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Al-X-N-O thin films by magnetron sputtering

Valérie Brien, Pierre-Yves Jouan, Mireille Richard-Plouet, Pierre-Louis Martin [2021-2024]

AlCuNO BrienThis activity aims at developing and optimizing new compounds as thin films exhibiting specific photocatalytic properties, that is antibacterial, in order to fight against hospital diseases. The films of Al-X-N-O composition are elaborated by magnetron sputtering, a deposition technique very common in industry. It allows one to control the nature, the nanostructuration and the morphology of the films via the plasma parameters.
The synthesis and the structural, chemical, morphological or surface characterizations are achieved at IMN. The antibacterial properties and mechanisms are studied at another CNRS lab : Laboratoire de Chimie Physique et Microbiologie pour les Matériaux et l'Environnement, LCPME (Nancy). The stability of phases and the electronic structure are evaluated by DFT calculation in Thessaloniki University (Greece). These simulations bring us elements to progress on the understanding of properties.

Keywords:  nitride, photocatalytic, antibacterial, TEM
Expertises: Morphological and chemical characterization of thin films, Transmission Electron Microscopy, Correlations between physico-chemical features of thin films and macroscopic properties
Collaborations :  LCPME (Nancy), IJL (Nancy), Synchrotron Soleil (Saclay), Université de Strathclyde (Ecosse, Royaume Uni), EPFL (Suisse), Synchrotron Diamond (Oxford Royaume Uni), Université de Thessalonique (Grèce).

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