Directory

Senior Lecturer

Expertises :

• PVD thin film deposition
• Cold plasmas
• DC and RF magnetron sputtering
• Optical emission spectroscopy
• Profilometry

Senior Lecturer

Functions :

• 2021- : Senior Lecturer (IMN, Nantes University)
• 2019-2021: R&D Engineer ARMOR/CNRS IMS Pessac
• 2017-2019: Postdoctoral researcher, SPECIFIC IKC, Swansea University, Wales, UK
• 2014-2017: Postdoctoral researcher, KAUST, Saudi Arabia

Qualifications :

• 2013 PhD of the Université de Toulouse. Title: “Fabrication and characterization of silicon nanocrystals encapsulated in amorphous silicon matrices: role of interfaces and matrix on structural, optical and electrical properties”.
• 2009 INSA Rennes Engineer – Materials and Nanotechnologies

Expertises :

• Thin films deposition using plasma techniques (Reactive sputtering, DC, RF)
• High Power Impulse Magnetron Sputtering (HiPIMS)
• Functional oxide and nitride thin films

Main research themes:

• Plasma deposition for functional materials and energy applications (reactive sputtering)
• Nitride and oxide thin film electrodes for microsupercapacitors and high-power microbatteries
• Reactive magnetron sputtering, high power impulse magnetron sputtering (HiPIMS)
• Thin films for solar cells (interfacial selective layers)
• Thin film and surface characterizations (electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy…)

Current research projects :

• Bourse doctorale Nantes Université: Perovskite oxide thin films as electrodes for high power microbatteries.
• ANR JCJC PERFORM: Plasma-Processed 3D Electrodes for Microsupercapacitors
• CHIPS: Combinatorial HiPIMS for Sovereignty (CEA – IMN project)
• ASTERIX: Advanced surface technologies for resilient and innovative materials in extreme environments (PEPR DIADEM project, CEA-LPGP-IMN-SIMaP collaboration)

Activities in the research community :

• Member of IRN (Franco-Quebec) NMC
• Cold Plasma Network

Biography

English:

Jérémy Barbé is a researcher at the Institut des Matériaux de Nantes Jean Rouxel (IMN), in the Plasma and Thin Films group (PCM), and a teacher in the Materials department at Polytech Nantes (Nantes University). A specialist in functional materials for energy, his research focuses on thin films deposition by plasma methods such as sputtering and HiPIMS, with applications in electrochemical energy storage microdevices, and thin-film solar cells.

After graduating in materials and nanotechnology engineering from INSA Rennes (2009), he obtained a PhD from Paul Sabatier University (Toulouse III) in 2013, with a thesis on the fabrication by PECVD of silicon nanocrystals in thin-film silica matrices, carried out at CEA LITEN and CNRS LAPLACE. He then moved on to various post-doctorates focusing on sol-gel deposition techniques for thin-film solar cells (CIGS, perovskites and organics). These stopovers took him under the burning sun of Saudi Arabia in KAUST (2014-2016), then under the Welsh clouds in Swansea (2017-2019), before joining the ARMOR group and CNRS IMS in Pessac.

In 2021, he joined IMN as a lecturer where he works on the development of innovative thin-film materials used as electrodes for electrochemical energy storage devices. His research focuses in particular on oxides, nitrides and oxynitrides obtained by reactive sputtering (HiPIMS, DCMS…).

Active in the scientific community, he is a member of IRN NMC and the Cold Plasma Network. His work is regularly published and cited in the field of energy materials.

French :

Jérémy Barbé is a lecturer at the Institut des Matériaux Jean Rouxel (IMN) in Nantes, in the Plasma and Thin Films group (PCM), and a teacher in the Materials department at Polytech Nantes. A specialist in functional materials for energy, his research focuses on plasma deposits, electrodes for microsupercapacitors, and thin-film solar cells, particularly organic and perovskite.

A graduate in materials and nanotechnology engineering from INSA Rennes (2009), in 2013 he obtained a PhD from Paul Sabatier University (Toulouse III), with a thesis on the PECVD fabrication of silicon nanocrystals in thin-film silicate matrices, carried out at CEA LITEN and CNRS LAPLACE. He then moved on to various post-doctorates focusing on sol-gel deposition techniques for thin-film solar cells (CIGS, perovskites and organics). These stopovers took him under the burning sun of Saudi Arabia in KAUST (2014-2016), then under the Welsh clouds in Swansea (2017-2019), before joining the ARMOR group, linked to the CNRS IMS in Pessac.

In 2021, he joined IMN as a lecturer where he works on the manufacture of innovative thin-film materials used as electrodes for electrochemical energy storage devices. His research focuses in particular on oxides, nitrides and oxynitrides obtained by reactive sputtering (HiPIMS, DCMS…).

Active in the scientific community, he is a member of the IRN NMC and the Cold Plasma Network. His work is regularly published and cited in the field of materials for energy.

Teaching :

• Teaching in Polytech Nantes (semiconductors, thin films, sensors, material characterizations)

Publications :

• 35 articles in peer-reviewed journals

Major publications:

• A Lebreton, J Barbé, C Lethien, JN Coleman, T Brousse, Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Substrate Bias Voltage, Journal of The Electrochemical Society 171 (9), 090513, (2024)
• J Barbé, M Newman, S Lilliu, V Kumar, H Ka Hin Lee, C Charbonneau, C Rodenburg, D Lidzey, WC Tsoi, Localized effect of PbI2 excess in perovskite solar cells probed by high-resolution chemical-optoelectronic mapping, Journal of Materials Chemistry A 6 (45), 23010-23018 (2018)
• A Lebreton, C Lethien, JN Coleman, T Brousse, J Barbé, Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Substrate Bias Voltage, Journal of The Electrochemical Society 172 (4), 040523 (2025)
• J Barbé, ML Tietze, M Neophytou, B Murali, E Alarousu, AE Labban, et al, Amorphous tin oxide as a low-temperature-processed electron-transport layer for organic and hybrid perovskite solar cells, ACS applied materials & interfaces 9 (13), 11828-11836 (2017)

Link to orcid: https://orcid.org/0009-0003-3366-4567

Link to scholar.google.fr: https://scholar.google.com/citations?user=oBvrlzgAAAAJ&hl=fr

Functions :

Junior researcher (post-doc), Institut des Matériaux de Nantes Jean Rouxel (since January 2025)

Qualifications :

• PhD in Dense Media and Materials, Université Clermont Auvergne (2020-2024)
• Master in Fundamental Physics and Applications, specializing in Matter and Radiation, Université d’Orléans (2018-2020)

Expertises :

• Thin-film PVD processing
• Semiconductor surface treatment: N2 plasma nitriding
• Atomic Layer Etching (ALE) of materials
• Advanced characterization techniques (ARXPS, RBS, FTIR, UV-Vis, AFM ellipsometry, SEM, XRD)

Current research projects :

Development of an ALE process for the selective etching of β-Ga₂O₃

Biography:

Junior researcher in materials physics and chemistry, at the Institut des Matériaux de Nantes Jean Rouxel (IMN). Her current research focuses on the development of atomic etching processes (ALE) for materials such as β-Ga₂O. His work focuses in particular on the study of plasma-surface interactions and advanced post-etching characterization (XPS, AFM, SEM, DRX…).

