Directory

Associate Professor

Functions :

• 2023-present: Associate Professor, IMN – Nantes University – Institut des Matériaux de Nantes Jean Rouxel (IMN) – Plasmas and Thin Films team (PCM)
• 2022-2023: Temporary Teaching and Research Associate (ATER), GREMI – University of Orléans
• 2022: Postdoctoral researcher, GREMI – Université d’Orléans
• 2019-2022: CIFRE doctoral student / Microsystems engineer, MISTIC SAS – GREMI, Université d’Orléans

Qualifications :

• 2022: PhD in Plasma Physics, Université d’Orléans, High-aspect-ratio titanium etching for biomedical innovations
• 2019: Research Master in Microelectronics and Nanoelectronics, Aix-Marseille University
• 2018 : Engineering degree, Mines Saint-Étienne, specializing in nanoelectronic devices

Expertises :

• Multi-scale modeling of low-pressure plasma processes
• Reactive plasma etching: RIE, DRIE, Bosch, cryogenic, ALE
• Plasma deposition: HiPIMS, e-HiPIMS, magnetron sputtering
• Plasma-surface interactions and Monte Carlo simulations
• Plasma/sheath/surface coupling for describing micro- and nanoscale processes
• Progressive integration of artificial intelligence approaches for plasma process optimization
• Plasma and materials characterization: Langmuir probe, RFEA, OES, mass spectrometry, XPS, SEM, AFM, DRX
• Cleanroom microfabrication and structuring of MEMS materials

Main research themes:

My research activities focus on the understanding, modeling and optimization of plasma processes used for the etching and deposition of functional thin films. They are part of a multi-scale approach combining plasma description, transport of charged and neutral species, plasma-surface interactions and morphological evolution of processed materials.

The main areas of development are

• multi-scale modelling of plasma etching processes for micro- and nanofabrication ;
• deep etching of titanium and functional materials for MEMS applications;
• modelling of Bosch-type cyclic and cryogenic etching processes;
• HiPIMS and e-HiPIMS modelling of deposition processes for titanium-based thin films;
• development of plasma/sheath/surface models coupled with Monte Carlo simulations;
• the use of experimental data and artificial intelligence approaches to improve prediction and optimization of plasma processes.

Current research projects :

• Multi-scale plasma modeling in high-power pulse magnetron sputtering (HiPIMS and e-HiPIMS)
  Development of temporal models to describe ionization, species transport and dominant mechanisms in Ti/Ar and Ti/Ar/N₂ plasmas applied to thin film deposition.
• Plasma etching of titanium for MEMS and functional materials
  Study and modeling of titanium etching mechanisms in fluorinated, chlorinated and mixed chemistries, taking into account plasma-surface interactions and morphological evolution of structures.
• Modeling Bosch and cryogenic processes for deep etching
  Development of physical and numerical approaches to understanding passivation, adsorption, desorption and erosion phenomena in cyclic etching processes.
• Modeling and AI for plasma process optimization
  Coupling physical models, experimental data and machine learning tools to improve process performance prediction and reduce development times.

Activities in the research community :

• Member of the GDR EMILI steering committee
• Active member of the cold plasma community
• Participation in the organization of conferences, scientific days and workshops on plasmas, etching and deposition processes
• Involvement in scientific dissemination and scientific leadership within the PCM team

Teaching

I teach in the Physics Department of the UFR Sciences et Techniques de Nantes Université, mainly in the Electronics, Electrical Energy, Automation (EEA) specialization.

My teaching interests include

• electricity and associated mathematical tools ;
• plasma physics and plasma processes ;
• microfabrication and etching/deposition processes;
• introduction to artificial intelligence for electronic systems ;
• educational projects involving modeling, intelligent sensors and plasma processes.

I’m also involved in supervising internships, master’s projects and doctoral work on plasma process modeling and its application to functional materials.

Biography

French :

Rim Ettouri is a lecturer at Nantes University, within the Institut des Matériaux de Nantes Jean Rouxel (IMN), in the Plasmas and Thin Films (PCM) team. His research focuses on the multi-scale modeling of low-pressure plasma processes, in particular for the etching and deposition of functional materials used in micro- and nanotechnologies.

Her work aims to link plasma physics, species transport, plasma-surface interactions and materials evolution to better understand and optimize manufacturing processes. It is developing approaches combining global models, sheath description, Monte Carlo simulations and surface modeling, with a progressive integration of artificial intelligence tools for process analysis and optimization.

Holder of a PhD in plasma physics obtained in 2022 from the University of Orléans, she worked on the plasma etching of high-aspect-ratio titanium for biomedical MEMS applications, in partnership with the company MISTIC. After a post-doctorate at GREMI, she joined IMN in 2023. Her current activities include titanium etching, silicon etching, Bosch and cryogenic processes, and HiPIMS and e-HiPIMS plasma modeling for thin-film deposition.

In parallel with her research activities, she teaches in the EEA program at Nantes University and is involved in the scientific activities of the cold plasma community.

English

Rim Ettouri is an Assistant Professor at Nantes University, within the Institut des Matériaux de Nantes Jean Rouxel (IMN), in the Plasma and Thin Films (PCM) group. Her research focuses on the multi-scale modeling of low-pressure plasma processes, especially for etching and deposition applications in micro- and nanotechnologies.

Her work aims to connect plasma kinetics, species transport, sheath dynamics, plasma-surface interactions and material evolution in order to better understand and optimize plasma-based manufacturing processes. She develops modeling approaches combining global plasma models, sheath descriptions, Monte Carlo simulations and surface interaction models, with a growing interest in artificial intelligence tools for process analysis and optimization.

