discharge

Rim Ettouri [2023, ->], Ahmed Rhallabi, Christophe Cardinaud, Aurélie Girard, Cédric Mannequin [2022, ->]  Post-doctoral researcher : Guillaume Le Dain [2018-2020], Engineer : Thomas le Pape [2023-2025], PhD student : Tojo Rasoanarivo [2023-2026]

PhD : Guillaume le Dain (2018)

Model Multiechelle
Plasma etching of micronic and submicronic structures is one of the keys in integrated circuit manufacturing or other miniature systems such as sensors or MEMS (Micro Electro Mechanical Systems). In order to understand the physical and chemical mechanisms of etching, and for better optimization, we have developed a multi-scale modelling approach to predict the time evolution of etching profiles as a function of machine parameters. This approach is composed of three modules:
•    a kinetic module to determine the densities and fluxes of neutral and charged species
•    a sheath module to calculate the angular and energetic ion distribution functions
•    a surface module to determine the evolution of the etched patterns through the masks.
This approach has been applied to the etching of several materials such as silicon using the Bosch process and the etching of III-V materials and steel by chlorinated plasmas. These etching simulators are good tools at the service of technologists for support in the development of etching processes.
Modélisation, Gravure, Plasma, Silicium, Acier, Bosch.    Modelling, Etching, Plasma, Silicon, Steel, Bosch.

Keywords           Modelling, Etching, Plasma, Silicon, Steel, Bosch
Collaborations   ST Microelectronics, IGL, C2N, SILSEF

Modelling of plasma discharge for Physical Vapour Deposition (PVD)

Rim Ettouri [2023, ->], Ahmed Rhallabi, Pierre Yves Jouan    PhD student : Joelle Zgheib [2018-2021]

MODELISATION Modlisation de la dcharge plasma pour la PVD Ahmed PYJcarre

The emergence of the PVD pulse process known as HiPIMS (High Power Impulse Magnetron Sputtering), has the interest of improving film structural quality. On the other hand, the self-ionization phenomenon of the sputtered atoms makes the deposition more directional and therefore improves the step coverage of structures with a high aspect ratio (trenches, vias, etc.). These improvements are due to the application of a voltage of a few kilovolts on the cathode, lasting a few tens of microseconds and a frequency of the order of kilohertz. In order to better understand the physical phenomena in this type of discharge, we develop a global kinetic model applied to a chromium target bombarded by ions from an argon plasma discharge. The overall model aims to quantify the temporal evolution of the densities of neutral species from the gas or the target as well as the charged species. The HiPIMS Ar/Cr discharge study could be adapted to other types of gas mixtures and targets for other types of thin film deposition.

Keywords        Modelling, Simulation, PVD, HiPIMS, Thin films

Modelling and caracterization of energy management of an autonomous drone in flight

Ludovic Arzel (MIOPS), Philippe Poizot (ST2E), Ahmed Rhallabi (PCM), PhD student : Mickael  Cosson [2018-2021] 

DRONE ahmed tof graph
The design of a new generation of autonomous energy drones is a major strategic issue for national and European policies regarding the multiple technological applications. In partnership with the start-up X-Sun, three IMN research groups (PCM, MIOPS and ST2E) are involved in the development of an energy management project for a drone equipped with solar panels and a Li-ion battery module. A simulator to predict the flight autonomy of the X-Sun drone based on the flight plan, climatic and geographical conditions is carried out. The drone is equipped with photovoltaic panels, an EMS module and Li-ion batteries. The parameters of the equivalent electrical circuits integrated into the simulator were evaluated using experimental characterizations of the photovoltaic cells and batteries included in the drone's energy management chain.

Keywords                Drone, Modelling, Energy Management, Electrochemical storage, Photovoltaïc.
Collaborations        X-Sun company    

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