Teaching :

Université Clermont Auvergne – 135h vacation assignment (2021-2023)

Publications :

1 scientific publication

ARXPS intensity modeling of SiNx ultrathin layer grown on Si (100) and Si (111) substrates by N₂ plasma treatment, Thin Solid Films, 798 (2024) 140388
https://doi.org/10.1016/j.tsf.2024.140388

Link to publi HAL: https://hal.science/search/index?q=Hiba+Beji

LinkedIn link:www.linkedin.com/in/hiba-beji-095971194

CNRS Research Director

Functions :

• CNRS Research Director in section 08 (former section)
• Oct. 2019 – Assistant to the Scientific Director (ADSR), Limousin-Poitou and La Rochelle sites
• Oct. 1988 Recruited as CR2 CNRS Ecole Centrale de Lyon

Qualifications :

• 2008 Habilitation à Diriger les Recherches – University of Nantes (January 20, 2008): “Thin Film Materials by Plasma Processes”.
• 1989 Doctorate Montpellier University – Materials Science (April 13, 1989)
• 1985 ENSCM Engineer (Ecole Nationale Supérieure de Chimie de Montpellier) (June 1985) – Materials Chemistry option and DEA in Materials Science
• 1983 Master’s degree in Chemistry – Nantes University

Expertises :

• Plasma-assisted thin-film materials (PEPVD, PECVD),
• Process-material correlations,
• Dielectric materials, binary, ternary and quaternary oxides, chalcogenides, nitrides, oxynitrides,
• Interfaces, Devices for Microelectronics, Energy, Photocatalysis,
• Structural and physico-chemical characterization (XPS, AFM)

Main research themes:

When I joined the CNRS (1988), my project was to optimize the SiO2/InP interface, so I developed (1988-1996) the Passivation of III-V materials: surface treatments, oxidation and nitridation by plasma, then deposition of dielectrics (SiO2 and SiNx) by cold plasma PECVD-ECR processes (1988-2000). In parallel (2000-2003), I set up an ICP etching reactor to etch element III nitrides (III-N) using chlorine chemistry.

AlN for thermal management: initiated in 2005 with M.A. Djouadi (IMN) as part of a CIFRE thesis with Thales III-V Lab (S. Delage, C. Brylinski), the aim was to produce thin layers of AlN, a good thermal conductor for microwave power transistors, GaN-based piezoelectric HEMTs (GaN HEMTs), to ensure thermal management and primary passivation (diffusion barrier and evacuation of heat generated during operation). In the course of two theses (C. Duquenne-2008 (CIFRE Thales); B. Abdallah-2009 (Syrian government)), AlN deposition and thermal properties were optimized. In collaboration with CRHEA (Sophia Antipolis), AlN epitaxy on AlGaN and AlN has been demonstrated (MBE-CRHEA substrates). (2005-2012)

Complex oxides by Magnetron spraying. This theme was initiated before my arrival by P.Y. Tessier and L. Brohan during M-W CHU’s PhD thesis (2002). As soon as I moved to Nantes (2003-2008), I set up a dedicated reactor (2003) and pursued the project until 2008. The results obtained confirmed the relevance of magnetron sputtering for the deposition of ternary and quaternary materials, particularly compared with laser ablation (PLD), which limits deposition surfaces to cm2. This formed the basis for subsequent studies on other materials, within the framework of two application- and industry-oriented theses (Emeline Souchier (BDI CNRS-ST Microelectronics, 2006-2010): study of the deposition of GaV4S8 material in collaboration with PCM/PMN and Fatiha Challali, (2007-2010) (CIFRE MHS Thesis): study of the deposition of high dielectric constant (BST, TiTaO) and high resistance (TiON) oxides. These studies were the first to focus on Mott insulators. (2003-2011)

Mott insulators are materials with exceptional properties, and their thin-film production has opened the way to numerous applications. A new type of electronics, called “Mottronics”, enables the production of integrated Mott memories in the form of thin films for information storage (IPCEI project), or the manufacture of energy-saving neural networks and synapses for artificial intelligence (Mott-IA regional project). (2005-2025)

Materials for energy is a new focus for the PCM (Plasma Couches Minces) team in collaboration with ST2E (Stockage et Transformation Electrochimique de l’Energie) in the field of energy micro-storage. In particular, the aim is to bring the versatility of plasma-assisted processes to the development of materials for micro-supercapacitors and micro-batteries. (2021 -2027)

Current research projects

• 2023-2027 ANR NACELL: IMN Scientific Resp., Post-doc 12 months, € 118 K
• 2023-2027 European IPCEI contract with ST-Microelectronics (PMN sponsor)
• 2022-2027 Mott-IA regional project (€2.5 M) Porteut L. Cario (PMN)
• 2024-2028 ANR ADN, Porteur C. Villeneuve (LAPLACE)

Activities in the research community :

• 2024-2025 Co-leader of “Materials” WG, 2nd Microelectronics Survey for DRE CNRS
• 2018-2019 Co-leader of the “Materials” WG, Microelectronics Initiative for INSIS-CNRS
• 2016-2023 Member appointed to the CNRS National Committee, section 08: 2016-2021 and 2021-June 2023
• 2016-2022 Director of GDR 3660 OXYFUN, Board member (January 2014-July 2016)
• 2015-2019 CNRS representative on the INSA Centre Val de Loire Board of Directors
• 2005- 2013 Board member of C’Nano Nord-Ouest, correspondent for the Pays de la Loire region
• 2005- 2013 IMN Valorisation Correspondent at DR17-CNRS
• 2016-2025 Member of 23 Selection Committees (COS)
• 2008-2025 Participation in 100 thesis (86) and HDR (14) juries, including 60 reports

Expertise :

