ADN-english
Advanced Dielectric Nanocomposite thin films processed by hybrid aerosol /Pressure plasma for microelectronic capacitor applications
March 2025 – Sept 2029
Coordinator Laboratory of the project : LAPLACE, Toulouse
IMN Coordinator of the Project: Antoine GOULLET PR UNIV (PCM team)
Persons of IMN involved :
Marie-Paule BESLAND (DR CNRS), Mireille RICHARD (DR CNRS), Nicolas GAUTIER (IE CNRS), Nicolas STEFFANT (IE UNIV), Franck PETITGAS (AI UNIV)
Total Financing: 389,15 k€ with 156,5k€ for IMN
According to the state of the art, the improvement of the dielectric materials performances for microelectronics applications and more particularly for Metal‐Insulator‐Metal (MIM) capacitor requires the development of nanostructured
materials. The main issue is related to the increase of the dielectric permitivity and the breakdown electric field, as well as maintaining a low leakage current. In this
context, the objective of the ADN project is to design and optimize a nanostructured material (nanocomposites and / or multilayers), based on TiO2 and SiO2, to increase the dielectric permitivity while keeping leakage currents low.
In such a way, we will develop and optimize an innovative elaboration process based on a low pressure hydrid plasma method with injection of colloidal solutions
containing TiO2 nanoparticles. This process optimization needs a fine understanding of the plasma/aerosol interactions, leading to the modification of nanoparticle/matrix interface and consequently to the formation of the nanocomposite thin inorganic layer. Following this, we will investigate how the nanostructuration (nanoparticle concentration and dispersion state, interfaces...) influence on dielectric properties.
To reach this goal, multilayers and nanocomposites thin film will be modelled and characterized at macro and nanoscale using techniques derived from atomic force microscopy (AFM). The most efficient nanocomposite films, in term of high dielectric permitivity and low leakage current will be identified. Finally, leveraging the insights gleaned from nanocomposites and multilayer stacks characterization, along with the results from electrical modeling, we will proceed to design and evaluate advanced multilayer structures comprising alternating SiO2 and nanocomposite layers.