She received her PhD in plasma physics from the University of Orléans in 2022, where she worked on high-aspect-ratio titanium plasma etching for biomedical MEMS applications in collaboration with the startup MISTIC SAS. After a postdoctoral position at GREMI, she joined IMN in 2023. Her current research activities include titanium plasma etching, Bosch and cryogenic etching processes, and the modeling of HiPIMS and e-HiPIMS plasmas for thin-film deposition.

Alongside her research activities, she teaches in the Electronics, Electrical Energy and Automation curriculum at Nantes University and is actively involved in the low-temperature plasma research community.

Links

• ORCID
• HAL : rim-ettouri
• LinkedIn Rim Ettouri

CNRS Research Director

Functions:

• Research Director, PMN team co-leader
• CNRS Research Director
• Joint Group head of the PMN Group
• Visiting Professor, Toyo University, Japan
• Editor Journal “Carbon

Qualifications:

• PhD Computational Physics, Exeter University (1997)
• Habilitation to direct research, Nantes University (2011)

Expertise:

Carbon Science, DFT Modelling, Defects, Materials Physics and Chemistry, Science Communication

Major research topics:

• Dislocations and point defects in graphite and 2D carbon materials
• Fullerene Science (formation, functionalisation, supramolecular structure formation)
• Nanodiamond Modelling
• Functionalisation and topology of novel nanomaterials
• Science Communication tools and techniques (virtual, physical)

Biography:

Chris Ewels graduated from Oxford University in 1993 in “Metallurgy and the Science of Materials”. After a Ph.D. in 1997 from the University of Exeter UK, for computational studies of oxygen defects in silicon, he moved to Sussex University where he worked on radiation induced defects in graphite and carbon nanosystems. At Sussex he joined the Vega Science Trust with Sir Harry Kroto, where he created an online science TV channel and developed a passion for public communication of science. In Paris he worked at the national aerospace research facilities ONERA, and was then a Marie Curie Individual Research Fellow at the Université Paris Sud within the electron microscopy group of Professor Christian Colliex. In 2006 he received the European Marie Curie Excellence Award and in the same year joined the CNRS at the Institute of Materials in Nantes, becoming Directeur de Recherche in 2015. His work focuses on computer modelling of nanoscale carbons in close collaboration with experimental colleagues. He has authored over 200 journal publications including nine book chapters, and is on the Stanford University list top 2% most cited active scientists. His interest in science communication continues, with Web videos he has commissioned and produced now viewed over 1.5 million times. He is now joint head of the Physics of Materials and Nanostructures group at the IMN, coordinating nanocarbon initiatives at the local, regional, national and European level.

Research projects:

“Current Research Projects (2026)

• Participant ANR CADENA (“Fluorinated nanodiamonds for catalysis”)
• Coordinator ANR DISLOCARBON (“Dislocations in layered carbon nanomaterials”)
• Core-Group Committee, COST Nanospace (“Carbon molecular nanostructures in space”)
• Regional Project LUMOMAT “RunningRings
• Regional Project “Trajectoire Nationale

Teaching:

• M2 E-MAT “Nanocarbon and 2D Materials
• M2 E-MAT “Machine Learning Approaches

Distinction:

• European Carbon Association (ECA) Award (2025)
• British Carbon Group Ubbelohde Award Lecture for Carbon Science (2014)
• European Union Marie Curie Excellence Award (2006)
• Fonds International Wernaers award for knowledge dissemination (2008)
• CineGlobe Public Award for best science documentary (2010)

Publications:

• 1. ‘CO adsorption on pure, defective and mixed composition AlF3 and MgF2 surfaces’
  A. Impellizzeri, J. Dieu, J. Rousseau, S. Brunet, C. P. Ewels*
  Catal. Sci. Technol. 14, 3021-3028 (2024)
• 2 ‘Electronic States of Carbon Materials’
  S. Latil, C. Ewels* (1st Edition: P. Lambin, J. Fink)
  Encyclopedia of Condensed Matter Physics, 2nd Edition, Elsevier, Vol. 5, 702-715 (2024)
• 3. ‘Noncontact Layer Stabilization of Azafullerene Radicals: Route toward High-Spin-Density Surfaces’
  Y. Tanuma, G. Kladnik, L. Schio, M. van Midden Mavrič, B. Anezo, E. Zupanic, G. Bavdek, R. Canton-Vitoria, L. Floreano, N. Tagmatarchis, H. A. Wegner, A. Morgante, C. P. Ewels*, D. Cvetko*, D. Arčon*, ACS Nano 17, 24, 25301-25310 (2023)
• 4. ‘Prismatic Edge Dislocations in Graphite’
  J. G. McHugh*, P. Mouratidis, A. Impellizzeri, K. Jolley, D. Erbahar, C. P. Ewels*
  Carbon, 188, 401-419 (2022)
• 5. Direct Observation and Catalytic Role of Mediator Atom in 2D Materials’
  G.-D. Lee*, A. W. Robertson*, S. Lee, Y.-C. Lin, J.-W. Oh, H. Park, Y.-C. Joo, E. Yoon, K. Suenaga, J. H. Warner, C. P. Ewels*, Science Advances, 6 (24), eaba4942 (2020)

Link HAL

Link orcid: 0000-0001-5530-9601

Link to scholar.google.fr

https://ewels.info/

https://www.linkedin.com/in/ewels/

Contact us:

Dr. Chris Ewels
Nantes Jean Rouxel Institut des Matériaux de Nantes (IMN)
2 Chemin de la Houssinière
44322 Nantes
FRANCE
+33-240 37 64 07
chris.ewels \@ cnrs-imn.fr