• 2017 – 2024 : Member of HCERES Evaluation Committees : LPICM (Palaiseau) ; XLIM (Limoges) ;
• GREMAN (Tours); CRHEA, Nice; UDSMM (UCLO), GEMaC (UVSQ), GeePs (Paris Saclay)
• 2018 – 2025: ANR projects for CES 08, CES 09, CE24, ANR ASTRID, CE05 (13 Projects)
• 2015 – 2017: Pre-project evaluation (78 projects) and ANR CEP member (CES 09) Challenge 3 (30 projects)
• 2009 -2014: Member of the ANR P3N then P2N Evaluation Committee: 2009, 2010, 2011,
• ANR Blanc SIMI 4 Evaluation Committee (2013), 2 AERES committees (section 08 CNRS, 2014)
• 2010 – 2014, 2018: Mid-term reviews of ANR projects (30 projects) and Expertise on 18 ANR projects
• Other expertise: DFG Elan (Germany); Fonds Collège-Industrie Québec (Canada); 2015: Nano IDF and IDEX project for Université Strasbourg; 2016: INSA Lyon BQR project; 2019 : Univ. Lyon and Marseille; 2018-2019 : CEFIPRA projects (France-India collaboration);

Biography:

In all my activities, I’m concerned with teamwork, interdisciplinarity and a certain taste for risk. Materials physical chemist and CNRS Research Director at the Jean Rouxel Nantes Institute of Materials (IMN): after a master’s degree in chemistry in Nantes, an engineering diploma from the Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM) and a doctorate in Materials Science in Montpellier, I joined the CNRS in 1988 at the Ecole Centrale de Lyon in the LPCI then LEAME (now LEOM, then INL) laboratory. In charge of a PECVD-ECR deposition reactor, I developed passivation processes for III-V semiconductors and thin-film deposition of dielectric materials for microelectronics. I moved to Nantes in 2003, and in 2008 obtained a “Habilitation à diriger des recherches” (“From functional material to device”), and developed reactive magnetron sputtering deposition processes for numerous new materials to produce devices for several fields (Microelectronics, Energy, Photocatalysis). For over 20 years, within the Mott insulator development group, and more broadly within the PCM team, I have been contributing my experience in the field of thin-film materials. The work of the Mottronics group (PMN/PCM) on Mott insulators with exceptional properties was rewarded by the Félix Robin 2023 prize, awarded by the French Physical Society to the group of five permanent staff involved during the JMC 2024 in Marseille.

Teaching :

• 2008-2018: Co-leader of the “Thin Films: Elaboration, Characterization and Applications” module (20h), Master NanoSciences Nord-Ouest, with M. Guilloux-Viry (ISCR Rennes).
• 2018-2023: Lecture (2h30/year) in Master 1, ITI MPP, IUT de Nantes
• 2023, 2024: Intervention ”New materials and applications” Summer School, Beijing Institut of Technology (BIT) Physics Department, Beijing, China (~30h of classes).
• 2025: lectures in Beijing and Zuhai (new university in southern China) (2 x 25 h of lectures)

• Distinction

2023: Félix Robin prize from the French Physical Society

Publications :

May 2025: 94 publications, 5 patents (including 2012, 2014), over 140 oral presentations (52 as speaker); 15 invited lectures (speaker) at international conferences, over 250 conference presentations.

Major illustrative publications:

Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant*, Etienne Janod, Benoît Corraze, Pierre-Yves Jouan, Laurent Cario and Marie-Paule Besland*, Enhancing the resistive memory window through band gap tuning in the solid solution (Cr1-xVx)2O3, ACS Applied Materials & Interfaces, 15, 54611-54621 (2023).

M. Mitronika, C. Villeneuve-Faure*, F. Massol, L. Boudou, W. Ravisy, M.P. Besland, A. Goullet, M. Richard-Plouet, TiO2-SiO2 mixed oxide deposited by low pressure PECVD: insights on optical and nanoscale electrical properties, Applied Surface Sciences, 541 (2021) 148510.

F. Challali*, D. Mendil, T. Touam, T. Chauveau, … M.-P. Besland; Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration, Mat. Sci. Semicond. Proc. 118, 105217, 2020.

E. Janod*, J. Tranchant, B. Corraze, M. Querré, P. Stoliar, M. Rozenberg, T. Cren, D. Roditchev, V. Ta Phuoc, M. P. Besland and L. Cario; Resistive switching in Mott insulators and correlated systems (Invited Review) Advanced Functional Materials, 25 (40) SI, 6287-6305 (2015)
(DOI: 10.1002/adfm.201500823)

Han Jun-Feng*, Liao Cheng, Cha Limei, Jiang Tao, Xie Hua-Mu, Zhao Kui, M.-P. Besland*, TEM and XPS studies of CdS/CIGS interfaces, Journal of Physics & Chemistry of Solids 75 (2014) 1279-1283.

J. Tranchant*, A. Pellaroque, E. Janod, B. Angleraud, B. Corraze, L. Cario, M.-P. Besland*, Deposition of GaV4S8 thin films by H2S/Ar reactive sputtering for RRAM applications, Journal of Physics D: Applied Physics 47 (6), 065309 (2014).

A. Rouahi*, A. Kahouli, F. Challali, M.-P. Besland, C. Vallée, B. Yangui, S. Salimy, A. Goullet, A Sylvestre*, Impedance and electrical modulus study of amorphous TiTaO thin films: Highlight of the interphase effect, J. Phys. D: Appl. Phys. 46 065308 (2013) (doi:10.1088/0022-3727/46/6/065308)

C. Duquenne, M. P. Besland*, P.Y. Tessier, E. Gautron, D. Averty, Y. Scudeller, Thermal Conductivity of Aluminum Nitride Thin Films prepared by Reactive Magnetron Sputtering, J. Phys. D: Appl. Phys. 45, 015301 (2012).

E. Al Alam, I. Cortes, M.-P. Besland*, A. Goullet, L. Lajaunie, P. Regreny (INL), Y. Cordier, J. Brault (CRHEA), A. Cazarre, K. Isoird, G. Sarrabayrousse, F. Morancho (LAAS), Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces; J. Appl. Phys., 109, 084511 (2011).

M. Lapeyrade, M.P. Besland*, C. Meva’a, A. Sibai (LPM-INSA-Lyon), G. Hollinger (LEOM-ECL), Silicon nitride thin films deposited by Electron Cyclotron Resonance Plasma, J. Vac. Sci. Technol A 17(2), 433-444 (1999).

