Directory

CNRS Research Associate

CNRS Research Director

Function:

CNRS researcher

Expertises :

• Low-pressure cold plasma etching of materials.
• Plasma diagnostics (optical emission spectrometry, mass spectrometry, electrostatic probes).
• Surface characterization (XPS, ellipsometry).

Main research themes:

• Low-pressure rf plasma processes and study of plasma-surface interaction mechanisms for materials etching and treatment.
• Etching V2O3
• Plasma-surface interaction mechanisms at low temperatures

Current research projects :

ANR project 20-CE24-0014-02 PSICryo “Understanding plasma-surface interactions in cryogenic etching for advanced patterning applications”, involving LTM-Grenoble (leader), GREMI-Orléans and IMN-Nantes. For IMN, the aim is to study the surface mechanisms (chemisorption vs. physisorption) involved in cryogenic etching processes, particularly with a view to controlled atomic layer etching (ALE).

https://anr.fr/Projet-ANR-20-CE24-0014

Biography:

After university studies and a thesis on the structural characterization of SiGe:H and Si:H,Cl amorphous semiconductors by X-ray and electron spectroscopy, I joined the CNRS to work on the characterization of cold plasma-treated surfaces and thin-film materials (1985-1988). My interests then extended to the study of plasma processes for etching semiconductor, dielectric or metallic materials (1988-present).

I was interested in and trained in the physics of radio-frequency excited discharges in gases at low pressure (~1 Pa) and their diagnostics. This led me to develop expertise in the etching of materials for microelectronics: Si, SiO2, low-κ organosilicides, silica glasses and W in fluorinated plasma (SF6, CHF3, C2F6), and in the etching of materials for photonics: InP and CdHgTe in CH4-H2 plasma and derivatives, chalcogenide glasses in fluorinated and CH4-H2 plasmas. This has also led me to develop expertise in the physical and chemical characterization of plasmas using mass spectrometry, optical emission spectrometry and electrostatic probes, as well as in the characterization of surfaces and interfaces using photoelectron spectrometry, ellipsometry and near-field microscopy.

My current research concerns the etching of vanadium oxide V2O3 and the fundamental mechanisms of etching and plasma and gas interaction with the surface at cryogenic temperature.

Publications :

122

Major illustrative publications:

Review articles
Ch. Cardinaud, M-C. Peignon, P.Y. Tessier “Plasma etching: principles, mechanisms, application to micro- and nanotechnologies” Appl. Surf. Sci. 164, 72-83 2000.
http://dx.doi.org/10.1016/S0169-4332(00)00328-7

C. Cardinaud “Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment” Comptes Rendus Chimie de l’Académie des Sciences 21, 723-739 2018.
https://doi.org/10.1016/j.crci.2018.01.009

Articles on plasma etching mechanisms, plasma diagnostics, plasma-surface interaction
Ch. Cardinaud, A. Rhounna, G. Turban, B. Grolleau “Contamination of silicon surfaces exposed to CHF3 plasmas: An XPS study of the film-surface interface” J. Electrochem. Soc. 135, 1472-1477, 1988. http://dx.doi.org/10.1149/1.2096034

Ch. Cardinaud, G. Turban “Mechanistic studies of the initial stages of etching of Si and SiO2 in a CHF3 plasma” Appl. Surf. Sci. 45, 109-120, 1990.
http://dx.doi.org/10.1016/0169-4332(90)90061-4

M-C. Peignon, Ch. Cardinaud, G. Turban “A kinetic study of reactive ion etching of tungsten in SF6 – O2 RF plasmas” J. Electrochem. Soc. 140, 505-512, 1993.
http://dx.doi.org/10.1149/1.2221077

Y. Feurprier, Ch. Cardinaud, G. Turban “Influence of the gas mixture on the reactive ion etching of InP in CH4 – H2 plasmas” J. Vacuum Sci. & Technol. B 15, 1733-1740 1997.
http://dx.doi.org/10.1116/1.589363

F. Gaboriau, G. Cartry, M-C. Peignon, Ch. Cardinaud “Selective and deep plasma etching of SiO2: comparison between different fluorocarbon gases (CF4, C2F6, CHF3) mixed with CH4 or H2 and influence of residence time” J. Vacuum Sci. & Technol. B 20, 1514-1521 2002.
http://dx.doi.org/10.1116/1.1495502

S. Bouchoule, R. Chanson, A. Pageau, E. Cambril, S. Guilet, A. Rhallabi, C. Cardinaud “Surface chemistry of InP ridge structures etched in Cl2-based plasma analysed with angular XPS” J. Vacuum Sci. & Technol. A 33, 05E124 2015.
http://dx.doi.org/10.1116/1.4927541

J. Piet, W. Faider, A. Girard, F. Boulard and C. Cardinaud “Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas” J. Vacuum Sci. & Technol. A 38, 053005 2020. https://doi.org/10.1116/6.0000397

