Jérémy Barbé, Valérie Brien, Pierre-Yves Jouan, Antoine Goullet, Mireille Richard-Plouet, Post-doctoral researchers : Axel Ferrec [2014-2015], PhD students: Joëlle Zgheib (2018-2021)
PhDs : Antoine Quenardel (PhD 2015), Julien Kéraudy (PhD 2015), Quentin Hatte (PhD 2019)
Reactive sputtering leads to the production of films with targeted properties. Their optimisation is driven by the implementation implementation of plasma diagnostics.
The deposition, carried out under vacuum and without intentional heating in continuous (DC) and pulsed HiPIMS (High Power Impulse Magnetron Sputtering) modes, offers a wide flexibility for the production of films and/or adhesion layers based on Nickel whether metal, oxide, nitrides, oxy-nitrides and silicides of Ni with a control of the stoichiometry, by adjusting the deposition parameters: Keraudy et al 2016 and Keraudy et al 2017.
Depending on the intended composition, these layers have applications in the field of energy (PV as collector layers for photo-generated carriers, energy storage as supercapacitors), temperature sensors, anti-corrosion coatings, or layers to reinforce mechanical properties.
Electrochemical sensors and electrochromic glazing can also be considered.
Keywords: Continuous and pulsed magnetron reactive sputtering (HiPIMS), Transition metal coatings,Applications in the field of energy , Anti-corrosion coatings, mechanical properties
Expertises : Control of plasma parameters to optimise a film with targeted properties, Plasma diagnostics, Microstructural characterisation of films and surfaces, ellipsometry, Monitoring of optical and electrical properties
Collaborations: LTeN, CEISAM, GEM & GePEA (Nantes), MOLTECH-Anjou (Angers), ISCR (Rennes), Laboratoire d’études et de recherches sur les matériaux, les procédés et les surfaces (LERMPS), (Belfort-Montbéliard), Linköping University (Suède), IRT Jules Verne (Nantes), CEA (Saclay)