M.P. Besland*, S. Jourba, M. Lambrinos, P. Louis, P. Viktorovitch, G. Hollinger (LEAME-ECL), Optimized SiO2/InP structures prepared by Electron Cyclotron Resonance Plasma, J. Appl. Phys. 80, 3100, (1996).

G. Hollinger*, D. Gallet, M. Gendry (LEAME-ECL), M.P. Besland, J. Joseph (LPCI), Evidence for a new passivating indium rich phosphate prepared by ultraviolet/ozone oxidation of InP, Appl. Phys. Lett. 59, 1617, (1991).

M.P. Besland*, C. Guizard, N. Hovnanian, A. Larbot, L. Cot (LPCM-ENSCM-Montpellier), J. Sanz, I. Sobrados, M. Gregorkiewitz, (CSIC-Institute of Materials-Madrid), Silicon and carbon liquid and solid MAS NMR spectroscopies study of the polycondensation of Heteropolysiloxanes, J. Am. Chem. Soc. 113, 1982-1987, (1991)

Brevets

5 unexploited (1990, 2007, 2009, 2012, 2014); Two unsuccessful invention declarations (2008, 2010)

Link to publi HAL: https://cnrs.hal.science/search/index/?q=authFullName_t%3Abesland&rows=30&sort=publicationDate_tdate+desc

Link to orcid :ORCID: https://orcid.org/0000-0002-2680-2402

Link to scholar.google.fr: https://scholar.google.fr/citations?user=Ne_tI1wAAAAJ&hl=fr

LinkedIn link: https://www.linkedin.com/in/marie-paule-besland-20b880108/

Function:

Post-doctoral fellow

Qualifications :

• Master of Science in Fusion and Plasma Science (2018)
• PhD student in plasma physics (2022)

Expertises :

Plasma PVD in DC (Dirrect Current) and HiPIMS (High Power Impulse Magnetron Sputtering) regimes

Main research themes:

• Exploratory study of a new plasma regime: e-HiPIMS (electron-enhanced High Power Impulse Magnetron Sputtering)
• Creation of an AI database to help us with experimental design and to help us with the relationships between various plasma parameters (pressure, distance, voltage, etc.).

Current research projects :

• CHIPS: Combinatorial HiPIMS for Sovereignty (CEA – IMN project)
• ASTERIX: Advanced surface technologies for resilient and innovative materials in extreme environments (PEPR DIADEM project, CEA-LPGP-IMN-SIMaP collaboration)

Biography:

Dimitri Boivin is a post-doc at the Institut des Matériaux Jean Rouxel (IMN) in Nantes, in the Plasmas and Thin Films (PCM) group. Specialist in DC and HiPIMS PVD deposition. He completed his Master’s degree at the University of Lorraine, and his thesis at the Institut Jean Lamour in Nancy. He did his first Post-Doctorate at GREMI on thin film deposition for antibacterial applications. On March 1, 2024, he took up a post-doctoral position at IMN.

Publications :

7

Major illustrative publication:

Using a coupled optical and electrical monitoring method to follow theR-HiPIMSTiO2 deposition process drifts. Boivin, D & Jean-Marie-Desiree, Ronny & Najah, Aymane & Cuynet, Stéphane & Poucques, L.. (2024). Physica Scripta. 99. 10.1088/1402-4896/ad3302.

Link to orcid: https://orcid.org/my-orcid?orcid=0009-0009-9254-7989

LinkedIn link: https://www.linkedin.com/in/dimitri-boivin-92ba59234/

CNRS Research Associate

CNRS Research Director

Function:

CNRS researcher

Expertises :

• Low-pressure cold plasma etching of materials.
• Plasma diagnostics (optical emission spectrometry, mass spectrometry, electrostatic probes).
• Surface characterization (XPS, ellipsometry).

Main research themes:

• Low-pressure rf plasma processes and study of plasma-surface interaction mechanisms for materials etching and treatment.
• Etching V2O3
• Plasma-surface interaction mechanisms at low temperatures

Current research projects :

ANR project 20-CE24-0014-02 PSICryo “Understanding plasma-surface interactions in cryogenic etching for advanced patterning applications”, involving LTM-Grenoble (leader), GREMI-Orléans and IMN-Nantes. For IMN, the aim is to study the surface mechanisms (chemisorption vs. physisorption) involved in cryogenic etching processes, particularly with a view to controlled atomic layer etching (ALE).

https://anr.fr/Projet-ANR-20-CE24-0014

Biography:

After university studies and a thesis on the structural characterization of SiGe:H and Si:H,Cl amorphous semiconductors by X-ray and electron spectroscopy, I joined the CNRS to work on the characterization of cold plasma-treated surfaces and thin-film materials (1985-1988). My interests then extended to the study of plasma processes for etching semiconductor, dielectric or metallic materials (1988-present).

I was interested in and trained in the physics of radio-frequency excited discharges in gases at low pressure (~1 Pa) and their diagnostics. This led me to develop expertise in the etching of materials for microelectronics: Si, SiO2, low-κ organosilicides, silica glasses and W in fluorinated plasma (SF6, CHF3, C2F6), and in the etching of materials for photonics: InP and CdHgTe in CH4-H2 plasma and derivatives, chalcogenide glasses in fluorinated and CH4-H2 plasmas. This has also led me to develop expertise in the physical and chemical characterization of plasmas using mass spectrometry, optical emission spectrometry and electrostatic probes, as well as in the characterization of surfaces and interfaces using photoelectron spectrometry, ellipsometry and near-field microscopy.

My current research concerns the etching of vanadium oxide V2O3 and the fundamental mechanisms of etching and plasma and gas interaction with the surface at cryogenic temperature.

