Directory

Functions :

Junior researcher (post-doc), Institut des Matériaux de Nantes Jean Rouxel (since January 2025)

Qualifications :

• PhD in Dense Media and Materials, Université Clermont Auvergne (2020-2024)
• Master in Fundamental Physics and Applications, specializing in Matter and Radiation, Université d’Orléans (2018-2020)

Expertises :

• Thin-film PVD processing
• Semiconductor surface treatment: N2 plasma nitriding
• Atomic Layer Etching (ALE) of materials
• Advanced characterization techniques (ARXPS, RBS, FTIR, UV-Vis, AFM ellipsometry, SEM, XRD)

Current research projects :

Development of an ALE process for the selective etching of β-Ga₂O₃

Biography:

Junior researcher in materials physics and chemistry, at the Institut des Matériaux de Nantes Jean Rouxel (IMN). Her current research focuses on the development of atomic etching processes (ALE) for materials such as β-Ga₂O. His work focuses in particular on the study of plasma-surface interactions and advanced post-etching characterization (XPS, AFM, SEM, DRX…).

Teaching :

Université Clermont Auvergne – 135h vacation assignment (2021-2023)

Publications :

1 scientific publication

ARXPS intensity modeling of SiNx ultrathin layer grown on Si (100) and Si (111) substrates by N₂ plasma treatment, Thin Solid Films, 798 (2024) 140388
https://doi.org/10.1016/j.tsf.2024.140388

Link to publi HAL: https://hal.science/search/index?q=Hiba+Beji

LinkedIn link:www.linkedin.com/in/hiba-beji-095971194

Function:

Post-doctoral fellow

Qualifications :

• Master of Science in Fusion and Plasma Science (2018)
• PhD student in plasma physics (2022)

Expertises :

Plasma PVD in DC (Dirrect Current) and HiPIMS (High Power Impulse Magnetron Sputtering) regimes

Main research themes:

• Exploratory study of a new plasma regime: e-HiPIMS (electron-enhanced High Power Impulse Magnetron Sputtering)
• Creation of an AI database to help us with experimental design and to help us with the relationships between various plasma parameters (pressure, distance, voltage, etc.).

Current research projects :

• CHIPS: Combinatorial HiPIMS for Sovereignty (CEA – IMN project)
• ASTERIX: Advanced surface technologies for resilient and innovative materials in extreme environments (PEPR DIADEM project, CEA-LPGP-IMN-SIMaP collaboration)

Biography:

Dimitri Boivin is a post-doc at the Institut des Matériaux Jean Rouxel (IMN) in Nantes, in the Plasmas and Thin Films (PCM) group. Specialist in DC and HiPIMS PVD deposition. He completed his Master’s degree at the University of Lorraine, and his thesis at the Institut Jean Lamour in Nancy. He did his first Post-Doctorate at GREMI on thin film deposition for antibacterial applications. On March 1, 2024, he took up a post-doctoral position at IMN.

Publications :

7

Major illustrative publication:

Using a coupled optical and electrical monitoring method to follow theR-HiPIMSTiO2 deposition process drifts. Boivin, D & Jean-Marie-Desiree, Ronny & Najah, Aymane & Cuynet, Stéphane & Poucques, L.. (2024). Physica Scripta. 99. 10.1088/1402-4896/ad3302.

Link to orcid: https://orcid.org/my-orcid?orcid=0009-0009-9254-7989

LinkedIn link: https://www.linkedin.com/in/dimitri-boivin-92ba59234/