T. Meyer, A. Girard, G. Le Dain, A. Rhallabi, E. Baudet, M. Baillieul, V. Nazabal, P. Němec and C. Cardinaud “Mass spectrometry and in situ X-ray Photoelectron Spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma” Plasma Sources Sci. & Technol. 32 (2023) 085003.
https://doi.org/10.1088/1361-6595/aceaa5

Articles related to expertise in XPS analysis – external collaborations
K. Tsougeni, N. Vourdas, A. Tserepi, E. Gogolides, C. Cardinaud “Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces” Langmuir 25, 11748-11759 2009.
http://dx.doi.org/10.1021/la901072z

E. Baudet, C. Cardinaud, A. Girard, E. Rinnert, K. Michel, B. Bureau, V. Nazabal “Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies” J. Non-Cryst. Solids 444, 64-72 2016.
http://dx.doi.org/10.1016/j.jnoncrysol.2016.04.017

Link to publi HAL: https://hal.science/search/index?q=cardinaud+christophe

Link to orcid: https://orcid.org/0000-0002-9753-8848

Other links :

• Société Française du Vide
• Cold Plasma Network
• Cold plasma training in France

CNRS Research Director

Function:

Research Director DR 1

• Coordinator of the Mott-IA maturation project on artificial Neural Networks
• Laureate of the RISE 2024 program for the creation of the startup Mottronix.
• Member of the International Research Laboratory (IRL) DYNACOM

Former positions:
2018 – 2023 Team Leader Physique des Matériaux et Nanostructures (PMN)
2015 – 2018 Co-director of the team Physique des Matériaux et Nanostructures (PMN)
2000 – 2021 Associate researcher and then Director of Research DR2 Institut des Matériaux de Nantes Jean Rouxel

Education:

• 2011 Habilitation à diriger des recherches (higher PhD) Faculty of sciences / Nantes University
• 1998 – 2000 Associate Researcher – Cornell University (USA). Advisor : Franck J. Disalvo
• 1995 – 1998 PhD in material sciences – Nantes University
  Advisors : Alain Meerschaut /Jean Rouxel (Institut des Matériaux Jean Rouxel)

Research themes:

• Solid State chemistry and physics.
• Resistive switching in chalcogenide and oxide Mott Insulators. Application for non-volatile memories (RRAM/ Memristors) or as new neuromorphic components.
• Topochemical synthesis of new (oxy-)chalcogenide compounds.

Awards:

• 2023 Scientific grand prize of the french physical society (SFP)
• 2012, 17 and 23 CNRS Award of scientific excellence
• 1998 LAVOISIER scholarship from the French Ministry of Foreign Affairs

Scientific production:
175 Publications, 2 book chapters, 65 invited conferences, 6 patents

Senior Lecturer

Functions :

Doctoral student

Main research themes :

Plasma modeling, HiPIMS process, thin films, titanium

Current research projects :

PhD on multi-scale plasma modeling in high-power pulse magnetron sputtering (HiPIMS) for titanium thin film deposition.

Activities in the research community :

Co-president of the SYRA association.

Representative of Nantes doctoral students at the Collège Doctoral Matière, Molécules, Matériaux et Géosciences (3MG).

Biography:

After a Master’s degree in Materials Science (Innovative Materials and Systems for Energy) at Nantes University, I had the opportunity to develop my skills within the PCM team at IMN, during a research internship on semiconductor etching plasmas, before embarking on a PhD within the same team, on plasma modeling in the HiPIMS process, for the deposition of titanium thin films.

I’m involved in IMN’s SYRA doctoral students’ association, as co-president. I also attach great importance to the well-being of doctoral students, and was lucky enough to be elected doctoral student representative on the Collège Doctoral Matière, Molécules, Matériaux et Géosciences (3MG).

Teaching :

UE XLG4PU050 Modeling for Physics 2

Link to orcid: https://orcid.org/0009-0006-8897-197X?lang=en

LinkedIn link: www.linkedin.com/in/coline-chartrain-4372b3223

University Professor

Senior Lecturer

Functions:

Design Engineer

Qualifications:

Materials and chemistry engineering degree and double master’s degree in research

Expertises :

• inorganic powder and crystal synthesis (sealed tubes),
• glove box, ball-milling, iodine transport),
• PVD (Physical Vapor Deposition) thin-film deposition,
• physico-chemical characterizations (powder and crystal XRD, R(T)),
• EDX,
• structure refinement using the Rietveld method).

Main research themes:

• Superconductivity,
• Photo-induced phase transitions,
• Mottronics.

Current research projects :

• ANR MISFIT,
• ANR FASTRAIN,
• MOTT-IA

Link to orcid: https://orcid.org/0009-0001-2365-837X

Senior Lecturer

Senior Lecturer