Publications :

122

Major illustrative publications:

Review articles
Ch. Cardinaud, M-C. Peignon, P.Y. Tessier “Plasma etching: principles, mechanisms, application to micro- and nanotechnologies” Appl. Surf. Sci. 164, 72-83 2000.
http://dx.doi.org/10.1016/S0169-4332(00)00328-7

C. Cardinaud “Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment” Comptes Rendus Chimie de l’Académie des Sciences 21, 723-739 2018.
https://doi.org/10.1016/j.crci.2018.01.009

Articles on plasma etching mechanisms, plasma diagnostics, plasma-surface interaction
Ch. Cardinaud, A. Rhounna, G. Turban, B. Grolleau “Contamination of silicon surfaces exposed to CHF3 plasmas: An XPS study of the film-surface interface” J. Electrochem. Soc. 135, 1472-1477, 1988. http://dx.doi.org/10.1149/1.2096034

Ch. Cardinaud, G. Turban “Mechanistic studies of the initial stages of etching of Si and SiO2 in a CHF3 plasma” Appl. Surf. Sci. 45, 109-120, 1990.
http://dx.doi.org/10.1016/0169-4332(90)90061-4

M-C. Peignon, Ch. Cardinaud, G. Turban “A kinetic study of reactive ion etching of tungsten in SF6 – O2 RF plasmas” J. Electrochem. Soc. 140, 505-512, 1993.
http://dx.doi.org/10.1149/1.2221077

Y. Feurprier, Ch. Cardinaud, G. Turban “Influence of the gas mixture on the reactive ion etching of InP in CH4 – H2 plasmas” J. Vacuum Sci. & Technol. B 15, 1733-1740 1997.
http://dx.doi.org/10.1116/1.589363

F. Gaboriau, G. Cartry, M-C. Peignon, Ch. Cardinaud “Selective and deep plasma etching of SiO2: comparison between different fluorocarbon gases (CF4, C2F6, CHF3) mixed with CH4 or H2 and influence of residence time” J. Vacuum Sci. & Technol. B 20, 1514-1521 2002.
http://dx.doi.org/10.1116/1.1495502

S. Bouchoule, R. Chanson, A. Pageau, E. Cambril, S. Guilet, A. Rhallabi, C. Cardinaud “Surface chemistry of InP ridge structures etched in Cl2-based plasma analysed with angular XPS” J. Vacuum Sci. & Technol. A 33, 05E124 2015.
http://dx.doi.org/10.1116/1.4927541

J. Piet, W. Faider, A. Girard, F. Boulard and C. Cardinaud “Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas” J. Vacuum Sci. & Technol. A 38, 053005 2020. https://doi.org/10.1116/6.0000397

T. Meyer, A. Girard, G. Le Dain, A. Rhallabi, E. Baudet, M. Baillieul, V. Nazabal, P. Němec and C. Cardinaud “Mass spectrometry and in situ X-ray Photoelectron Spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma” Plasma Sources Sci. & Technol. 32 (2023) 085003.
https://doi.org/10.1088/1361-6595/aceaa5

Articles related to expertise in XPS analysis – external collaborations
K. Tsougeni, N. Vourdas, A. Tserepi, E. Gogolides, C. Cardinaud “Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces” Langmuir 25, 11748-11759 2009.
http://dx.doi.org/10.1021/la901072z

E. Baudet, C. Cardinaud, A. Girard, E. Rinnert, K. Michel, B. Bureau, V. Nazabal “Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies” J. Non-Cryst. Solids 444, 64-72 2016.
http://dx.doi.org/10.1016/j.jnoncrysol.2016.04.017

Link to publi HAL: https://hal.science/search/index?q=cardinaud+christophe

Link to orcid: https://orcid.org/0000-0002-9753-8848

Other links :

• Société Française du Vide
• Cold Plasma Network
• Cold plasma training in France

Functions :

Doctoral student

Main research themes :

Plasma modeling, HiPIMS process, thin films, titanium

Current research projects :

PhD on multi-scale plasma modeling in high-power pulse magnetron sputtering (HiPIMS) for titanium thin film deposition.

Activities in the research community :

Co-president of the SYRA association.

Representative of Nantes doctoral students at the Collège Doctoral Matière, Molécules, Matériaux et Géosciences (3MG).

Biography:

After a Master’s degree in Materials Science (Innovative Materials and Systems for Energy) at Nantes University, I had the opportunity to develop my skills within the PCM team at IMN, during a research internship on semiconductor etching plasmas, before embarking on a PhD within the same team, on plasma modeling in the HiPIMS process, for the deposition of titanium thin films.

I’m involved in IMN’s SYRA doctoral students’ association, as co-president. I also attach great importance to the well-being of doctoral students, and was lucky enough to be elected doctoral student representative on the Collège Doctoral Matière, Molécules, Matériaux et Géosciences (3MG).

Teaching :

UE XLG4PU050 Modeling for Physics 2

Link to orcid: https://orcid.org/0009-0006-8897-197X?lang=en

LinkedIn link: www.linkedin.com/in/coline-chartrain-4372b3223

Senior Lecturer

Functions :

• 2023-present: Senior lecturer, IMN – Nantes University (PCM group)
• 2022-2023: Temporary Teaching and Research Associate (ATER), GREMI – University of Orléans
• 2022: Postdoctoral researcher, GREMI – Université d’Orléans
• 2019-2022: CIFRE doctoral student / Microsystems engineer, MISTIC SAS – Orléans

Qualifications :

• 2022: PhD in Plasma Physics, Université d’Orléans (GREMI / MISTIC SAS) Title: High aspect ratio titanium etching for biomedical innovations
• 2019: Research Master (Microelectronics and Nanoelectronics), Aix-Marseille University
• 2018 : Engineering degree, Mines Saint-Étienne, specializing in nanoelectronic devices

Expertises :

• Plasma etching (RIE, DRIE, ALE)
• Multi-scale modeling of plasma processes
• Plasma HiPIMS, PECVD, Bosch, cryogenic
• Plasma characterization (Langmuir, RFEA, OES), surface characterization (XPS, DRX, AFM, SEM…)
• Cleanroom microfabrication, titanium structuring

Main research themes:

• Plasma etching of titanium for MEMS (aspect ratio >10)
• Development of innovative plasma processes (fluorinated, chlorinated, mixed)
• Simulation of plasma-surface interactions (Monte Carlo)
• Modeling and AI for plasma process optimization

Current research projects :

• HiPIMS modeling (co-supervised PhD, early 2024)
• FAISTOS 2025 (coll. Valeria Borodin – STMicroelectronics Tours – Bosch engraving)
• PULSAR project (Pays de la Loire region – currently being evaluated)

Activities in the research community :

• GDR EMILI co-cil member
• Member of the Board of Directors of the Société Française de Physique – section Centre
• Member of organizing committees :
• 2025: COFMER
• 2024: RAFALD
• 2023: PlaCEP
• 2022: J²C, PlaCEP, SFµ Junior

Biography

French :

Rim Ettouri is a lecturer at the Institut des Matériaux de Nantes (IMN), in the Plasma and Thin Films group (PCM). She also teaches in the Physics Department (“Electronics, Electrical Energy and Automation” – EEA) of the Science and Technology Faculty of Nantes University. Her research focuses on multi-scale modeling of low-pressure plasma processes, in particular for etching and deposition processes used in micro and nanotechnologies. She is developing approaches combining Monte Carlo simulations, plasma modeling and surface modeling, with a progressive integration of artificial intelligence (AI) to optimize process prediction and efficiency.

