News

Rim Ettouri, a faculty researcher with the Plasmas and Thin Films (PCM) team, participated in the 7th International Conference on Data-Driven Plasma Science (ICDDPS-7), held atthe University of Kiel in Germany.

There, she presented her recent work on modeling the Bosch deep plasma etching process for silicon, combining multiscale physical simulations and machine learning to more effectively explore operating conditions and predict process characteristics and etch profiles.

The conference also provided an opportunity for numerous scientific exchanges with the international plasma community. The visit to Kiel continued with a tour of the Experimental Plasma Physics group at Christian-Albrechts-Universität zu Kiel, allowing these discussions on the experimental physics of plasmas and their interactions with materials to continue.

To travel to Kiel from France, Rim Ettouri chose to take the train, as part of an effort to minimize, whenever possible, the environmental impact of scientific travel.