With a PhD in physics from the University of Orléans in 2022, she worked on titanium plasma etching for biomedical MEMS, in partnership with startup MISTIC SAS. She then continued her work at GREMI before joining IMN. In 2024, she will be spending a year in Professor Mark Kushner’s plasma modeling group at the University of Michigan.

She is a member of the GDR EMILI steering committee, active in the cold plasma community, and is also involved in scientific mediation.

English

Rim Ettouri is an Assistant Professor at the Institut des Matériaux de Nantes (IMN), within the Plasma and Thin Films (PCM) group. She also teaches in the Department of Physics (Electronics, Electrical Energy and Automation – EEA) at Nantes University, Faculty of Science and Technology. Her research focuses on multi-scale modeling of low-pressure plasma processes for etching and deposition, with a strong interest in coupling simulation tools with experimental validation and artificial intelligence.

She earned her PhD in 2022 from the University of Orléans (GREMI / MISTIC SAS), where she developed deep etching processes for titanium-based biomedical MEMS. Following a postdoctoral fellowship, she joined IMN in 2023. Her current work involves plasma, sheath, and surface modeling, as well as Monte Carlo simulations for complex 3D structures. In 2024, she conducted a scientific stay in the group of Professor Mark Kushner (University of Michigan), a leading expert in plasma modeling.

Rim is a member of the GDR EMILI steering committee, actively participates in the cold plasma network, and is engaged in both teaching and scientific outreach.

Senior Lecturer

Functions :

• 2014-… Lecturer, Nantes University, IMN PCM (Plasma Couches Minces) team.
• 2013-2014 Maturation engineer, SATT, France, Ouest Valorisation, BatElecCir.
• 2011-2013 ATER, Université de Rennes 1, France, UFR sciences et propriétés de la matière, SPI specialization, IETR, UMR6164.
• 2010-2011 ATER, University of Rennes 1, IUT GEII, France, IETR, UMR 6164.
• 2009-2010 Postdoctorate, ENS Cachan Bretagne, France, BIOMIS team, SATIE, UMR 8029.

Qualifications :

• 2005-2008 PhD in Electronic Engineering, University of Rennes 1, Rennes, France.

Suspended-gate transistor electronic detection of protein markers linked to iron metabolism.

Thesis in the Microelectronics and Microsensors Department (D2M) of the IETR (Institut d’Electronique et des Technologies du numéRique).

• 2002-2005 M.Sc.A: Master of Applied Sciences, University of Sherbrooke, Canada.

Design and manufacture of a calorimeter for living cells.

Master’s degree in electrical engineering, majoring in microelectronics, with research project in collaboration with MIT and the University of Auckland in New Zealand.

• 2001-2002 Maîtrise EEA, Université de Marne-La-Vallée, France.

Master’s degree in Electronics, Electrical Engineering and Automation, specializing in electronics, microelectronics and optronics.

• 1998-2001 ESTE, École Supérieure de Technologie Électronique, France.

Part of the ESIEE group, this three-year program offers an international level certified Bachelor of Engineering degree in electronics. Specializing in electronics and microelectronics.

Expertises :

• Etching processes in fluorine-based plasmas (SF6, CHF3, CF4, C2F6).
• Analysis of materials and surfaces using X-ray photoelectron spectroscopy.

Main research themes:

His scientific interests cover functionalization aspects and recurring issues in plasma etching, as well as process development. His current research focuses on cryo-ALE (Cryogenic Atomic Layer Etching) and all the mechanisms involved at the plasma-surface interface during this type of treatment.

Biography:

Aurélie GIRARD graduated from the Université de Sherbrooke in 2005, as an electrical engineer specializing in biosensors and microfabrication in collaboration with the University of Auckland and MIT on “Fabrication of a microcalorimeter to measure the thermodynamic properties of a living cell”. With a PhD in electrical engineering from the University of Rennes (2008), specializing in microelectronics linked to biosensors, his research topics, carried out during his thesis and several post-doctorates, combine processes for manufacturing and characterizing microelectronic devices and chemical surface functionalization for grafting biological species: firstly on the fabrication and electrochemical functionalization by diazonium salts of nanostructures and devices based on different silicon compounds, then on the design and fabrication of electrochemical multi-sensors for the analysis of markers of neurological lysosomal storage and acute strokes. This project was carried out in collaboration with ENSCP. Finally in 2014, she joined the Plasmas and Thin Films group at IMN in Nantes, to work as a teacher-researcher on the dry etching of materials with microelectronics applications, using low-pressure RF reactive plasmas.

Teaching :

At Nantes University since September 2014, its teaching courses deal mainly with electronics and physics in L1, L3, M1 and M2 (initial training or offered on a sandwich course basis (M2)) with a classic organization (lectures, TD and TP) but also in the form of projects.

Publications :

Number of publications

• More than 25 publications, including 12 since 2019.
• More than 20 communications since 2019.
• Online resource: Researchgate : http://www.researchgate.net/profile/Aurelie_Girard3

Major illustrative publications:

• “An insight on plasma-surface interaction mechanisms during cryoetching in SiF4-O2, using in situ XPS”;
  C. Cardinaud, A. Girard, G. Antoun, J. Nos, T. Tillocher, R. Dussart; Plasma Etch and Strip for Microelectronics (PESM), Leuven, Belgium, September 19-23, 2022.
• “Quasi In Situ XPS on a SiOxFy Layer Deposited on Silicon by a Cryogenic Process”;
  G. Antoun, A. Girard, T. Tillocher, P. Lefaucheux, J. Faguet, K. Maekawa, C. Cardinaud and R. Dussart. Dussart; ECS J. Solid State Sci. Technol. 2022, 11, 013013.
• “Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas”;
  T Meyer, A. Girard, G LeDain, A. Rhallabi, E. Baudet, V. Nazabal, P. Nemec and C. Cardinaud. Appl. Surf. Sci. 2021, 549, 149192.
• “Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas”;
  J. Piet, W. Faider, A. Girard, F. Boulard and C. Cardinaud. Journal of Vacuum Science & Technology A 2020, 38, 053005.

LinkedIn link :https://www.linkedin.com/in/aurelie-girard-5916091b/

University Professor

Functions :

Research Professor at Polytech Nantes, Deputy Director of Research at the Science and Technology Division of Nantes University

Qualifications :

University Professor, CE1, 63 CNU

Expertises :

• PECVD thin-film deposition of oxide dielectric materials.
• Nanocomposite thin films.
• UV-Visible ellipsometry and optical spectroscopy.
• Thin-film component technologies.

Main research themes:

• Development of innovative hybrid processes combining low-pressure plasma (PECVD) and injection of colloidal solutions for the deposition of nanocomposite materials
• Optical, electrical and catalytic properties of oxide nanocomposites (TiO2(NPs)/SiO2 (Matrix); ZnO (NPs)/SiO2(Matrix); FeOy (NPs)/ TiO2 (Matrix),….): from nano-object dispersion to multifunctional properties

Current research projects :

• ANR ADN project: Advanced Dielectric Nanocomposite thin films processed by hybrid aerosol / low pressure plasma for microelectronic capacitor applications (2025-2028), in collaboration with LAPLACE of Toulouse.
• Participation in the supervision of Sarah Hekking’s thesis in collaboration with the Université de Montréal (Pr Luc Stafford) and IRN-CNRS Controlled Multifunctional Nanomaterials.
• Nanocomposite thin films including Fe2O3 nanoparticles in a TiO2 matrix, produced by a hybrid deposition process combining plasma and solution injection.

Activities in the research community :

Member of GDRI -IRN Controlled Multifunctional Nanomaterials

Biography:

Antoine Goullet is University Professor (exceptional class) at Nantes University, and a member of the Jean Rouxel Materials Institute in Nantes (IMN – UMR 6502). His current research focuses on the synthesis and study of the optical and electrical properties of nanocomposite dielectric thin films. These materials are developed using innovative hybrid processes, combining injection of colloidal solutions with plasma-assisted vapor deposition (PECVD), operating at low pressure and low temperature. He has authored or co-authored over 80 scientific publications in international journals. He has supervised or co-supervised 10 doctoral theses, and supervised three post-doctoral fellows. Scientific leader of several ANR-funded projects, he has also coordinated a European project (PHC) and participated in over 60 thesis juries. After serving as Director of Research at Polytech Nantes (2016-2021), since January 2022 he has been Deputy Director of Nantes Université’s Science and Technology cluster, in charge of research issues.

Teaching :

In the engineering cycle at Polytech Nantes in the Electronics and Digital Technologies (ETN) department and in the PEIP D preparatory cycle at Polytech Nantes, linked to the BUT GEII course at the Nantes IUT.

• Semiconductor physics (C/TD/TP),
• Microelectronics (C/TD/TP),
• Physics and Technology (C/TD/TP),
• Follow-up of engineering projects with industrial customers,
• Apprentice tutoring,

At the interface with Human and Social Sciences and ETN :

• Professional network
• Sustainable Development and Corporate Social Responsibility

Publications :

More than 80

Major illustrative publications:

• Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method
  C. Villeneuve-Faure, M. Mitronika, A. P. Dan, L Boudou, W. Ravisy, M.P. Besland, M.. Richard-Plouet and A. Goullet
  Nano Express 5 (2024) 5, 015010; DOI 10.1088/2632-959X/ad220d
• Kinetics driving nanocomposite thin-film deposition in low-pressure misty plasma processes
  S. Chouteau, M. Mitronika, A. Goullet, M. Richard-Plouet, L. Stafford, A. Granier
  J. Phys. D: Appl. Phys. (2022) 55, 505303; DOI 10.1088/1361-6463/ac9ac2
• Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry
  W. Ravisy, M. Richard-Plouet, B. Dey, S. Bulou, P. Choquet, A. Granier and A. Goullet
  J. Phys. D: Appl. Phys. (2021) 54, 445303; DOI 10.1088/1361-6463/ac1ec1
• In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
  D. Li, M. Carette, A. Granier, J.P. Landesman, A. Goullet
  Appl. Surf. Sc. (2013) 283, 234; DOI 10.1016/j.apsusc.2013.06.091
• Optical spectroscopic analyses of OH incorporation into SiO2 films deposited from O2/TEOS plasmas
  A. Goullet, C. Vallée, A. Granier and G. Turban
  J. Vac. Sci. Technol. A (2000) 18, 2452; DOI 10.1116/1.1287152

Link to orcid: https://orcid.org/my-orcid?orcid=0000-0001-5411-4351

Link to scholar.google.fr: https://scholar.google.com/citations?user=8xWSg2wAAAAJ&hl=fr&oi=ao

LinkedIn link:https://www.linkedin.com/in/antoine-goullet-b1663110/

Research Director

Functions :

CNRS Research Director (DR1) at IMN (80%) and “Plasmas” Scientific Delegate at CNRS Ingénierie (20%)

Expertise :

Low-pressure cold plasma processes, PECVD thin film deposition from organometallic precursors, plasma diagnostics (OES, Langmuir probe, mass spectrometry).

Main research themes :

• deposition of thin films with dielectric, optical, photocatalytic and barrier properties (SiO2, SiOCH, TiO2) by plasma-assisted chemical vapor deposition (PECVD)
• deposition of multifunctional nanocomposite thin films by low-pressure plasma injection of colloidal solutions (TiO2:SiO2, ZnO:SiO2, etc.).
• study of plasma/surface interaction mechanisms
• global study of plasma processes for nanomaterial synthesis and thin-film deposition

Current research projects :

• Hybrid mist plasma deposition of nanocomposite thin films: injection of a colloidal solution into a low-pressure plasma.
• Nanocomposite thin films of iron oxide nanoparticles in a TiO2 matrix (in collaboration with UdM, Montreal)
• Nanocomposite thin films of TiO2 nanoparticles in a SiO2 matrix, dielectric properties (ANR ADN project, 2025-2028)

Activities in the research community :

• Member of the Board of Directors, Société Française du Vide
• Member of the Plasmas Froids network and GDR EMILI

Biography

• 2013-2021 : Deputy Director of IMN
• 2017-2020: Member of the CE08 Evaluation Committee of the Agence Nationale de la Recherche (French National Research Agency)
• 2012-2016: Appointed member of the Comité National de la Recherche Scientifique, section10
• 2005-2012: Head of the Plasmas and Thin Films team at IMN (25-30 people)
• 2012-2015: Member of the Board of the Ecole Doctorale 3MPL (Molecules, Matter and Materials in Pays de Loire)
• 2008-2011: Member of the ANR non-thematic evaluation committee (CSD2 then SIMI9)
• 2004-2006: Coordinator of the Cold Plasma Network of the MRCT (CNRS) (400 members)
• 2001-2003: Project manager at the CNRS SPI (Sciences pour l’Ingénieur) Department
• 1998-2005: Head of the PECVD team at IMN’s Plasma Thin Film Laboratory
• 1994-1997: Director of the GDR “Processes for depositing thin films usingorganosilicon plasmas“.
• 1986-1992: Research Associate (CR2 from 1986 to 1990, then CR1) at the Gas and Plasma Physics Laboratory (Orsay)

Senior Lecturer

Functions :

• Senior Lecturer HC
• Deputy Director, IMN
• PLASSMAT platform coordinator
• CNRS Sustainable Development Officer

Expertises :

Transmission electron microscopy

Teaching :

UFR Sciences & techniques – Chemistry Department

Link to orcid: https://orcid.org/0009-0008-0063-451X

CNRS Research Fellow

Functions :

• CNRS Research Fellow (Section 15 – Chemistry of materials, nanomaterials and processes)
• 2023-2025: Marie Skłodowska-Curie Individual Fellow (MSCA-PF)
• 2020-2023: Postdoctoral researcher with Pf. J. P. Hofmann, Pf. W. Jaegermann and Dr. T. Mayer at the Technical University of Darmstadt, Germany

Qualifications :

• 2019 : PhD thesis from the University of Lyon in Chemical Physics and Catalysis under the supervision of Dr. C. Geantet, Dr. E. Puzenat, Dr. L. Cardenas, Dr. P. Afanasiev
• 2016: Master’s degree from ENSMAC (formerly ENSCBP) and the University of Bordeaux, specializing in Chemical Physics, Materials Chemistry and Energy.

Expertises :

Photoelectron spectroscopy for solar energy conversion materials.

Main research themes:

• Thin films and nanopowders: oxides, oxynitrides, chalcogenides
• Photoelectron spectroscopy: (XPS, UPS, Synchrotron)
• Photocatalysis, Photoelectrocatalysis, Solar fuels

Current research projects :

• Coordinator of the Marie Skłodowska-Curie Individual Fellow Project (MSCA-PF) “Valence band engineering of oxidation materials for cheap and sustainable solar fuel production” (OMATSOLFUEL) (2023-2025).
• Member of the ANR “Visible-light Photocatalysis with Ambipolar layered CHAlcogenides for Solar fuel generation” (PACHAS) (2025-2029).
• Member of ANR “Bi-Based nanOmaterials for Photocatalysis” (BiBOP) (2024-2028)
• Member of ANR “Development of a membrane-cell for in situ NAP-XPS characterization” (NACELL) (2022-2027)
• Member of the MITI project “Des matériaux Moins nobles pour une cause Noble: vers le verdissement de la dépollution des Eaux à grande échelle par électro-oxydation” (DauMiNEau) (2024-2025)

Activities in the research community :

• Member of GDR CarMANano (Groupement De Recherche Caractérisation et mesures à l’échelle nanométrique)
• Responsible for the Linkedin page of the Photoemission Spectroscopy Research Federation (FR SPE)

Biography:

Clément Maheu has been a CNRS research fellow at the Institut des Matériaux de Nantes Jean Rouxel (IMN) since 2023. A specialist in materials for solar energy conversion, he designs and characterizes semiconductors (oxides, chalcogenides, oxynitrides, etc.) for the photo(electro)catalytic production of hydrogen and high value-added molecules. In particular, it has strong expertise in photoelectron spectroscopy (XPS, UPS, SXPS) to characterize the surface of these materials.

He obtained his PhD at IRCELYON, under the supervision of Drs. Afanasiev, Cardenas, Géantet and Puzenat, on TiO2-supported transition metal sulfide co-catalysts for the photoconversion of alcohols. He deepened his expertise in photoelectron spectroscopy at the Technical University of Darmstadt, with Dr. Mayer, Prof. Jaegermann and Prof. Hofmann, applying these techniques to energy materials (photovoltaics, batteries and fuel cells). Back in France, he joined IMN, first as a postdoc on a Marie Skłodowska-Curie European fellowship, then as a full professor. In 2024, he was awarded the Junior Researcher prize by the Transversal Energy Division of the Société Chimique de France. More recently, he has initiated collaborations with researchers in the humanities and social sciences to question the deployment of photo(electro)catalytic technologies and maximize their environmental and social impact.

Awards :

• Junior researcher award from the Société Chimique de France’s Transversal Energy Division
• Thesis prize from the Catalysis 2020 Division of the Société Chimique de France

Publications :

33 (as of 05/2025)

Major illustrative publications:

• C. Maheu, V. Vandalon, M. Mattinen, T. Mayer, A. A. Bol, J. P. Hofmann, p-Type Al-Doped MoS2 Nanosheet Films: Electronic and Chemical Interface Properties with Gold for Electronic Device Integration, ACS Applied Nano Materials, 2025, 8, 9669.
• V. Nikolaou, D. Romito, C. Maheu, J. Hamon, E. Gautron, F. Massuyeau, S. Jobic, F. Odobel, Dual solar-driven hydrogen evolution and alcohol oxidation with CdS quantum dot-sensitized photocatalysts prepared by the SILAR methodology, Journal of Materials Chemistry A, 2024, 12, 30885-30891.
• C. Maheu, T. Hellmann, C. Prabowo, W. Jaegermann, J. P. Hofmann, T. Mayer, Photoelectron Spectroscopy of Co-evaporated and Spin-Coated LiTFSI-Doped Spiro-OMeTAD Reveals the Interface Energetics Inside a MAPI-based Perovskite Solar Cell, J. Phys. Chem. C, 2023, 127, 43, 21351-21362.
• C. Maheu, E. Puzenat, P. Afanasiev, L. Cardenas, C. Geantet, Photocatalytic production of H2 is a multi-criteria optimization problem: case study of RuS2/TiO2, Catalysis Today, 2021, 377, 166-175.
• C. Maheu, L. Cardenas, E. Puzenat, P. Afanasiev, C. Geantet, UPS and UV Spectroscopies combined to position the energy levels of TiO2 anatase and rutile nanopowders, Physical Chemistry Chemical Physics, 2018, 20, 40, 25629-25637.

Link to publi HAL : https://hal.science/search/index/q/*/authIdHal_s/clement-maheu

Link to orcid :https://orcid.org/0000-0001-5417-5672

Link to scholar.google.fr : https://scholar.google.com/citations?user=u3bDR5MAAAAJ&hl=fror

Other links :

https://clementmaheu.wordpress.com/

https://www.linkedin.com/in/clément-maheu-a922808a

https://bsky.app/profile/maheuclement.bsky.social

https://www.researchgate.net/profile/Clement-Maheu-2

CNRS Research Fellow